公开(公告)号：CZ20020791A3

公开(公告)日：2002-11-13

申请号：CZ20020791

申请日：2000-08-01

Applicant: OSMIC

Inventor： JIANG LICAI ,  VERMAN BORIS

IPC: G02B26/00 ,  G02B5/08 ,  G02B5/26 ,  G02B5/28 ,  G21K1/06 ,  G21K1/00

CPC classification number: B82Y10/00 ,  G02B5/0891 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

公开(公告)号：CZ20013642A3

公开(公告)日：2002-10-16

申请号：CZ20013642

申请日：2000-04-07

Applicant: OSMIC

Inventor： VERMAN BORIS ,  JIANG LICAI ,  BONGLEA KIM ,  JOENSEN KARSTEN DAN

IPC: G21K1/06 ,  G21K5/02

Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.

公开(公告)号：CZ20003041A3

公开(公告)日：2001-05-16

申请号：CZ20003041

申请日：1999-02-18

Applicant: OSMIC

Inventor： GUTMAN GEORGE ,  JIANG LICAI ,  VERMAN BORIS

IPC: G21K1/06

Abstract: An x-ray reflecting system comprising a plurality of x-ray reflectors, wherein the x-ray reflectors are coupled together to form a Kirkpatrick-Baez side-by-side system of multiple corners and may include multi-layer or graded-d multi-layer Bragg x-ray reflective surfaces.

公开(公告)号：AU6511100A

公开(公告)日：2001-02-19

申请号：AU6511100

申请日：2000-08-01

Applicant: OSMIC INC

Inventor： JIANG LICAI ,  VERMAN BORIS

IPC: G02B26/00 ,  G02B5/08 ,  G02B5/26 ,  G02B5/28 ,  G21K1/06

Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.

公开(公告)号：CA2642736A1

公开(公告)日：2001-02-08

申请号：CA2642736

申请日：2000-08-01

Applicant: OSMIC INC

Inventor： JIANG LICAI ,  VERMAN BORIS

IPC: G02B26/00 ,  G21K1/06 ,  G02B5/08 ,  G02B5/26 ,  G02B5/28

Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.