公开(公告)号：JP2000298341A

公开(公告)日：2000-10-24

申请号：JP10685599

申请日：1999-04-14

Applicant: TORAY INDUSTRIES

Inventor： FUJITA YOJI ,  TOMIKAWA MASAO ,  OKUDA RYOJI

IPC: G03F7/022 ,  C08G69/26 ,  G03F7/037

Abstract: PROBLEM TO BE SOLVED: To enable development with an aqueous alkali solution and to attain a very high rate of a residual film by incorporating a polymer having specified structural units as a main component and a specified quinonediazido compound. SOLUTION: The positive type photosensitive resin precursor composition contains a polymer having a structural unit of formula I as a main component and a quinonediazido compound of formula II. In the formula I, R1 is a >=2C di- to octavalent organic group, R2 is a >=2C di- to hexavalent organic group, R3 is H or a 1-20C organic group, (n) is an integer of 10-10,000, (m) is an integer of 0-2 and (p) and (q) are each an integer of 0-4. In the formula II, R4 and R6 are each a 1-20C monovalent organic group, R5 is a >=2C di- to octavalent organic group and b+d and c+e are each an integer of 0-4.

公开(公告)号：JP2000194133A

公开(公告)日：2000-07-14

申请号：JP28654699

申请日：1999-10-07

Applicant: TORAY INDUSTRIES

Inventor： TOMIKAWA MASAO ,  OKUDA RYOJI ,  FUJITA YOJI

IPC: H01L21/027 ,  C08L79/08 ,  G03F7/022 ,  G03F7/037 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive resin precursor composition developable in alkali in a short time and small in erosion due to development in unexposed areas by incorporating polymer composed essentially of a specified structural units and at least one of specified quinone diazide compounds. SOLUTION: The color photosensitive resin composition contains the polymer composed essentially of structural units represented by formula I and at least one of the quinonediazide compounds each represented by formula II and in formulae I and II, R1 is a >=2C divalent organic group; R2 is a >=2C 3- to 6- valent organic group; (n) is an integer of 1-100,000; (m) is 0, 1, or 2; (q) is an integer of 1-4; (x) is 0, 1, or 2; and all of plural Q are not an H atom at the same time.

公开(公告)号：EP2757578A4

公开(公告)日：2015-05-20

申请号：EP12832538

申请日：2012-09-13

Applicant: TORAY INDUSTRIES

Inventor： NORO YOHEI ,  OKUDA RYOJI ,  FUKUDA SEIJI

IPC: H01L21/304 ,  B24B37/26

CPC classification number: B24B37/26

公开(公告)号：EP2732917A4

公开(公告)日：2015-04-15

申请号：EP12815419

申请日：2012-07-12

Applicant: TORAY INDUSTRIES

Inventor： TAKEUCHI NANA ,  FUKUDA SEIJI ,  OKUDA RYOJI

IPC: B24B37/26

CPC classification number: B24B37/26 ,  B24B37/16 ,  B24D11/00

公开(公告)号：EP1296540A4

公开(公告)日：2007-02-21

申请号：EP01941258

申请日：2001-06-26

Applicant: TORAY INDUSTRIES

Inventor： OKUDA RYOJI ,  FUJIMORI SHIGEO ,  OKA TETSUO ,  TOMIKAWA MASAO

IPC: H05B33/22 ,  G02F1/1333 ,  G02F1/1343 ,  G03F7/023 ,  G03F7/039 ,  G09F9/30 ,  H01L27/00 ,  H01L27/32 ,  H05B33/14 ,  H05B33/26

CPC classification number: H01L27/3283 ,  G02F1/133345 ,  G02F1/134309 ,  G02F1/134336 ,  G03F7/0233 ,  G03F7/0392 ,  Y10T428/10

Abstract: A display device having a polyimide insulating layer is disclosed. The display device has a first electrode formed on a substrate, the polyimide insulating layer formed on the first electrode in such a way that the first electrode is partially exposed, and a second electrode facing the first electrode, wherein the polyimide insulating layer is a positive-type photosensitive polyimide.

公开(公告)号：EP1037112A4

公开(公告)日：2002-12-18

申请号：EP99940701

申请日：1999-09-07

Applicant: TORAY INDUSTRIES

Inventor： TOMIKAWA MASAO ,  OKAMOTO NAOYO ,  YOSHIDA SATOSHI ,  OKUDA RYOJI

IPC: C08G73/10 ,  C08L79/08 ,  G03F7/023 ,  G03F7/039 ,  G03F7/022 ,  G03F7/037 ,  G03F7/075

CPC classification number: G03F7/0233 ,  C08G73/1025 ,  C08L79/08

Abstract: A positive photosensitive resin precursor composition characterized by comprising (a) a polymer consisting mainly of structural units bonded to each other in the manner shown by general formula (1) and (b) a photo-acid generator, being capable of forming a pattern through light irradiation and subsequent development, and having a total carboxyl group content of 0.02 to 2.0 mmol per g of the polymer. It provides a photosensitive resin composition which is capable of alkali development and is highly sensitive. (R represents a tri- to octavalent C2+ organic group; R represents a di- to hexavalent C2+ organic group; R represents hydrogen or a C1-20 organic group; n is an integer of 3 to 100,000; m is 1 or 2; and p and q each is an integer of 0 to 4, provided that p+q>0).

Abstract translation: 本发明涉及一种正型感光性树脂前体组合物的所有其特征DASS它含有（a）聚合物，其中主要组分包括其中结构单元之间的键合是通过通式种结构单元（1）和 （b）中光产酸剂，和它可形成由包含在所述聚合物光照射和随后的显影，并且总羧基的图案是从0点02至2.0毫摩尔/ g，且它提供了高灵敏度后者可以是感光性树脂组合物 碱开发。 （R <1>是化合价的有机基团3至8个具有至少2个碳原子，R <2>是化合价的有机基团的2至6具有至少2个碳原子，R <3> 是氢或有机基团具有1至20个碳原子。N + q为> 0至3的整数值至100,000，m是1或2，p和q是从0的值至4的整数且p）