公开(公告)号：DE68919346D1

公开(公告)日：1994-12-15

申请号：DE68919346

申请日：1989-12-16

Applicant: IBM

Inventor： DOBUZINSKY DAVID M ,  HAKEY MARK C ,  HOLMES STEVEN J ,  HORAK DAVID V

IPC: C08G77/06 ,  C08G77/48 ,  C08G77/60 ,  C09D183/00 ,  C09D183/16 ,  C23C14/14 ,  C23C14/24 ,  G03F7/075 ,  G03F7/16 ,  H01L21/027 ,  H01L21/30 ,  H01L21/312

Abstract: Disclosed is a process for forming a film comprising a polysilane composition on a substrate. The film is formed by vapor deposition directly on a substrate, thus avoiding the cumbersome steps ordinarily encountered in preparing and applying polysilanes by conventional spin application techniques. The film is used in a lithographic process for forming an image on a substrate.

公开(公告)号：BR9101512A

公开(公告)日：1991-12-03

申请号：BR9101512

申请日：1991-04-15

Applicant: IBM

Inventor： HAKEY MARK C ,  HORAK DAVID V ,  RATH PETER C

IPC: G11B21/02 ,  G11B21/21 ,  G11B19/20

Abstract: An actuator comprises a slotted stator which is mounted in a stator frame. The stator is connected to the frame by attachment means which allows the stator to move rotationally, axially and laterally relative to the frame without distorting the dimensions of the stator. The stator has an air bearing outer surface which receives a slider. A head arm assembly is attached to the slider such that the head arm assembly may be completely positioned within the stator slot when the slider is fully retracted.