公开(公告)号：WO00058231A1

公开(公告)日：2000-10-05

申请号：PCT/JP2000/001869

申请日：2000-03-27

IPC: B08B7/00 ,  C03B19/14 ,  C03C3/06 ,  C03C23/00 ,  C03B20/00 ,  H01L21/027

CPC classification number: C03C23/002 ,  B08B7/0057 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C3/06 ,  C03C2201/23 ,  C03C2203/50 ,  Y02P40/57

Abstract: A process for producing a synthetic quartz glass for optical members, which comprises the step of irradiating a synthetic quartz glass having an OH group content of 50 ppm or lower with vacuum ultraviolet having a wavelength of 180 nm or shorter to improve the transmittance in a region of wavelengths not longer than 165 nm.

Abstract translation: 一种光学部件用合成石英玻璃的制造方法，其特征在于，包括使用波长为180nm以下的真空紫外线照射OH基含量为50ppm以下的合成石英玻璃以提高区域的透射率的工序 的波长不超过165nm。

公开(公告)号：WO00055689A1

公开(公告)日：2000-09-21

申请号：PCT/US2000/003588

申请日：2000-02-11

IPC: C03B19/14 ,  C03B20/00 ,  C03C3/06 ,  C03C4/00 ,  G03F1/00 ,  G03F7/20 ,  G03F1/14

CPC classification number: C03C4/0085 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1469 ,  C03B19/1492 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/02 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/32 ,  C03B2207/52 ,  C03B2207/54 ,  C03B2207/66 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/21 ,  G03F1/60

Abstract: The invention includes methods of making lithography photomask blanks. The invention also includes lithography photomask blanks and preforms for producing lithography photomask. The method of making a lithography photomask blank includes providing a soot deposition surface, producing SiO2 soot particles and projecting the SiO2 soot particles toward the soot deposition surface. The method includes successively depositing layers of the SiO2 soot particle on the deposition surface to form a coherent SiO2 porous glass preform body comprised of successive layers of the SiO2 soot particles and dehydrating the coherent SiO2 glass preform body to remove OH from the preform body. The SiO2 is exposed to and reacted with a fluorine containing compound and consolidated into a nonporous silicon oxyfluoride glass body with parallel layers of striae. The method further includes forming the consolidated silicon oxyfluoride glass body into a photomask blank having a planar surface with the orientation of the striae layer parallel to the photomask blank planar surface.

Abstract translation: 本发明包括制造光刻光掩模坯料的方法。 本发明还包括光刻光掩模坯料和用于生产光刻光掩模的预成型件。 制造光刻光掩模坯料的方法包括提供烟灰沉积表面，产生SiO 2烟灰颗粒并将SiO 2烟灰颗粒投射到烟灰沉积表面。 该方法包括在沉积表面上依次沉积SiO 2烟灰颗粒层，以形成由SiO 2烟灰颗粒的连续层组成的粘结SiO 2多孔玻璃预制体，并使相干的SiO 2玻璃预制体脱水以从预成型体中去除OH。 将SiO 2暴露于含氟化合物并与其反应，并固化成具有平行的条纹层的无孔氟硅氧化物玻璃体。 该方法还包括将固化的氟氧化硅玻璃体形成为具有平坦表面的光掩模坯料，其中条纹层的取向平行于光掩模坯料平面。

公开(公告)号：WO00024685A1

公开(公告)日：2000-05-04

申请号：PCT/JP1999/005995

申请日：1999-10-28

IPC: C03B8/04 ,  C03B19/14 ,  C03C3/06 ,  C03C23/00 ,  C03B20/00 ,  G02B1/00 ,  G03F1/16 ,  H01L21/027

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C23/002 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54 ,  Y02P40/57 ,  Y10S65/16 ,  Y10S501/90 ,  Y10S501/905

Abstract: A synthetic quartz glass for optical use which is used through irradiation of rays of light from the ultraviolet region to the vacuum ultraviolet region, characterized in that the quartz glass contains fluorine and has a ratio of the intensity of a scattering peak at 2250 cm (I 2250) to that of a scattering peak at 800 cm (I 800), that is I 2250/I 800, in a laser Raman spectrum of 1 x 10 or less and an absorption coefficient of the light having a wave length of 245 nm of 2 x 10 cm or less.

Abstract translation: 一种用于光学用途的合成石英玻璃，其通过从紫外线区域到真空紫外线区域的光线照射而被使用，其特征在于，所述石英玻璃含有氟并且具有在2250cm -1处的散射峰的强度比， 1×10 -4或更小的激光拉曼光谱中，在800cm -1（I 800）处的散射峰的峰值（I 2250）为I 2250 / I 800，吸收 波长245nm的光的系数为2×10 -3 cm -1以下。

公开(公告)号：WO98052879A1

公开(公告)日：1998-11-26

申请号：PCT/EP1998/002965

申请日：1998-05-20

IPC: C03B19/14 ,  C03B23/047 ,  C03B32/00 ,  C03C3/06 ,  C03C23/00 ,  G02B1/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B23/047 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/32 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/52

Abstract: An object of the present invention is to provide a synthetic silica glass optical material which exhibits excellent transmittance as well as durability for high output power vacuum ultraviolet rays, being emitted from, for example, ArF excimer lasers and Xe2 excimer lamps, and to provide a method for producing the same. A synthetic silica glass optical material for high output power vacuum ultraviolet rays made from ultra high purity synthetic silica glass for use in the wavelength region of from 165 to 195 nm, containing OH groups at a concentration of from 5 to 300 wtppm with a fluctuation width in OH group concentration ( DELTA OH/cm) of 10 wtppm or less, containing hydrogen molecules at a concentration of from 1 x 10 to 1 x 10 molecule/cm with a fluctuation width in hydrogen molecule concentration ( DELTA H2/cm) of 1 x 10 molecule/cm or lower, and containing chlorine at a concentration of 50 wtppm or lower. Also claimed is a method for producing the same.

Abstract translation: 本发明的目的是提供一种合成二氧化硅玻璃光学材料，其从例如ArF准分子激光器和Xe2准分子灯发射的高输出功率的真空紫外线具有优异的透射率和耐久性，并提供 其制造方法 一种用于高浓度合成石英玻璃的高输出功率真空紫外线的合成二氧化硅玻璃光学材料，用于波长范围为165至195nm的OH基，其浓度为5至300重量ppm，具有波动宽度 在OH分子浓度（DELTA OH / cm）为10重量ppm以下，含有浓度为1×10 17〜1×10 19分子/ cm 3的氢分子，氢分子的波动宽度 浓度（DELTA H2 / cm）为1×10 17分子/ cm 3以下，含有浓度为50重量ppm以下的氯。 还要求保护其的方法。

公开(公告)号：WO1997016382A1

公开(公告)日：1997-05-09

申请号：PCT/EP1996004746

申请日：1996-10-31

Applicant: HERAEUS QUARZGLAS GMBH ,  SHIN-ETSU QUARTZ PRODUCTS CO., LTD. ,  FUJINOKI, Akira ,  NISHIMURA, Hiroyuki ,  MORI, Toshiki

Inventor： HERAEUS QUARZGLAS GMBH ,  SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

IPC: C03B19/14

CPC classification number: C03B19/1453 ,  C03B19/1415 ,  C03B2201/21 ,  C03B2207/32 ,  C03C3/06 ,  C03C4/0085 ,  C03C23/002 ,  C03C2201/21 ,  C03C2203/40 ,  C03C2203/50 ,  C03C2203/54 ,  G02B1/00 ,  Y02P40/57

Abstract: The invention relates to process for producing a quartz glass optical body which is greatly resistive to irradiation of a laser having a short wavelength. According to the invention a quartz glass body is doped with hydrogen during and/or after production of the quartz glass body to a concentration in the range of 2 x 10 molecules/cm to 5 x 10 molecules/cm . To eliminate reduction-related defects induced by hydrogen in the bulk, the quartz glass body is irradiated with ultraviolet light of a wavelength in the range 150 nm to 300 nm. By such an irradiation hydrogen-induced defects occurring in production of synthetic quartz glass body by means of an oxyhydrogen flame or formed in a high-temperature hydrogen treatment are eliminated and thereby the quartz glass body is greatly improved in a stability against ultraviolet light. A quartz glass optical body according to the invention is especially suitable for use with an ArF eximer laser of 193 nm in wavelength or a YAG fifth harmonics laser of 213 nm in wavelength.

Abstract translation: 本发明涉及对具有短波长的激光的照射极大地抵抗的石英玻璃光学体的制造方法。 根据本发明，在制造石英玻璃体期间和/或之后，在2×10 17分子/ cm 3至5×10 19分子范围内的浓度下，石英玻璃体被掺杂氢 /厘米<3>。 为了消除体内由氢引起的还原相关缺陷，用波长为150nm至300nm的紫外线照射石英玻璃体。 通过这样的照射，消除了通过氢氧焰生产合成石英玻璃体或在高温氢处理中形成的氢诱发缺陷，从而大大提高了对紫外线的稳定性的石英玻璃体。 根据本发明的石英玻璃光学体系特别适用于波长193nm的ArF准分子激光器或波长为213nm的YAG五次谐波激光器。

公开(公告)号：US09822035B2

公开(公告)日：2017-11-21

申请号：US15144563

申请日：2016-05-02

Applicant: Adam Hokansson ,  David J Kudelko ,  Yaowen Li ,  Joanna Y Ng ,  Debra A Simoff

Inventor： Adam Hokansson ,  David J Kudelko ,  Yaowen Li ,  Joanna Y Ng ,  Debra A Simoff

IPC: G02B6/02 ,  C03C25/10 ,  C03B37/027 ,  B23K26/364 ,  B23K26/00 ,  C03C25/62

CPC classification number: C03C25/1062 ,  B23K26/359 ,  B23K26/364 ,  B23K26/50 ,  C03B37/027 ,  C03B2201/21 ,  C03B2201/22 ,  C03B2201/31 ,  C03B2203/22 ,  C03B2205/20 ,  C03C25/106 ,  C03C25/6208 ,  C03C2218/152 ,  G02B6/02114 ,  G02B6/02138 ,  G02B6/02395 ,  G02B2006/02161

Abstract: A technique is described for fabricating one or more optical devices in a carbon-coated optical fiber. A photosensitive optical fiber is provided having a hermetic carbon coating. Further provided is a laser having a beam output that is configured to inscribe one or more refractive index modulations into the optical fiber through the hermetic carbon layer while leaving the hermetic carbon layer intact. The laser is used to inscribe one or more optical devices into the optical fiber through the hermetic carbon layer.

公开(公告)号：US09291770B2

公开(公告)日：2016-03-22

申请号：US14320861

申请日：2014-07-01

Applicant: Thierry Robin ,  Arnaud Laurent

Inventor： Thierry Robin ,  Arnaud Laurent

IPC: G11B33/02 ,  G11B33/14 ,  G02B6/02 ,  G02B6/032 ,  C03B37/027 ,  C03C25/10 ,  C03C13/04 ,  G02B6/255

CPC classification number: G02B6/032 ,  C03B37/02781 ,  C03B2201/21 ,  C03B2201/22 ,  C03C13/045 ,  C03C25/104 ,  C03C25/1062 ,  C03C25/1063 ,  G02B6/02295 ,  G02B6/02328 ,  G02B6/2551 ,  G02B2006/0325

Abstract: A method of manufacturing a radiation-resistant optical fiber and a thus-obtained radiation-resistant optical fiber, the method includes the following steps: a) manufacturing a silica optical fiber preform; b) forming, in the preform, a longitudinal cavity; c) drawing the preform so as to form an optical fiber (1) including a core (2), an optical cladding (6) and at least one longitudinal cavity (3) having at least one opening (13) at one end of the optical fiber (1); d) applying, during step c) of fiber drawing, a gas-tight coating (4); e) exposing the optical fiber (1) to a gaseous substance, including preferably gaseous hydrogen and/or gaseous deuterium, in such a way to incorporate the gaseous substance in silica via the opening (13); and f) closing any opening (13) at both ends of the optical fiber.

Abstract translation: 一种制造耐辐射光纤和由此获得的耐辐射光纤的方法，该方法包括以下步骤：a）制造二氧化硅光纤预制棒; b）在预成型件中形成纵向腔; c）拉伸所述预成型件以便形成包括芯（2），光学包层（6）和至少一个纵向腔（3）的光纤（1），所述至少一个纵向空腔（3）在所述第一端 光纤（1）; d）在纤维拉伸的步骤c）期间施加气密涂层（4）; e）将光纤（1）暴露于气态物质（包括优选气态氢气和/或气态氘），以便通过所述开口（13）将所述气态物质并入二氧化硅中; 以及f）关闭光纤两端的任何开口（13）。

公开(公告)号：US20140373571A1

公开(公告)日：2014-12-25

申请号：US14269409

申请日：2014-05-05

Applicant: Corning Incorporated

Inventor： Kenneth Edward Hrdina ,  Changyi Lai ,  Lisa Anne Moore ,  Ulrich Wilhelm Heinz Neukirch ,  William Rogers Rosch

IPC: C03C23/00

CPC classification number: C03C23/0095 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/22 ,  C03C3/06 ,  C03C4/0085 ,  C03C21/007 ,  C03C2201/21 ,  C03C2201/22 ,  C03C2201/23 ,  C03C2203/54

Abstract: A fused silica glass article having greater resistance to damage induced by exposure to laser radiation such as laser induced wavefront distortion at deep ultraviolet (DUV) wavelengths, and behaviors such as fluence dependent transmission, which are related to intrinsic defects in the glass. The improved resistance to laser damage may be achieved in some embodiments by loading the glass article with molecular hydrogen (H2) at temperatures of about 400° C. or less, or 350° C. or less. The combined OH and deuteroxyl (OD) concentration may be less than 10 ppm by weight. In other embodiments, the improved resistance may be achieved by providing the glass with 10 to 60 ppm deuteroxyl (OD) species by weight. In still other embodiments, improved resistance to such laser damage may be achieved by both loading the glass article with molecular hydrogen at temperatures of about 350° C. or less and providing the glass with less than 10 ppm combined OH and OD, or 10 to 60 ppm OD by weight.

Abstract translation: 一种熔融石英玻璃制品，其具有较强的耐受暴露于激光辐射（例如在深紫外（DUV）波长处的激光诱导波前失真）以及与玻璃中的固有缺陷有关的诸如通量依赖透射的行为的损伤。 在一些实施方案中，可以通过在约400℃或更低或350℃或更低的温度下加载具有分子氢（H 2）的玻璃制品来实现对激光损伤的改进的抗性。 组合的OH和氘氧化（OD）浓度可以小于10ppm重量。 在其它实施方案中，可以通过为玻璃提供10至60ppm的重量的氘氧化（OD）种类来实现改进的电阻。 在另外的其它实施方案中，可以通过在大约350℃或更低的温度下将玻璃制品加载到分子氢中来提供对这种激光损伤的改进的抗性，并且使玻璃具有小于10ppm的组合的OH和OD，或10至 60ppm OD重量。

公开(公告)号：US08460769B2

公开(公告)日：2013-06-11

申请号：US13140982

申请日：2010-09-01

Applicant: Shigeru Yamagata ,  Tomomi Usui

Inventor： Shigeru Yamagata ,  Tomomi Usui

IPC: A47G19/22 ,  B28B21/00 ,  B28B21/72 ,  B28B23/08 ,  B29D22/00 ,  B29D23/00 ,  B32B1/08 ,  C03C17/32 ,  F16L9/10

CPC classification number: C03B19/095 ,  C01B33/12 ,  C01P2004/61 ,  C03B2201/21 ,  C03B2201/54 ,  C30B15/10 ,  C30B29/06 ,  Y02P40/57 ,  Y10T428/131 ,  Y10T428/1317 ,  Y10T428/2982

Abstract: A method is provided for producing a silica container arranged with a substrate, having a rotational symmetry, comprised of mainly a silica, and containing gaseous bubbles at least in its peripheral part, and an inner layer, formed on an inner surface of the substrate and comprised of a transparent silica glass; wherein a powdered silica, having particle diameter of 10 to 1000 μm, containing Ca, Sr, and Ba with the total concentration of 50 to 5000 ppm by weight, and releasing hydrogen molecules with the amount of 3×1016 to 3×1019 molecules/g upon heating at 1000° C. under vacuum, is prepared at least as a powdered raw material for forming the inner layer, and then the inner layer is formed from the powdered silica as the powdered raw material for forming the inner layer.

Abstract translation: 提供一种制造二氧化硅容器的方法，该二氧化硅容器具有旋转对称性，主要由二氧化硅构成的基板，至少在其周边部分含有气泡，内层形成在基板的内表面上， 由透明石英玻璃组成; 其中，粉末状二氧化硅的粒径为10〜1000μm，含有总量为50〜5000重量ppm的Ca，Sr，Ba，释放量为3×1016〜3×1019分子/ 至少作为形成内层的粉末状原料制备，然后内层由作为形成内层的粉末状原料的二氧化硅粉末形成。

公开(公告)号：US08176752B2

公开(公告)日：2012-05-15

申请号：US12507950

申请日：2009-07-23

Applicant: Susan Lee Schiefelbein ,  Charlene Marie Smith

Inventor： Susan Lee Schiefelbein ,  Charlene Marie Smith

IPC: C03B19/00 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B32/00 ,  C03B2201/21 ,  C03C4/0071 ,  C03C4/0085 ,  C03C23/0025 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54

Abstract: A silica glass article, such as a lens in a stepper/scanner system, having saturated induced absorption at wavelengths of less than about 250 nm. Saturated induced absorption is achieved by first removing Si—O defects in the silica glass by forming silicon hydride (SiH) at such defects, and loading the silica glass with hydrogen to react with E′ centers formed by photolysis of SiH in the silica glass article. The silicon hydride is formed by loading the silica glass with molecular hydrogen at temperatures of at least 475° C. After formation of SiH, the silica glass is loaded with additional molecular hydrogen at temperatures of less than 475° C.

Abstract translation: 石英玻璃制品，例如步进/扫描仪系统中的透镜，在小于约250nm的波长处具有饱和诱导吸收。 通过首先通过在这种缺陷处形成硅氢化物（SiH）来除去二氧化硅玻璃中的Si-O缺陷，并将石英玻璃与氢气一起加载到石英玻璃制品中通过SiH光解产生的E'中心反应而实现饱和诱导吸收 。 氢化硅是通过在至少475℃的温度下加载二氧化硅玻璃与分子氢形成的。在形成SiH之后，二氧化硅玻璃在小于475℃的温度下装载另外的分子氢。