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    Lithographic apparatus and device manufacturing method
    1.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2011066416A

    公开(公告)日：2011-03-31

    申请号：JP2010206356

    申请日：2010-09-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BECKERS MARCEL ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  MIGCHELBRINK FERDY ,  EVERS ELMAR

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70808

    Abstract: PROBLEM TO BE SOLVED: To provide a seal member or a barrier member that reduces a turbulent flow and an overflow of immersion liquid in a liquid supply system for an immersion lithographic apparatus.
    SOLUTION: The immersion liquid is supplied into a seal member 12 through an inlet 128. The immersion liquid is pushed into orifices 121 that permit fluid communication between a first chamber 120 and a second chamber 122, causing a first pressure drop in the immersion liquid. The orifices 121 are individual holes prepared in a plate 123 separating the chambers 120 and 122, and the orifices 121 disperse a flow in a tangential direction over a plate 126 separating the chamber 122 from a space, ensuring a uniform flow over the width of the array of orifices 124. The orifices 124 are provided as a (regular) two-dimensional array in the plate 126 of the seal member 12. Thus uniform and parallel flows are generated in the space.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种密封构件或阻挡构件，其减少用于浸没式光刻设备的液体供应系统中的湍流和浸没液体的溢出。 解决方案：浸没液体通过入口128供应到密封构件12.浸入液体被推入孔口121，孔口121允许第一室室120和第二室室122之间的流体连通， 浸液 孔121是在分离腔室120和122的板123中制备的单独的孔，并且孔口121沿切线方向分散流体，从而使腔室122与空间分离，从而确保在宽度方向上的均匀流动 孔124的阵列在密封构件12的板126中作为（规则的）二维阵列提供。因此，在该空间中产生均匀和平行的流。 版权所有（C）2011，JPO＆INPIT

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