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    42.
    发明专利
    未知

    公开(公告)号：DE19855649A1

    公开(公告)日：2000-06-08

    申请号：DE19855649

    申请日：1998-12-03

    Applicant: BASF AG

    Inventor： HABECK THORSTEN ,  PRECHTL FRANK ,  WUENSCH THOMAS ,  WESTENFELDER HORST

    IPC: A61K8/00 ,  A61K8/30 ,  A61K8/40 ,  A61K8/49 ,  A61K31/275 ,  A61K31/277 ,  A61Q1/00 ,  A61Q1/04 ,  A61Q17/04 ,  A61Q19/00 ,  C07C255/37 ,  A61K7/40 ,  C09K15/04

    Abstract: alpha -Alkyl-styryl derivatives (I) are used as photostable UV-filter in cosmetic or pharmaceutical compositions for protecting the human skin or hair against the sun light, optionally combined with other components absorbing in the UV range. alpha -Alkyl-styryl derivatives of formula (I) are used as photostable UV-filter in cosmetic or pharmaceutical compositions for protecting the human skin or hair against the sun light, optionally combined with other components absorbing in the UV range. R , R = H, OH, NH2, 1-12C alkyl, 1-12C alkoxy, 1-12C alkylamino, 1-12C dialkylamino, water soluble substituents such as carboxylate, sulfonate or ammonium residues; R , R = COOR , COR , CONR R or CN; R = 1-12C alkyl; R , R = H, 1-12C alkyl, 2-10C alkenyl, 3-10C cycloalkyl, 3-10C cycloalkenyl, aryl or heteroaryl (all optionally substituted); A = O, S or NR B' = 1-12C alkylene, 4-12C cycloalkylene, 8-22C aralkylene, 9-21C monooxoaralkylene or -(X)n-Y'-; R = H or 1-12C alkyl; X = -(CH2)2-Z-, -(CH2)3-Z-, -CH(CH3)2-CH2-Z-, -(CH2)4-Z- or -CH2-CH(CH2-CH3)-Z-; Y' = -(CH2)2-, -(CH2)3-, -CH(CH3)-CH2-, -(CH2)4- or -CH2-CH(CH2-CH3)-; Z = O or S; n = 1-150; two of R , R and R = form 5- to 6-membered ring fused to the benzene ring. An Independent claim is also included for a sunscreen comprising the cosmetic and pharmaceutical composition for protecting the human epidermis and hair against UV light (280-400 nm) containing (I).

    44.
    发明专利
    未知

    公开(公告)号：DE19847778A1

    公开(公告)日：2000-04-20

    申请号：DE19847778

    申请日：1998-10-16

    Applicant: BASF AG

    Inventor： HABECK THORSTEN ,  PRECHTL FRANK

    IPC: C07D301/12 ,  C07C45/42 ,  C07C45/45 ,  C07C45/51 ,  C07C45/58 ,  C07C45/63 ,  C07C45/64 ,  C07C45/74 ,  C07C49/784 ,  C07C49/796 ,  C07C49/813 ,  C07C49/83 ,  C07C49/84 ,  C07D303/32 ,  C07C45/72 ,  C07C49/15 ,  C07C49/683

    Abstract: Substituted dibenzoylmethanes (I) are prepared by (a) condensing benzaldehydes (II) with acetophenones (III) to chalkones (IV), in which the exocyclic double bond is in the E- or Z-configuration or a mixture of these; and (b) converting (IV) to (I). Substituted dibenzoylmethanes (I) are prepared by (a) condensing benzaldehydes (II) with acetophenones (III) to chalkones (IV), in which the exocyclic double bond is in the E- or Z-configuration or a mixture of these; and (b) converting (IV) to (I): R = R ; and R' = R ; or R = R ; and R' = R ; R = 3-12 C alkyl; R = H, 3-12 C alkyl or 1-12 C alkoxy. Independent claims are also included for: (a) new chalkones of formula (IV); and (b) new diaryl compounds, comprising 1-halo-2-hydroxy-, 1,2-dihalo- and 1,2-epoxy-2-(4-alkyl or alkoxy-phenyl)-ethyl phenyl ketones of formula (V); R = 3-4 carbon (C) alkoxy; R = hydrogen (H) or 1-4 C alkoxy; X = halogen or hydroxyl (OH); R = halogen; or C(X)-C(Y) = an oxiran ring; X = halogen or hydroxyl (OH); R = halogen; or C(X)-C(Y) = an oxiran ring; R = 3-12 carbon (C) alkoxy; R = H, 3-12 C alkyl or 1-12 C alkoxy.

    45.
    发明专利
    未知

    公开(公告)号：DE19824972A1

    公开(公告)日：1999-12-09

    申请号：DE19824972

    申请日：1998-06-04

    Applicant: BASF AG

    Inventor： SCHUHMACHER PETER ,  SCHNEIDER NORBERT ,  WESTENFELDER HORST ,  HAREMZA SYLKE ,  HABECK THORSTEN ,  MEYER FRANK

    IPC: A61K8/00 ,  A61K8/02 ,  A61K8/23 ,  A61K8/25 ,  A61K8/29 ,  A61K8/31 ,  A61K8/33 ,  A61K8/34 ,  A61K8/36 ,  A61K8/37 ,  A61K8/41 ,  A61K8/46 ,  A61K8/49 ,  A61K8/73 ,  A61K8/86 ,  A61K8/89 ,  A61K8/97 ,  A61K8/98 ,  A61K31/255 ,  A61K31/34 ,  A61P17/16 ,  A61Q1/00 ,  A61Q1/04 ,  A61Q1/10 ,  A61Q5/00 ,  A61Q17/04 ,  A61Q19/00 ,  C09B67/20 ,  C09C3/08 ,  C09K3/00 ,  A61K7/42 ,  A61K7/48

    Abstract: Liquid crystal compositions forming a cholesteric phase with a pitch of less than 450 nm, comprising either at least one polymerizable chiral liquid crystal monomer or a mixture of at least one polymerizable achiral liquid crystal monomer and at least one chiral additive, are used as ultraviolet filters for protecting skin or hair against solar radiation. Liquid crystal compositions forming a cholesteric phase with a pitch of less than 450 nm, comprising either: (a) at least one polymerizable chiral liquid crystal monomer of formula (I); or (b) a mixture of at least one polymerizable achiral liquid crystal monomer of formula (II) and at least one chiral additive, are used as ultraviolet (UV) filters in cosmetic and pharmaceutical compositions for protecting human skin or hair against solar radiation: A -A = spacers with a chain length of 1-30C; Y -Y = bonds, O, S, C(O)O, OC(O), CH=CHC(O)O, OC(O)O, C(O)N(R), N(R)C(O), CH2O, OCH2, CH=N, N=CH or N=N; M , M = mesogenic groups; R = H or 1-4C alkyl; Z = H, 1-4C alkyl or a polymerizable group, at least one being a polymerizable group; Z , Z = H, 1-4C alkyl or polymerizable groups, at least one being a polymerizable group; X = an n-valent chiral group; m, o, p = 0 or 1; n = 1-6. Independent claims are also included: (1) use of the liquid crystal compositions as photostable UV reflectors; (2) use of the liquid crystal compositions as UV stabilizers in cosmetic and pharmaceutical formulations; (3) pigments containing the polymerized liquid crystal compositions.

    Cosmetic and pharmaceutical preparations comprising photostable UV filt ers
    46.
    发明专利
    Cosmetic and pharmaceutical preparations comprising photostable UV filt ers 未知

    公开(公告)号：AU8936798A

    公开(公告)日：1999-05-06

    申请号：AU8936798

    申请日：1998-10-16

    Applicant: BASF AG

    Inventor： HABECK THORSTEN ,  WUNSCH THOMAS ,  WESTENFELDER HORST ,  SCHEHLMANN VOLKER ,  HAREMZA SYLKE

    IPC: A61K8/00 ,  A61K8/40 ,  A61K31/00 ,  A61P17/00 ,  A61P17/16 ,  A61Q1/04 ,  A61Q17/04 ,  A61K7/42

    Abstract: Photo-stable ultraviolet (UV) filters for cosmetic or pharmaceutical use consist of substituted alpha -methyl-styrene derivatives (I). The use of substituted alpha -methyl-styrene derivatives of formula (I), optionally in combination with conventional UV absorbers, as photo-stable UV filters in cosmetic or pharmaceutical preparations for protecting human skin or hair against sunlight is new. R1 = 4-10C alkoxy, 1-12C alkylamino, 1-12C dialkylamino (sic) or a water-solublizing group selected from carboxylate, sulfonate and ammonium residues; R2 = H, 2-10C alkyl or 1-12C alkoxy; R3,R4 = COOR5, COR5, CONR5R6 or CN, R4 and R5 being the same; R5,R6 = H, 1-12C alkyl, 2-10C alkenyl, 3-10C cycloalkyl, 3-10C cycloalkenyl, aryl or heteroaryl (optionally substituted). Independent claims are given for: (1) the use of (I) as photostable UV-A filters; (2) the use of (I) as UV stabilizers; (3) cosmetic and pharmaceutical compositions for protecting human epidermis or skin against UV light in the 280-400 nm region, comprising a carrier containing (I) (as photostable UV filter) and optionally conventional UV absorbers; (4) (I) for use as medicaments; and (5) pharmaceutical preparations containing (I).

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