公开(公告)号：EP2252557A4

公开(公告)日：2013-07-03

申请号：EP09708945

申请日：2009-02-05

Applicant: CORNING INC

Inventor： AMIN JAYMIN ,  BACA ADRA S ,  BEALL LORRIE F ,  BELLMAN ROBERT A ,  OUYANG MICHAEL X ,  SABIA ROBERT

IPC: C03C17/30 ,  C03C17/42

CPC classification number: C03C17/30 ,  C03C3/085 ,  C03C3/087 ,  C03C3/091 ,  C03C17/42 ,  C03C21/002 ,  C03C2217/42 ,  C03C2217/732 ,  C03C2217/75 ,  C03C2217/76 ,  C03C2217/77 ,  C03C2218/31 ,  Y10T428/24364 ,  Y10T428/24967 ,  Y10T428/266

公开(公告)号：EP2252558A4

公开(公告)日：2014-08-27

申请号：EP09708243

申请日：2009-02-05

Applicant: CORNING INC

Inventor： GLAESEMANN GREGORY S ,  PRICE JAMES J ,  SABIA ROBERT ,  SHASHIDHAR NAGARAJA

IPC: C03C3/091 ,  C03C21/00

CPC classification number: C03C21/002 ,  C03C3/091 ,  Y10T428/31 ,  Y10T428/315

公开(公告)号：EP1218796A4

公开(公告)日：2006-08-23

申请号：EP00945368

申请日：2000-07-13

Applicant: CORNING INC

Inventor： DAVIS CLAUDE L ,  HRDINA KENNETH E ,  SABIA ROBERT

IPC: G03F7/20 ,  C23C14/02 ,  C23C28/00 ,  G02B5/08 ,  G03F1/00 ,  G03F1/24 ,  G03F1/60 ,  G21K1/06 ,  G21K5/00 ,  H01L21/027

CPC classification number: G21K1/062 ,  B82Y10/00 ,  B82Y40/00 ,  G02B17/06 ,  G03F1/24 ,  G03F1/60 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70283 ,  G03F7/70891 ,  G03F7/70958 ,  Y10S438/947 ,  Y10S438/974

Abstract: The present invention relates to reflective masks and their use for reflecting extreme ultraviolet soft x-ray photons to enable the use of extreme ultraviolet soft x-ray radiation projection lithographic methods and systems for producing integrated circuits and forming patterns with extremely small feature dimensions. The projection lithographic method includes providing an illumination sub-system for producing and directing an extreme ultraviolet soft x-ray radiation μ from an extreme ultraviolet soft x-ray source; providing a mask sub-system illuminated by the extreme ultraviolet soft x-ray radiation μ produced by the illumination sub-system and providing the mask sub-system includes providing a patterned reflective mask for forming a projected mask pattern when illuminated by radiation μ. Providing the patterned reflective mask includes providing a Ti doped high purity SiO2 glass wafer with a patterned absorbing overlay overlaying the reflective multilayer coated Ti doped high purity SiO2 glass defect free wafer surface that has an Ra roughness ≤0.15 nm. The method includes providing a projection sub-system and a print media subject wafer which has a radiation sensitive wafer surface wherein the projection sub-system projects the projected mask pattern from the patterned reflective mask onto the radiation sensitive wafer surface.

公开(公告)号：EP1349700A4

公开(公告)日：2005-07-06

申请号：EP01993210

申请日：2001-10-21

Applicant: CORNING INC

Inventor： SABIA ROBERT

IPC: G02B1/02 ,  B24B1/00 ,  B24B7/24 ,  B24B13/00 ,  B24B37/00 ,  B24B57/02 ,  C03C19/00 ,  C09G1/02 ,  C30B33/00

CPC classification number: B24B13/00 ,  C30B29/12 ,  C30B33/00

Abstract: The method of making optical fluoride crystal components provide optical components with beneficial final polished transmission surfaces for transmitting below 200 nm wavelengths of light, such as produced by excimer lasers and utilized in optical lithography. The invention utilizes colloidal silica soot in the polishing of optical fluoride crystal surfaces. This colloidal silica soot is a byproduct of chemical vapor deposition processing of fused silica or ultra low expansion glasses. The colloidal silica byproduct is referred to as "soot". Retaining the same physical properties as the parent glass and having a spherical morphology, the colloidal silica soot is an ideal for final polishing applications of optical fluoride crystals, and particularly for optical fluoride crystals such as calcium fluoride which have high transmission levels to below 300 nm light such as produced by excimer lasers. The soot has a large particle size and spherical shape when compared to conventional colloidal or fumed silica.