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    RADIATION SENSITIVE MIXTURE AND PRODUCTION OF RELIEF PATTERNS
    43.
    发明专利
    RADIATION SENSITIVE MIXTURE AND PRODUCTION OF RELIEF PATTERNS 未知

    公开(公告)号：CA1334059C

    公开(公告)日：1995-01-24

    申请号：CA598317

    申请日：1989-05-01

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD ,  BINDER HORST ,  BOETTCHER ANDREAS

    IPC: G03F7/004 ,  G03F7/039

    Abstract: A radiation sensitive mixture suitable for producing relief patterns contains (a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and additionally a group which forms a strong acid on irradiation, wherein the polymeric binder (a) contains from 5 to 35 mol % of monomer units having acid labile groups as copolymerized or cocondensed units or acid labile groups introduced by polymer analogous reaction.

    44.
    发明专利
    未知

    公开(公告)号：ES2055002T3

    公开(公告)日：1994-08-16

    申请号：ES89123926

    申请日：1989-12-27

    Applicant: BASF AG

    Inventor： REHMER GERD ,  BOETTCHER ANDREAS ,  AUCHTER GERHARD

    IPC: C08F212/08 ,  C08F2/46 ,  C08F20/10 ,  C08F20/26 ,  C08F20/52 ,  C08F212/00 ,  C08F220/18 ,  C08F220/30 ,  C08F220/58 ,  C08F290/00 ,  C08F290/06 ,  C08F299/00 ,  C09D4/00 ,  C09D133/04 ,  C09J4/00 ,  C09J133/04

    Abstract: UV-crosslinkable materials based on (meth)acrylate copolymers contain copolymerized monomers of the general formula I (I) where R is a certain alkyl radical, an aryl radical or a radical R1 and R1 is a radical where R2 to R6 are each H, alkyl, a non-ortho OH group, OCH3, OC2H3, SH, SCH3, Cl, F, CN, COOH, COO(C1-C3-alkyl), CF3, N(CH3)2, N(C2H5)2, N(CH3)C6H5, +N(CH3)3X- or +N(CH3)XX-, where X- is an acid anion, and one or more of the radicals R2 to R6 are each a radical or or where Sp is one of the spacer groups of the following type and R', R'' and R''' are each H or a certain hydrocarbon, and where the radicals X may be identical or different and are each a divalent, alkylene radical, a cycloalkylene radical or phenylene radical, which are bonded directly to one another and/or are bonded to one another by identical or different groups Y, and Y is a divalent radical from the group consisting of and k and m are each from 1 to 10 and 1 and n are each from 0 to 25.

    45.
    发明专利
    未知

    公开(公告)号：DE3844445A1

    公开(公告)日：1990-07-19

    申请号：DE3844445

    申请日：1988-12-31

    Applicant: BASF AG

    Inventor： REHMER GERD ,  BOETTCHER ANDREAS ,  AUCHTER GERHARD

    IPC: C08F212/08 ,  C08F2/46 ,  C08F20/10 ,  C08F20/26 ,  C08F20/52 ,  C08F212/00 ,  C08F220/18 ,  C08F220/30 ,  C08F220/58 ,  C08F290/00 ,  C08F290/06 ,  C08F299/00 ,  C09D4/00 ,  C09D133/04 ,  C09J4/00 ,  C09J133/04

    Abstract: UV-crosslinkable materials based on (meth)acrylate copolymers contain copolymerized monomers of the general formula I (I) where R is a certain alkyl radical, an aryl radical or a radical R1 and R1 is a radical where R2 to R6 are each H, alkyl, a non-ortho OH group, OCH3, OC2H3, SH, SCH3, Cl, F, CN, COOH, COO(C1-C3-alkyl), CF3, N(CH3)2, N(C2H5)2, N(CH3)C6H5, +N(CH3)3X- or +N(CH3)XX-, where X- is an acid anion, and one or more of the radicals R2 to R6 are each a radical or or where Sp is one of the spacer groups of the following type and R', R'' and R''' are each H or a certain hydrocarbon, and where the radicals X may be identical or different and are each a divalent, alkylene radical, a cycloalkylene radical or phenylene radical, which are bonded directly to one another and/or are bonded to one another by identical or different groups Y, and Y is a divalent radical from the group consisting of and k and m are each from 1 to 10 and 1 and n are each from 0 to 25.

    47.
    发明专利
    未知

    公开(公告)号：DK362488D0

    公开(公告)日：1988-06-30

    申请号：DK362488

    申请日：1988-06-30

    Applicant: BASF AG

    Inventor： SCHWALM REINHOLD ,  BOETTCHER ANDREAS ,  BINDER HORST

    IPC: G03C1/72 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03C1/495

    Abstract: A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.

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