公开(公告)号：CA2914658A1

公开(公告)日：2014-12-18

申请号：CA2914658

申请日：2014-06-09

Applicant: VIEW INC

Inventor： FRANK TREVOR ,  ROZBICKI ROBERT T ,  SATERN JASON

IPC: C23C14/34 ,  B65G49/06

Abstract: Pallets for transporting one or more glass substrates in a substantially vertical orientation through a sputtering system. In some cases, a pallet comprising a frame with an aperture and an adjustable grid array within the aperture. The adjustable grid array is configurable to hold a plurality of glass substrates of different shapes and/or sizes. In one case, the adjustable grid array comprises a system of vertical and horizontal support bars, wherein the vertical support bars configured to both support the plurality of glass substrates at their vertical edges, wherein the horizontal support bars are configured to support the plurality of glass substrates at their horizontal edges, wherein the ends of the horizontal support bars are slideably engaged with the vertical support bars.

公开(公告)号：HK1220740A1

公开(公告)日：2017-05-12

申请号：HK16108915

申请日：2016-07-26

Applicant: VIEW INC

Inventor： FRANK TREVOR ,  ROZBICKI ROBERT T ,  SATERN JASON

IPC: B65G20060101 ,  C23C20060101

公开(公告)号：EP3008224A4

公开(公告)日：2017-03-01

申请号：EP14811203

申请日：2014-06-09

Applicant: VIEW INC

Inventor： FRANK TREVOR ,  ROZBICKI ROBERT T ,  SATERN JASON

IPC: C23C14/34 ,  B65G49/06 ,  H01L21/673

CPC classification number: H01J37/32715 ,  C23C14/34 ,  C23C14/50 ,  C23C14/562 ,  C23C14/568 ,  H01J37/32651 ,  H01J37/32779 ,  H01J2237/026 ,  H01J2237/2007 ,  H01J2237/20221 ,  H01J2237/332 ,  H01L21/6734 ,  H01L21/67712 ,  H01L21/6776

公开(公告)号：EP2699708A4

公开(公告)日：2014-08-06

申请号：EP12774507

申请日：2012-04-20

Applicant: VIEW INC

Inventor： NEUMANN MARTIN JOHN ,  NGUYEN QUE ANH SONG ,  MEHTANI DISHA ,  PRADHAN ANSHU A ,  ROZBICKI ROBERT T ,  SHRIVASTAVA DHAIRYA ,  KAILASAM SRIDHAR ,  FRANK TREVOR ,  SATERN JASON ,  MARTIN TODD

IPC: C23C14/34 ,  H01J37/34

CPC classification number: C23C14/3407 ,  C01B33/113 ,  C01G9/02 ,  C01G19/02 ,  C08L23/06 ,  C23C14/3414 ,  H01J37/3414 ,  H01J37/3426 ,  H01J37/3435

Abstract: Described are methods of fabricating lithium sputter targets, lithium sputter targets, associated handling apparatus, and sputter methods including lithium targets. Various embodiments address adhesion of the lithium metal target to a support structure, avoiding and/or removing passivating coatings formed on the lithium target, uniformity of the lithium target as well as efficient cooling of lithium during sputtering. Target configurations used to compensate for non-uniformities in sputter plasma are described. Modular format lithium tiles and methods of fabrication are described. Rotary lithium sputter targets are also described.

Abstract translation: 描述了制造锂溅射靶，锂溅射靶，相关处理装置和包括锂靶的溅射方法的方法。 各种实施例涉及锂金属靶对支撑结构的粘附，避免和/或去除在锂靶上形成的钝化涂层，锂靶的均匀性以及溅射期间锂的有效冷却。 描述了用于补偿溅射等离子体中的不均匀性的目标配置。 描述了模块化的锂砖及其制造方法。 还描述了旋转式锂溅射靶。