LOW-K DIELECTRICS OBTAINABLE BY TWIN POLYMERIZATION
    48.
    发明公开
    LOW-K DIELECTRICS OBTAINABLE BY TWIN POLYMERIZATION 有权
    BY双极化可收回的低介电常数材料

    公开(公告)号:EP2272068A1

    公开(公告)日:2011-01-12

    申请号:EP09738126.3

    申请日:2009-04-28

    Applicant: BASF SE

    CPC classification number: H01B3/441 C08G77/00 C08J9/26 C08J2383/00

    Abstract: The invention relates to a dielectric layer with a permittivity of 3.5 or less comprising a dielectric obtainable by polymerizing at least one twin monomer comprising a) a first monomer unit which comprises a metal or semimetal, and b) a second monomer unit which is connected to the first monomer unit via a chemical bond, wherein the polymerization involves polymerizing the twin monomer with breakage of the chemical bond and formation of a first polymer comprising the first monomer unit and of a second polymer comprising the second monomer unit, and wherein the first and the second monomer unit polymerize via a common mechanism.

    VERFAHREN ZUR HERSTELLUNG VON POLYISOBUTENYLPHENOLEN
    49.
    发明授权
    VERFAHREN ZUR HERSTELLUNG VON POLYISOBUTENYLPHENOLEN 有权
    用于生产polyisobutenylphenols

    公开(公告)号:EP1328557B1

    公开(公告)日:2009-03-25

    申请号:EP01972083.8

    申请日:2001-09-27

    Applicant: BASF SE

    CPC classification number: C08F8/02 C08F10/10

    Abstract: The invention relates to a method for producing polyisobutenylphenols by alkylation of an aromatic hydroxy compound with substantially singly ethylenically unsaturated polyisobutylenes substantially homopolymers in the presence of a Lewis Acid alkylation catalyst. The method is characterised in that the polyisobutylene contains at least 35 mol- % of a double bond in position β.

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