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公开(公告)号：JP2009055061A
公开(公告)日：2009-03-12
申请号：JP2008279190
申请日：2008-10-30
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： DIERICHS MARCEL MATHIJS THEODO , DONDERS SJOERD NICOLAAS LAMBER , JACOBS JOHANNES HENRICUS WILHE , JANSEN HANS , LOOPSTRA ERIK ROELOF , JEROEN JOHANNES SOPHIA MARIA M , STAVENGA MARCO KOERT , STREEFKERK BOB , VERHAGEN MARTINUS CORNELIS MAR , SEUNTIENS-GRUDA LEJLA
IPC: H01L21/027 , B01D61/02 , B01D61/24 , C02F1/04 , C02F1/28 , C02F1/32 , C02F1/42 , C02F1/44 , G03F7/20
CPC classification number: G03F7/70866 , B01D19/0031 , B01D61/025 , B01D61/24 , C02F1/04 , C02F1/20 , C02F1/28 , C02F1/283 , C02F1/32 , C02F1/42 , C02F1/441 , C02F2103/40 , G03F7/2041 , G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide lithographic equipment in which a liquid supply system keeps liquid in a space between the final component of the projection system and a substrate by a liquid sealing system. SOLUTION: The liquid supply system 100 is further equipped with a de-mineralizing unit 130, a distillation unit 120, and a UV radiation source 145 to purify an immersion liquid. Chemicals can be added to the immersion liquid to inhibit the growth of living organisms. The components of the liquid supply system 100 can be made of materials non-transparent to visible light to prevent the growth of living organism. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供平版印刷设备，其中液体供应系统通过液体密封系统将液体保持在投影系统的最终部件和基板之间的空间中。 解决方案：液体供应系统100还配备有去矿化单元130，蒸馏单元120和UV辐射源145以净化浸没液体。 可以将化学品加入到浸液中以抑制生物体的生长。 液体供应系统100的部件可以由对可见光不透明的材料制成，以防止生物体的生长。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2008288619A
公开(公告)日：2008-11-27
申请号：JP2008219416
申请日：2008-08-28
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： STREEFKERK BOB , BASELMANS JOHANNES JACOBUS MAT , BRULS RICHARD JOSEPH , DIERICHS MARCLE MATHIJS T M , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , LOOPSTRA ERIK ROELOF , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , SENGERS TIMOTHEUS FRANCISCUS , RONALD WALTER JIIN SEVERYNS , SERGEI SHULEPOV , BOOM HERMAN
IPC: H01L21/027 , B05D3/12 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection apparatus.
SOLUTION: In the immersion-type lithography apparatus, an immersion liquid is confined between a final element of a projection system and a substrate. Both of hydrophobic and hydrophilic layers are used on various elements of the apparatus. The use of them helps to prevent air-bubble formation in the immersion liquid, and reduce residues remained on the elements after immersion in the immersion liquid.
COPYRIGHT: (C)2009,JPO&INPITAbstract translation: 要解决的问题：提供一种浸没型光刻投影装置。 解决方案：在浸没式光刻设备中，浸没液体被限制在投影系统的最终元件和基板之间。 疏水层和亲水层都用在装置的各种元件上。 它们的使用有助于防止浸入液体中的气泡形成，并且减少浸入浸液中之后残留在元件上的残留物。 版权所有（C）2009，JPO＆INPIT
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公开(公告)号：JP2008263221A
公开(公告)日：2008-10-30
申请号：JP2008161719
申请日：2008-06-20
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JANSEN HANS , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , MERTENS JEROEN JOHANNES SOPHIA , MULKENS JOHANNES CATHARINUS HU , STAVENGA MARCO KOERT , STREEFKERK BOB , HOEVEN JAN CORNELIS V D , GROUWSTRA CEDRIC D
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/70925
Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for cleaning the inside of a liquid immersion lithographic apparatus. SOLUTION: Particularly, cleaning fluid can be supplied to a space between the projection system of a lithographic apparatus and a substrate table by the liquid supply system of the lithographic apparatus. Additionally or as an alternative plan, a cleaning device can be arranged on the substrate table, or an ultrasonic emitter can be arranged in order to produce ultrasonic liquid. COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation: 要解决的问题：提供一种清洗液浸光刻设备内部的方法和设备。 特别地，清洁液可通过光刻设备的液体供应系统供应到光刻设备的投影系统和基片台之间的空间。 另外或作为替代方案，可以在衬底台上布置清洁装置，或者可以布置超声发射器以产生超声波液体。 版权所有（C）2009，JPO＆INPIT
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44.发明专利Supporting structure, lithographic projection apparatus, and method of manufacturing device 有权支撑结构，光刻投影装置和制造装置的方法
公开(公告)号：JP2007329506A
公开(公告)日：2007-12-20
申请号：JP2007218716
申请日：2007-08-24
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： TINNEMANS PATRICIUS ALOYSIUS J , BUIS EDWIN JOHAN , DONDERS SJOERD NICOLAAS LAMBER , VAN ELP JAN , HOOGKAMP JAN FREDERIK , VAN MEER ASCHWIN LODEWIJK HEND , SMULDERS PATRICK JOHANNES CORN , SPANJERS FRANCISCUS ANDREAS CO , VERMEULEN JOHANNES PETRUS MART , VISSER RAIMOND , TEGENBOSCH HENRICUS GERARDUS , VAN DEN BERG JOHANNES CHARLES , VAN DE SANDE HENRICUS JOHANNES , VERVOORT THIJS
IPC: B08B1/00 , H01L21/677 , B25J13/08 , B65G49/07 , G03F7/20 , H01L21/027 , H01L21/304 , H01L21/683 , H02N13/00
CPC classification number: G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively compensating for a positional shift including a tilt between a substrate and a supporting structure and a vertical displacement when moving the substrate in a lithographic projection apparatus using the supporting structure.
SOLUTION: By providing compliant parts (14, 26) in the supporting structure for holding and moving a substrate (W), for example, a supporting frame (18) of a robot arm (10) adaptable to the tilt and/or the vertical displacement. Clamps (20, 22, 24) that the supporting frame (18) comprises may be a Johnson-Raybeck effect type clamp that requires a stringent positional precision, and the cleaning of the inside of the projection apparatus is carried out by using only one substrate.
COPYRIGHT: (C)2008,JPO&INPITAbstract translation: 要解决的问题：提供一种有效地补偿包括基板和支撑结构之间的倾斜的位置偏移以及在使用支撑结构在光刻投影装置中移动基板时的垂直位移的方法。 解决方案：通过在用于保持和移动衬底（W）的支撑结构中提供柔性部件（14,26），例如适用于倾斜和/或倾斜的机器人臂（10）的支撑框架（18） 或垂直位移。 支撑框架（18）包括的夹具（20,22,24）可以是要求严格的位置精度的Johnson-Raybeck效果型夹具，并且通过仅使用一个基板来执行投影装置的内部的清洁 。 版权所有（C）2008，JPO＆INPIT
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公开(公告)号：JP2007235179A
公开(公告)日：2007-09-13
申请号：JP2007159104
申请日：2007-06-15
Applicant: Asml Netherlands Bv , エーエスエムエル ネザーランズ ビー.ブイ.
Inventor： JOERI LOF , BUTLER HANS , DONDERS SJOERD NICOLAAS LAMBER , KOLESNYCHENKO ALEKSEY , LOOPSTRA ERIK ROELOF , MEIJER HENDRICUS JOHANNES MARI , MULKENS JOHANNES CATHARINUS HU , RITSEMA ROELOF AEILKO SIEBRAND , VAN SCHAIK FRANK , SENGERS TIMOTHEUS FRANCISCUS , SIMON KLAUS , DE SMIT JOANNES THEODOOR , STRAAIJER ALEXANDER , STREEFKERK BOB , BIJLAART ERIK THEODORUS MARIA , CHRISTIAAN ALEXANDER HOOGENDAM , VAN SANTEN HELMAR , VAN DE KERKHOF MARCUS ADRIANUS , KROON MARK , DEN BOEF ARIE JEFFREY , OTTENS JOOST JEROEN , MERTENS JEROEN JOHANNES SOPHIA
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2007,JPO&INPIT
Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2007，JPO＆INPIT
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Patent Agency Ranking
公开(公告)号：JP2006179909A
公开(公告)日：2006-07-06
申请号：JP2005364310
申请日：2005-12-19
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： JANSEN HANS , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , MERTENS JEROEN JOHANNES SOPHIA , MULKENS JOHANNES CATHARINUS HU , STAVENGA MARCO KOERT , STREEFKERK BOB , HOEVEN JAN CORNELIS V D , GROUWSTRA CEDRIC D
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70341 , G03F7/70925
Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for cleaning the inside of an immersion lithographic apparatus. SOLUTION: In particular, the liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table, and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid. COPYRIGHT: (C)2006,JPO&NCIPI
Abstract translation: 要解决的问题：提供一种用于清洁浸没式光刻设备内部的方法和设备。 特别地，光刻设备的液体供应系统可用于将清洁流体引入到投影系统和光刻设备的基板台之间的空间中。 附加地或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波清洗液体。 版权所有（C）2006，JPO＆NCIPI
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公开(公告)号：JP2005322906A
公开(公告)日：2005-11-17
申请号：JP2005130901
申请日：2005-04-28
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , MERTENS JEROEN JOHANNES SOPHIA , STREEFKERK BOB , MULKENS JOHANNES CATHARINUS HU
IPC: H01L21/027 , G03B27/42 , G03F7/20 , G03F9/00
CPC classification number: G03F9/7034 , G03F7/70341
Abstract: PROBLEM TO BE SOLVED: To provide a method which eliminates the need for a double stage in an immersion exposure divice and enables quick and accurate measurement of height.
SOLUTION: Immersion lithography equipment comprises a single stage, where the height of a substrate is measured, and exposure is performed at the same time; measurement information is stored by a sensor for measuring the height of the substrate, and the stored information is read to control the positioning of the substrate, such that a measured part is moved from a projection optical system underneath the optical axis separated by a predetermined distance.
COPYRIGHT: (C)2006,JPO&NCIPIAbstract translation: 要解决的问题：提供一种在浸没曝光分离中不需要双阶段的方法，并且能够快速和准确地测量高度。 解决方案：浸渍光刻设备包括单个阶段，其中测量基底的高度，同时进行曝光; 测量信息由用于测量基板的高度的传感器存储，并且读取所存储的信息以控制基板的定位，使得测量部分从光轴下方的预定距离的投影光学系统移动 。 版权所有（C）2006，JPO＆NCIPI
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公开(公告)号：JP2005303316A
公开(公告)日：2005-10-27
申请号：JP2005115241
申请日：2005-04-13
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC , BASELMANS JOHANNES JACOBUS MAT , DONDERS SJOERD NICOLAAS LAMBER , CHRISTIAAN ALEXANDER HOOGENDAM , JANSEN HANS , JEROEN JOHANNES SOPHIA MARIA M , MULKENS JOHANNES CATHARINUS HU , PEETERS FELIX GODFRIED PETER , STREEFKERK BOB , TEUNISSEN FRANCISCUS JOHANNES , VAN SANTEN HELMAR
IPC: G03F7/20 , H01L21/027
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of a immersion lithographic equipment which is made so as to prevent contamination due to an immersion liquid.
SOLUTION: A substrate table WT is provided with a drainage groove, i.e. a barrier 40 which surrounds an outer periphery of a substrate W and a barrier 100 which surrounds another object 20 such as a sensor which exists in the substantially same surface as the upper surface of the substrate W. Since the barriers 40 and 100 can collect all liquid which falls from a liquid feed system while exposing the substrate W, a risk that fine components of the lithographic projection equipment is contaminated is reduced.
COPYRIGHT: (C)2006,JPO&NCIPIAbstract translation: 要解决的问题：提供浸没式光刻设备的基板台，其被制成以防止由于浸没液体而引起的污染。 解决方案：衬底台WT设置有排水槽，即围绕衬底W的外周的阻挡层40和围绕另一物体20的阻挡物100，例如传感器，其存在于基本相同的表面中 基板W的上表面。由于阻挡层40和100可以收集从液体供给系统落下的所有液体同时暴露基板W，所以降低了光刻投影设备的精细分量被污染的风险。 版权所有（C）2006，JPO＆NCIPI
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公开(公告)号：JP2004343076A
公开(公告)日：2004-12-02
申请号：JP2004102395
申请日：2004-03-31
Applicant: Asml Netherlands Bv , エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ
Inventor： TINNEMANS PATRICIUS ALOYSIUS J , BUIS EDWIN JOHAN , DONDERS SJOERD NICOLAAS LAMBER , VAN ELP JAN , HOOGKAMP JAN FREDERIK , VAN MEER ASCHWIN LODEWIJK HEND , SMULDERS PATRICK JOHANNES CORN , SPANJERS FRANCISCUS ANDREAS CO , VERMEULEN JOHANNES PETRUS MART , VISSER RAIMOND , TEGENBOSCH HENRICUS GERARDUS , VAN DEN BERG JOHANNES CHARLES , VAN DE SANDE HENRICUS JOHANNES , VERVOORT THIJS
IPC: B08B1/00 , B25J13/08 , B65G49/07 , G03F7/20 , H01L21/027 , H01L21/304 , H01L21/677 , H01L21/683 , H02N13/00 , H01L21/68
CPC classification number: G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
Abstract: PROBLEM TO BE SOLVED: To provide a method capable of effectively compensating an inclination between a substrate and a support structure or a misregistration including a displacement in the vertical direction when the substrate is moved by the support structure in a lithographic projection apparatus. SOLUTION: By providing a support structure for holding and moving a substrate (W), for example, flexible sections (14, 26) in a support frame (18) of a robot arm (10), it can be adapted to the tilt and/or a displacement in the vertical direction. Clamps (20, 22, 24) provided on the support frame (18) may be a Johnson-Raybeck effect type clamp, which requires the severe position accuracy, and can perform a cleaning treatment in a projection apparatus by only one substrate. COPYRIGHT: (C)2005,JPO&NCIPI
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