公开(公告)号：AU9690201A

公开(公告)日：2002-05-06

申请号：AU9690201

申请日：2001-09-25

Applicant: CORNING INC

Inventor： AKWANI IKERIONWU A ,  BELLMAN ROBERT A ,  GRANDI THOMAS P ,  SACHENIK PAUL A

IPC: C03C17/22 ,  C03C17/34 ,  C23C16/30 ,  G02B6/122 ,  G02B6/132 ,  G02B6/00

Abstract: The present invention provides a method of manufacturing optical devices which includes the steps of providing a substrate and forming at least one optical layer on the substrate. The optical layer is formed by a chemical vapor deposition (CVD) process which includes a deuterated source gas. The present invention also provides an optical device which includes a substrate and an optical layer including deuterium.

公开(公告)号：AU1432201A

公开(公告)日：2001-06-06

申请号：AU1432201

申请日：2000-10-10

Applicant: CORNING INC

Inventor： AKWANI IKERIONWU A ,  BELLMAN ROBERT A ,  GRANDI THOMAS P ,  SACHENIK PAUL A

IPC: G02B6/12 ,  C01B21/082 ,  C03B19/14 ,  C03B32/00 ,  C03C3/04 ,  C03C3/11 ,  C03C17/02 ,  G02F1/13357

Abstract: A composition represented by the formula Si1-xGexO2(1-y)N1.33y, wherein x is from about 0.05 to about 0.6 and y is from about 0.14 to about 0.74 exhibits properties highly suited for use in fabricating waveguides for liquid crystal based optical devices. In particular, the compositions have an index of refraction of from about 1.6 to about 1.8 for light at a wavelength of 1550 nm, and/or a coefficient of thermal expansion of from about 2.5x10-6°C-1 to about 5.0x10-6° C.-1. The compositions also have inherently low hydrogen content, and a high hydrogen permeability which allows better hydrogen removal by thermal annealing to provide a material which exhibits low optical losses and better etching properties than alternative materials.

公开(公告)号：CA2389699A1

公开(公告)日：2001-05-10

申请号：CA2389699

申请日：2000-10-10

Applicant: CORNING INC

Inventor： UKRAINCZYK LJERKA ,  BELLMAN ROBERT A

IPC: C03C10/00 ,  C03C15/00 ,  G02B6/12 ,  G02B6/13 ,  G02B6/136

Abstract: A relatively facile, inexpensive method for patterning a layer of glass or a substrate involves patterning a seed material containing a nucleating agent adjacent a layer of thermally-crystallizable glass and heat treating the see d material and the layer of thermally-crystallizable glass to induce highly oriented crystal growth from the seed material through the thickness of the thermally-crystallizable glass layer at selected portions thereof. After the heat treatment, the layer of thermally-crystallizable glass is converted int o a desired pattern of glass surrounded by crystalline material. The crystalli ne material is removed with an etchant to leave a desired glass pattern.

公开(公告)号：AU2011293715A1

公开(公告)日：2013-01-31

申请号：AU2011293715

申请日：2011-08-11

Applicant: CORNING INC

Inventor： BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  DENEKA DAVID A ,  O'MALLEY SHAWN M ,  SCHNEIDER VITOR M

IPC: C25D11/32

Abstract: Methods of fabricating dimensional silica-based substrates or structures comprising a porous silicon layers are contemplated. According to one embodiment, oxygen is extracted from the atomic elemental composition of a silica glass substrate by reacting a metallic gas with the substrate in a heated inert atmosphere to form a metal-oxygen complex along a surface of the substrate. The metal-oxygen complex is removed from the surface of the silica glass substrate to yield a crystalline porous silicon surface portion and one or more additional layers are formed over the crystalline porous silicon surface portion of the silica glass substrate to yield a dimensional silica-based substrate or structure comprising the porous silicon layer. Embodiments are also contemplated where the substrate is glass-based, but is not necessarily a silica-based glass substrate. Additional embodiments are disclosed and claimed.

公开(公告)号：CA2391202A1

公开(公告)日：2001-05-17

申请号：CA2391202

申请日：2000-10-10

Applicant: CORNING INC

Inventor： SACHENIK PAUL A ,  AKWANI IKERIONWU A ,  GRANDI THOMAS P ,  BELLMAN ROBERT A

IPC: G02B6/12 ,  C01B21/082 ,  C03B19/14 ,  C03B32/00 ,  C03C3/04 ,  C03C3/11 ,  C03C17/02 ,  G02F1/13357

Abstract: A composition represented by the formula Si1-xGexO2(1-y)N1.33y, wherein x is from about 0.05 to about 0.6 and y is from about 0.14 to about 0.74 exhibits properties highly suited for use in fabricating waveguides for liquid crysta l based optical devices. In particular, the compositions have an index of refraction of from about 1.6 to about 1.8 for light at a wavelength of 1550 nm, and/or a coefficient of thermal expansion of from about 2.5 x 10-6~C-1 t o about 5.0 x 10-6~C-1. The compositions also have inherently low hydrogen content, and a high hydrogen permeability which allows better hydrogen remov al by thermal annealing to provide a material which exhibits low optical losses and better etching properties than alternative materials.

公开(公告)号：WO2012027121A3

公开(公告)日：2012-08-09

申请号：PCT/US2011047367

申请日：2011-08-11

Applicant: CORNING INC ,  BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  DENEKA DAVID A ,  O'MALLEY SHAWN M ,  SCHNEIDER VITOR M

Inventor： BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  DENEKA DAVID A ,  O'MALLEY SHAWN M ,  SCHNEIDER VITOR M

IPC: C25D11/32

CPC classification number: C03C23/0095 ,  C03C23/008 ,  H01L21/02002 ,  H01L21/02422 ,  H01L21/0245 ,  H01L21/02513 ,  H01L21/02532 ,  H01L21/02658 ,  H01L21/2257 ,  H01L21/3221 ,  H01L29/78603 ,  Y10T428/249969

Abstract: Methods of fabricating dimensional silica-based substrates or structures comprising a porous silicon layers are contemplated. According to one embodiment, oxygen is extracted from the atomic elemental composition of a silica glass substrate by reacting a metallic gas with the substrate in a heated inert atmosphere to form a metal-oxygen complex along a surface of the substrate. The metal-oxygen complex is removed from the surface of the silica glass substrate to yield a crystalline porous silicon surface portion and one or more additional layers are formed over the crystalline porous silicon surface portion of the silica glass substrate to yield a dimensional silica-based substrate or structure comprising the porous silicon layer. Embodiments are also contemplated where the substrate is glass-based, but is not necessarily a silica-based glass substrate. Additional embodiments are disclosed and claimed.

Abstract translation: 考虑制造尺寸二氧化硅基底或包括多孔硅层的结构的方法。 根据一个实施方案，通过在加热的惰性气氛中使金属气体与衬底反应，从石英玻璃衬底的原子元素组合物中提取氧，以沿着衬底的表面形成金属 - 氧络合物。 从石英玻璃基板的表面除去金属 - 氧络合物，得到结晶多孔硅表面部分，并且在石英玻璃基板的结晶多孔硅表面部分上形成一个或多个附加层，得到尺寸二氧化硅基 包括多孔硅层的衬底或结构。 也可以考虑实施方案，其中基材是基于玻璃的，但不一定是二氧化硅基玻璃基材。 公开并要求保护附加实施例。

公开(公告)号：WO2009105190A2

公开(公告)日：2009-08-27

申请号：PCT/US2009000988

申请日：2009-02-17

Applicant: CORNING INC ,  BELLMAN ROBERT A ,  BOUTON WILLIAM J ,  HALL DOUGLAS W ,  MATTHEWS KAREN I ,  UKRAINCZYK LJERKA

Inventor： BELLMAN ROBERT A ,  BOUTON WILLIAM J ,  HALL DOUGLAS W ,  MATTHEWS KAREN I ,  UKRAINCZYK LJERKA

IPC: F24J2/05 ,  F24J2/46 ,  F24J2/48

CPC classification number: F24J2/055 ,  F24J2/4636 ,  F24J2/4652 ,  F24J2/48 ,  Y02E10/44

Abstract: A solar heat collection element includes: a central tube formed from glass-ceramic material; and an outer tube formed from glass material disposed coaxially with respect to the central tube to form a volume therebetween.

Abstract translation: 太阳能热收集元件包括：由玻璃陶瓷材料形成的中心管; 以及由相对于中心管同轴设置的玻璃材料形成的外管，以在它们之间形成体积。

公开(公告)号：EP2252557A4

公开(公告)日：2013-07-03

申请号：EP09708945

申请日：2009-02-05

Applicant: CORNING INC

Inventor： AMIN JAYMIN ,  BACA ADRA S ,  BEALL LORRIE F ,  BELLMAN ROBERT A ,  OUYANG MICHAEL X ,  SABIA ROBERT

IPC: C03C17/30 ,  C03C17/42

CPC classification number: C03C17/30 ,  C03C3/085 ,  C03C3/087 ,  C03C3/091 ,  C03C17/42 ,  C03C21/002 ,  C03C2217/42 ,  C03C2217/732 ,  C03C2217/75 ,  C03C2217/76 ,  C03C2217/77 ,  C03C2218/31 ,  Y10T428/24364 ,  Y10T428/24967 ,  Y10T428/266

公开(公告)号：EP2609234A4

公开(公告)日：2015-11-04

申请号：EP11820371

申请日：2011-08-11

Applicant: CORNING INC

Inventor： BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  DENEKA DAVID A ,  O'MALLEY SHAWN M ,  SCHNEIDER VITOR M

IPC: C03C23/00 ,  H01L21/02 ,  H01L21/225 ,  H01L21/322 ,  H01L29/786

CPC classification number: C03C23/0095 ,  C03C23/008 ,  H01L21/02002 ,  H01L21/02422 ,  H01L21/0245 ,  H01L21/02513 ,  H01L21/02532 ,  H01L21/02658 ,  H01L21/2257 ,  H01L21/3221 ,  H01L29/78603 ,  Y10T428/249969

公开(公告)号：WO2004107044A3

公开(公告)日：2005-04-14

申请号：PCT/US2004015243

申请日：2004-05-13

Applicant: BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  HARES GEORGE B ,  SMITH CHARLENE M ,  WALTON ROBIN M ,  CORNING INC

Inventor： BELLMAN ROBERT A ,  BORRELLI NICHOLAS F ,  HARES GEORGE B ,  SMITH CHARLENE M ,  WALTON ROBIN M

IPC: C03C3/064 ,  C03C3/091 ,  C03C15/00 ,  G03F1/30 ,  G03F1/32 ,  G03F1/34 ,  G03F1/14 ,  G02B6/16 ,  G03F1/00

CPC classification number: G03F1/30 ,  C03C3/064 ,  C03C3/091 ,  C03C15/00 ,  G03F1/32 ,  G03F1/34

Abstract: Disclosed are masks and mask blanks for photolithographic processes, photosensitive materials and fabrication method therefor. Photosensitive materials are used in the masks for recording permanent pattern features via UV exposure. The masks are advantageously phase-shifting, but can be gray-scale masks having index patterns with arbitrary distribution of refractive index and pattern dimension. The masks may have features above the surface formed from opaque or attenuating materials. Alumino-boro-germano-silicate glasses having a composition comprising, in terms of mole percentage, 1-6% of Al2O3, 10-36% of B2O3, 2-20% of GeO2, 40-80% of SiO2, 2-10% of R2O, where R is selected from Li, Na and K, and expressed in terms of weight percentage of the glass, 0-5% of F, can be used for the mask substrate.

Abstract translation: 公开了用于光刻工艺的掩模和掩模坯料，感光材料及其制造方法。 光敏材料用于通过紫外线曝光记录永久图案特征的掩模。 掩模有利地是相移，但是可以是具有折射率和图案尺寸的任意分布的索引图案的灰度掩模。 掩模可以具有由不透明或衰减材料形成的表面上方的特征。 氧化铝 - 硼 - 锗酸 - 硅酸盐玻璃，其组成包括以摩尔百分比计为1〜6％的Al 2 O 3，10-36％的B 2 O 3，2〜20％的GeO 2，40〜80％的SiO 2，2-10 R 2选自Li，Na和K的R 2 O％，并且以玻璃重量百分比表示，0-5％的F可以用于掩模基板。