公开(公告)号：EP3195301A4

公开(公告)日：2018-07-18

申请号：EP15842292

申请日：2015-09-14

Applicant: VIEW INC

Inventor： PRADHAN ANSHU A

IPC: G09G3/38 ,  G02F1/163

CPC classification number: G09G3/38 ,  G02F1/163 ,  G09G2320/0252

Abstract: The embodiments herein relate to methods for controlling an optical transition in an optically switchable device, and optically switchable devices and systems configured to perform such methods. In various embodiments, non-optical (e.g., electrical) feedback is used to help control an optical transition. The feedback may be used for a number of different purposes. In many implementations, the feedback is used to control an ongoing optical transition.

公开(公告)号：EP3008514A4

公开(公告)日：2017-02-22

申请号：EP14810785

申请日：2014-06-12

Applicant: VIEW INC

Inventor： MARTIN TODD ,  DIXIT ABHISHEK ANANT ,  STRONG FABIAN ,  PRADHAN ANSHU A

IPC: G02F1/15

CPC classification number: G02F1/1533 ,  G02F1/1523 ,  G02F1/155 ,  G02F2001/1536 ,  G02F2001/1555 ,  G02F2201/08

公开(公告)号：EP2954370A4

公开(公告)日：2016-09-14

申请号：EP14749144

申请日：2014-02-07

Applicant: VIEW INC

Inventor： KAILASAM SRIDHAR K ,  FRIEDMAN ROBIN ,  GILLASPIE DANE ,  PRADHAN ANSHU A ,  ROZBICKI ROBERT T ,  MEHTANI DISHA

IPC: G02F1/15

CPC classification number: G02F1/1533 ,  C23C14/028 ,  C23C14/06 ,  C23C14/0635 ,  C23C14/0641 ,  C23C14/0652 ,  C23C14/0676 ,  C23C14/08 ,  C23C14/081 ,  C23C14/083 ,  C23C14/086 ,  C23C14/34 ,  G02F1/1309 ,  G02F1/133345 ,  G02F1/15 ,  G02F1/1523 ,  G02F1/155 ,  G02F2001/1536 ,  G02F2001/1555 ,  G02F2201/508 ,  H01B5/14 ,  H01B13/00 ,  H01J37/3429 ,  H01J37/3476

Abstract: Electrochromic devices and methods may employ the addition of a defect-mitigating insulating layer which prevents electronically conducting layers and/or electrochromically active layers from contacting layers of the opposite polarity and creating a short circuit in regions where defects form. In some embodiments, an encapsulating layer is provided to encapsulate particles and prevent them from ejecting from the device stack and risking a short circuit when subsequent layers are deposited. The insulating layer may have an electronic resistivity of between about 1 and 108 Ohm-cm. In some embodiments, the insulating layer contains one or more of the following metal oxides: aluminum oxide, zinc oxide, tin oxide, silicon aluminum oxide, cerium oxide, tungsten oxide, nickel tungsten oxide, and oxidized indium tin oxide. Carbides, nitrides, oxynitrides, and oxycarbides may also be used.

公开(公告)号：EP3164762A4

公开(公告)日：2018-02-28

申请号：EP15814398

申请日：2015-07-02

Applicant: VIEW INC

Inventor： DIXIT ABHISHEK ANANT ,  MARTIN TODD ,  PRADHAN ANSHU A

IPC: G02F1/155 ,  B23K26/36 ,  G02F1/161 ,  H05K3/02

CPC classification number: G02F1/155 ,  B23K26/36 ,  B23K26/364 ,  C03C2217/94 ,  E06B3/6722 ,  E06B2009/2464 ,  G02F1/161 ,  H01L31/1888 ,  H05K3/027 ,  H05K2203/10

Abstract: Certain aspects pertain to methods of fabricating an optical device on a substantially transparent substrate that include a pre-deposition operation that removes a width of lower conductor layer at a distance from the outer edge of the substrate to form a pad at the outer edge. The pad and any deposited layers of the optical device may be removed in a post edge deletion operation.

公开(公告)号：EP3137942A4

公开(公告)日：2018-01-03

申请号：EP15785891

申请日：2015-04-28

Applicant: VIEW INC

Inventor： PRADHAN ANSHU A ,  ROZBICKI ROBERT T ,  GILLASPIE DANE ,  KAILASAM SRIDHAR K

IPC: G02F1/15 ,  C03C17/34 ,  C23C14/56

CPC classification number: G02F1/1523 ,  C03C17/3417 ,  C03C17/3447 ,  C23C14/08 ,  C23C14/185 ,  C23C14/568 ,  G02F2202/06

Abstract: Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition. In certain embodiments, the device includes a counter electrode having an anodically coloring electrochromic material in combination with an additive.

公开(公告)号：EP3084518A4

公开(公告)日：2017-07-19

申请号：EP14872953

申请日：2014-12-18

Applicant: VIEW INC

Inventor： SHRIVASTAVA DHAIRYA ,  FRIEDMAN ROBIN ,  KHOSLA VINOD ,  MULPURI RAO ,  PRADHAN ANSHU A

IPC: G02F1/15 ,  E06B3/67 ,  E06B9/24 ,  G02F1/153 ,  G02F1/155 ,  G09F23/02

CPC classification number: E06B9/24 ,  B23K26/359 ,  E06B3/6715 ,  E06B3/6722 ,  E06B2009/2405 ,  E06B2009/2464 ,  G02F1/153 ,  G02F1/1533 ,  G09F23/02 ,  Y10T29/49002

公开(公告)号：EP3234691A4

公开(公告)日：2018-08-01

申请号：EP15870917

申请日：2015-12-15

Applicant: VIEW INC

Inventor： KAILASAM SRIDHAR K ,  SHRIVASTAVA DHAIRYA ,  CAI ZHIWEI ,  ROZBICKI ROBERT T ,  GILLASPIE DANE ,  MARTIN TODD ,  PRADHAN ANSHU A ,  PARKER RONALD M

IPC: G02F1/15

CPC classification number: G02F1/153 ,  G02F2201/508

Abstract: Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.

公开(公告)号：EP3011387A4

公开(公告)日：2016-11-30

申请号：EP14814624

申请日：2014-06-17

Applicant: VIEW INC

Inventor： DIXIT ABHISHEK ANANT ,  MARTIN TODD ,  PRADHAN ANSHU A ,  JACK GORDON ,  BHATNAGAR YASHRAJ

IPC: G02F1/15 ,  B23K26/082 ,  B29C59/16 ,  B29L11/00 ,  G01B21/02 ,  G01B21/20 ,  G02B27/00 ,  G02F1/153 ,  G02F1/163

CPC classification number: G02F1/163 ,  B23K26/082 ,  B29C59/16 ,  B29L2011/00 ,  G01B21/02 ,  G01B21/20 ,  G02B27/0012 ,  G02F1/153 ,  G02F1/1533 ,  G02F2201/56

Abstract: This present invention relates to bus bar configurations and fabrication methods of non-rectangular shaped (e.g., triangular, trapezoidal, circular, pentagonal, hexagonal, arched, etc.) optical devices. The optical device comprises a first side, a second side, and a third side adjacent to the second side and two bus bars spanning a portion of the optical device.

公开(公告)号：EP2845051A4

公开(公告)日：2016-05-04

申请号：EP13785049

申请日：2013-04-26

Applicant: VIEW INC

Inventor： PRADHAN ANSHU A ,  ROZBICKI ROBERT T

IPC: G02F1/15 ,  C23C14/56

CPC classification number: G02F1/1523 ,  C03C2217/91 ,  C23C14/083 ,  G02F1/1525 ,  G02F2001/1502 ,  G02F2001/1512

公开(公告)号：EP2699708A4

公开(公告)日：2014-08-06

申请号：EP12774507

申请日：2012-04-20

Applicant: VIEW INC

Inventor： NEUMANN MARTIN JOHN ,  NGUYEN QUE ANH SONG ,  MEHTANI DISHA ,  PRADHAN ANSHU A ,  ROZBICKI ROBERT T ,  SHRIVASTAVA DHAIRYA ,  KAILASAM SRIDHAR ,  FRANK TREVOR ,  SATERN JASON ,  MARTIN TODD

IPC: C23C14/34 ,  H01J37/34

CPC classification number: C23C14/3407 ,  C01B33/113 ,  C01G9/02 ,  C01G19/02 ,  C08L23/06 ,  C23C14/3414 ,  H01J37/3414 ,  H01J37/3426 ,  H01J37/3435

Abstract: Described are methods of fabricating lithium sputter targets, lithium sputter targets, associated handling apparatus, and sputter methods including lithium targets. Various embodiments address adhesion of the lithium metal target to a support structure, avoiding and/or removing passivating coatings formed on the lithium target, uniformity of the lithium target as well as efficient cooling of lithium during sputtering. Target configurations used to compensate for non-uniformities in sputter plasma are described. Modular format lithium tiles and methods of fabrication are described. Rotary lithium sputter targets are also described.

Abstract translation: 描述了制造锂溅射靶，锂溅射靶，相关处理装置和包括锂靶的溅射方法的方法。 各种实施例涉及锂金属靶对支撑结构的粘附，避免和/或去除在锂靶上形成的钝化涂层，锂靶的均匀性以及溅射期间锂的有效冷却。 描述了用于补偿溅射等离子体中的不均匀性的目标配置。 描述了模块化的锂砖及其制造方法。 还描述了旋转式锂溅射靶。