公开(公告)号：SG126135A1

公开(公告)日：2006-10-30

申请号：SG200602210

申请日：2006-04-03

Applicant: ASML NETHERLANDS BV

Inventor： BECKERS MARCEL ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  JACOBS JOHANNES HENRICUS WILHE ,  KATE TEN NICOLAAS ,  KEMPER NICOLAAS RUDOLF ,  MIGCHELBRINK FERDY ,  EVERS ELMAR

公开(公告)号：SG121142A1

公开(公告)日：2006-04-26

申请号：SG200505921

申请日：2005-09-14

Applicant: ASML NETHERLANDS BV

Inventor： HOOGENDAM CHRISTIAAN ALEXANDER ,  JACOBS JOHANNES HENRICUS WILHE ,  KATE TEN NICOLAAS ,  MEULEN VAN DER FRITS

Abstract: In a scanning immersion lithographic apparatus, immersion liquid is supplied on one side of the space between the projection system and the substrate and drained on the other side so that the flow of liquid is substantially perpendicular to the scan direction.

公开(公告)号：SG128601A1

公开(公告)日：2007-01-30

申请号：SG200604016

申请日：2006-06-13

Applicant: ASML NETHERLANDS BV

Inventor： JACOBS JOHANNES HENRICUS WILHE ,  KATE TEN NICOLAAS ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  VERHAGEN MARTINUS CORNELIS MAR ,  BOOM HERMAN ,  JANSSEN FRANCISCUS JOHANNES JO ,  BOUCHOMS IGOR PETRUS MARIA ,  KEMPER NICOLAAS RUDOLF ,  OTTENS JOOST JEROEN ,  KOEK YUECEL ,  ES VAN JOHANNES

公开(公告)号：SG126100A1

公开(公告)日：2006-10-30

申请号：SG200601932

申请日：2006-03-23

Applicant: ASML NETHERLANDS BV

Inventor： TOORN VAN DER JAN-GERARD CORNE ,  BUTLER HANS ,  COX HENRIKUS HERMAN MARIE ,  DRAAIJER EVERT HENDRIK JAN ,  KATE TEN NICOLAAS ,  MEULEN VAN DER FRITS ,  ENCKEN MARK JOHANNES HERMANUS ,  HOUKES MARTIJN ,  ARENDS ANTONIUS HENRICUS ,  CUPERUS MINNE

公开(公告)号：SG124359A1

公开(公告)日：2006-08-30

申请号：SG200600186

申请日：2006-01-11

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS RUDOLF ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KATE TEN NICOLAAS ,  MEULEN VAN DER FRITS

公开(公告)号：SG123682A1

公开(公告)日：2006-07-26

申请号：SG200507763

申请日：2005-12-02

Applicant: ASML NETHERLANDS BV

Inventor： KATE TEN NICOLAAS

Abstract: A reticle exchange unit for moving a reticle (MA) in a lithographic apparatus is disclosed. The surface of the reticle (MA) is protected by a pellicle attached thereto by a gas permeable pellicle frame. The reticle exchange unit includes a reticle preparation chamber (28), a reticle transport unit (26) arranged to cause a plurality of exposed gas permeable parts of the pellicle frame to face an interior of the reticle preparation chamber (28), and a purge gas pressure (282) and evacuating pressure supply (280) arrangement coupled to the reticle preparation chamber (28) and arranged to provide, alternately, a purge gas pressure and evacuating pressure that is lower than the purge gas pressure to the reticle preparation chamber (28) when the exposed gas permeable parts of the pellicle frame are facing the interior of the reticle preparation chamber (28), so that gas flows through the pellicle frame, alternately, into and out of a pellicle space between the pellicle and the reticle (MA).