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    Method of fabricating a suspended micro-structure with a sloped support
    43.
    发明授权
    Method of fabricating a suspended micro-structure with a sloped support 有权
    用倾斜支架制造悬浮微结构的方法

    公开(公告)号：US06780570B2

    公开(公告)日：2004-08-24

    申请号：US09888989

    申请日：2001-06-25

    Applicant: Hubert Jerominek

    Inventor： Hubert Jerominek

    IPC: G03F716

    CPC classification number: B81C1/0019 ,  B81B2203/0118 ,  B81B2203/019 ,  B81B2203/0384 ,  B81C1/00396 ,  B81C2201/0157 ,  G03F7/2008

    Abstract: The method of fabricating a suspended microstructure with a sloped support, comprises the steps of (a) providing a member having three stacked up layers including a first substrate layer, a second temporary layer and a third photoresist layer; (b) photolithographically transferring a sloped pattern to the third photoresist layer by means of a grey scale mask; (c) etching the second layer through the third layer resulting from step (b) to obtain a surface with at least one continuous slope with a predetermined angle with respect to the first substrate layer; (d) depositing a fourth layer on the previous layers; (e) etching the fourth layer to obtain the sloped support; (f) (i) depositing a fifth planarization layer, (ii) depositing a sixth layer, and (iii) etching the sixth layer; and (g) removing the second layer and the fifth layer to obtain the suspended microstructure with the sloped support. The invention is also concerned with a suspended microstructure fabricated by the method.

    Abstract translation: 制造具有倾斜载体的悬浮微结构的方法包括以下步骤：（a）提供具有三层叠层的构件，其包括第一衬底层，第二临时层和第三光致抗蚀剂层; （b）通过灰度掩模将倾斜图案光刻地转印到第三光致抗蚀剂层; （c）通过步骤（b）得到的第三层蚀刻第二层，以获得具有相对于第一基底层具有预定角度的至少一个连续斜面的表面; （d）在先前的层上沉积第四层; （e）蚀刻第四层以获得倾斜的支撑; （f）（i）沉积第五平坦化层，（ii）沉积第六层，和（iii）蚀刻第六层; 和（g）去除第二层和第五层，以获得具有倾斜载体的悬浮微结构。 本发明还涉及通过该方法制造的悬浮微结构。

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