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公开(公告)号：US20040223694A1
公开(公告)日：2004-11-11
申请号：US10406926
申请日：2003-04-04
Inventor： William V. Dower , Nirmal K. Viswanathan , Dora M. Paolucci , Michael D. Barrera
IPC: G02B006/34
CPC classification number: G02B6/02114 , C03C3/06 , C03C13/045 , C03C13/047 , C03C25/607 , C03C25/6226 , C03C2201/21 , C03C2201/24 , C03C2201/26 , C03C2201/31 , C03C2201/60
Abstract: The present invention relates to increasing the photosensitivity of optical fibers. One aspect of the present invention comprises a method for rapidly diffusing hydrogen or deuterium into an optical fiber from a gas mixture having a low total hydrogen content to generate changes in the refractive index of the optical fiber. The resulting photosensitive fiber may be used to create optical devices including Bragg gratings and Bragg grating-based devices.
Abstract translation: 本发明涉及增加光纤的光敏性。 本发明的一个方面包括从具有低总氢含量的气体混合物将氢或氘快速扩散到光纤中以产生光纤的折射率变化的方法。 所得到的光敏纤维可以用于产生包括布拉格光栅和基于布拉格光栅的器件的光学器件。
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42.发明授权Process for making opaque quartz, for carrying out the process suitable SiO2 granulate, and component of opaque quartz glass 有权制造不透明石英的方法，用于进行适合SiO 2颗粒的工艺，以及不透明石英玻璃的组分公开(公告)号：US06380110B1
公开(公告)日：2002-04-30
申请号：US09484113
申请日：2000-01-14
Applicant: Waltraud Werdecker , Heinz Fabian , Udo Gertig , Johann Leist , Rolf Göbel
Inventor： Waltraud Werdecker , Heinz Fabian , Udo Gertig , Johann Leist , Rolf Göbel
IPC: C03B2000
CPC classification number: C03C1/026 , C03B19/1065 , C03C3/06 , C03C2201/02 , C03C2201/24 , C03C2201/26 , C03C2201/32 , C03C2201/80 , C03C2203/10 , C03C2203/54
Abstract: In a known process for the production of opaque quartz glass a blank is formed from synthetic SiO2 granulate and is heated at a vitrification temperature to form a body of opaque quartz glass. In order to provide on this basis a process for the production of pure opaque quartz glass with a homogenous pore distribution, high density, high viscosity and a low tendency to devitrify, it is proposed according to the invention that the SiO2 granulate to be used is a SiO2 granulate (21; 31) composed of at least partially porous agglomerates of SiO2 primary particles, with a specific BET surface ranging from 1.5 m2/g to 40 m2/g and an apparent density of at least 0.8 g/cm3. A SiO2 granulate (21; 31) suitable for the implementation of the process is distinguished in that it is formed from at least partially porous agglomerates of SiO2 primary particles and in that it has a specific BET surface ranging from 1.5 m2/g to 40 m2/g and an apparent density of at least 0.6 g/cm3.
Abstract translation: 在制造不透明石英玻璃的已知方法中，由合成SiO 2颗粒形成坯料，并在玻璃化温度下加热以形成不透明石英玻璃体。 为了在此基础上提供具有均匀孔分布，高密度，高粘度和低失透倾向的纯不透明石英玻璃的制备方法，根据本发明提出使用的SiO 2颗粒是 SiO 2颗粒（21; 31），其由SiO 2一次颗粒的至少部分多孔的附聚物组成，BET比表面积为1.5m 2 / g至40m 2 / g，表观密度为至少0.8g / cm 3。 适用于实施该方法的SiO 2颗粒（21; 31）的特征在于其由SiO 2一次颗粒的至少部分多孔的附聚物形成，并且其具有范围为1.5m 2 / g至40m 2的比BET表面积 / g，表观密度为0.6g / cm 3以上。
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公开(公告)号：US20010029006A1
公开(公告)日：2001-10-11
申请号：US09871979
申请日：2001-06-04
Applicant: KABUSHIKI KAISHA TOSHIBA
Inventor： Hiroshi Tomita , Tsuneo Ishii , Chie Hongo
IPC: F27B001/00
CPC classification number: C03B32/00 , C03B20/00 , C03C3/06 , C03C23/002 , C03C2201/20 , C03C2201/24 , C03C2201/26 , C03C2201/32 , C03C2203/10 , C03C2203/50 , Y10S501/905
Abstract: A quartz glass which would not become a source for the contamination even if it contains metallic impurities. This quartz glass includes a region where a concentration of Enull center as measured by means of an electron spin resonance analysis is 3null1019 cmnull3 or more. This quartz glass can be manufactured by a method including the steps of forming an initial quartz glass by melting and quenching a raw material for quartz glass, and implanting therein an ion, which is capable of entering into an SiO2 network of the initial quartz glass and substantially incapable of externally diffusing, to increase a concentration of Enull center in at least part of the initial quartz glass. This quartz glass can be manufactured by a method making use of a quartz glass raw material containing 0.01 to 0.1% by weight of silicon, by a method of irradiating ultraviolet ray to the initial quartz glass, or by a method of giving an abrasion damage to the surface of the initial quartz glass by means of sand blast.
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公开(公告)号：US09778413B2
公开(公告)日：2017-10-03
申请号：US15586434
申请日：2017-05-04
Applicant: Corning Incorporated
Inventor： Dana Craig Bookbinder , Ming-Jun Li , Pushkar Tandon
IPC: G02B6/036 , G02B6/02 , C03B37/027 , C03C3/06 , C03C25/10 , G02B6/028 , C03C3/076 , C03C13/04 , C03B37/018
CPC classification number: G02B6/03694 , C03B37/018 , C03B37/027 , C03B2201/20 , C03B2201/24 , C03B2201/31 , C03B2203/222 , C03B2203/23 , C03B2203/24 , C03C3/06 , C03C3/076 , C03C13/045 , C03C13/046 , C03C25/1055 , C03C2201/11 , C03C2201/24 , C03C2201/31 , G02B6/02395 , G02B6/0281 , G02B6/03627 , G02B6/03644
Abstract: A single mode optical fiber having a core made from silica and less than or equal to about 11 weight % germania and having a maximum relative refractive index Δ1MAX. The optical fiber also has an inner cladding surrounding the core and having a minimum relative refractive index Δ2MIN, a first outer cladding surrounding the inner cladding and a second outer cladding surrounding the first outer cladding. The viscosity at 1650° C. of the second outer cladding minus the viscosity at 1650° C. of the first outer cladding is greater than 0.1e7 Poise, and Δ1MAX>Δ2MIN. The single mode optical fiber may also have an outer cladding surrounding the inner cladding made from silica or SiON. The first outer cladding has a maximum relative refractive index Δ3MAX, and Δ3MAX>Δ2MIN.
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公开(公告)号：US20170267571A1
公开(公告)日：2017-09-21
申请号：US15612052
申请日：2017-06-02
Applicant: CORNING INCORPORATED
CPC classification number: C03C3/045 , C03C3/06 , C03C3/091 , C03C3/111 , C03C21/007 , C03C23/007 , C03C2201/02 , C03C2201/24 , Y10T428/315
Abstract: Alkali-free glasses are disclosed having (in weight %) 50≦SiO2≦80%, 2≦Al2O3≦17%, 8≦B2O3≦36%, and greater than or equal to 2% and less than or equal to 25% of at least one of CaO, MgO, BaO, SrO or ZnO. The alkali-free glasses can have a surface layer with greater than 0.2 weight % N. Such alkali-free glasses are achieved by nitriding processes and exhibit increased strength, scratch resistance and chemical durability.
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Patent Agency Ranking
公开(公告)号：US20170235045A1
公开(公告)日：2017-08-17
申请号：US15586434
申请日：2017-05-04
Applicant: Corning Incorporated
Inventor： Dana Craig Bookbinder , Ming-Jun Li , Pushkar Tandon
CPC classification number: G02B6/03694 , C03B37/018 , C03B37/027 , C03B2201/20 , C03B2201/24 , C03B2201/31 , C03B2203/222 , C03B2203/23 , C03B2203/24 , C03C3/06 , C03C3/076 , C03C13/045 , C03C13/046 , C03C25/1055 , C03C2201/11 , C03C2201/24 , C03C2201/31 , G02B6/02395 , G02B6/0281 , G02B6/03627 , G02B6/03644
Abstract: A single mode optical fiber having a core made from silica and less than or equal to about 11 weight % germania and having a maximum relative refractive index Δ1MAX. The optical fiber also has an inner cladding surrounding the core and having a minimum relative refractive index Δ2MIN, a first outer cladding surrounding the inner cladding and a second outer cladding surrounding the first outer cladding. The viscosity at 1650° C. of the second outer cladding minus the viscosity at 1650° C. of the first outer cladding is greater than 0.1e7 Poise, and Δ1MAX>Δ2MIN. The single mode optical fiber may also have an outer cladding surrounding the inner cladding made from silica or SiON. The first outer cladding has a maximum relative refractive index Δ3MAX, and Δ3MAX>Δ2MIN.
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公开(公告)号：US20150329408A1
公开(公告)日：2015-11-19
申请号：US14710130
申请日：2015-05-12
Applicant: CORNING INCORPORATED
CPC classification number: C03C3/045 , C03C3/06 , C03C3/091 , C03C3/111 , C03C21/007 , C03C23/007 , C03C2201/02 , C03C2201/24 , Y10T428/315
Abstract: Alkali-free glasses are disclosed having (in weight %) 50≦SiO2≦80%, 2≦Al2O3≦17%, 8≦B2O3≦36%, and greater than or equal to 2% and less than or equal to 25% of at least one of CaO, MgO, BaO, SrO or ZnO. The alkali-free glasses can have a surface layer with greater than 0.2 weight % N. Such alkali-free glasses are achieved by nitriding processes and exhibit increased strength, scratch resistance and chemical durability.
Abstract translation: 公开了无碱玻璃，其重量百分比为50％，SiO 2和N 100; 80％，2％，Al 2 O 3和N 2; 17％，8％和10％; B 2 O 3和N 3; 36％，并且大于或等于2％且小于或等于 CaO，MgO，BaO，SrO或ZnO中的至少一种。 无碱玻璃可以具有大于0.2重量％N的表面层。这种无碱玻璃通过渗氮工艺实现，并且显示出增加的强度，耐划伤性和化学耐久性。
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公开(公告)号：US08877662B2
公开(公告)日：2014-11-04
申请号：US13540204
申请日：2012-07-02
Applicant: Nathan J. Cassingham , Ben Matthew Gauthier , Martin Panchula , Robert Stephen Pavlik , Yan Zhou , Konstantin S. Zuyev
Inventor： Nathan J. Cassingham , Ben Matthew Gauthier , Martin Panchula , Robert Stephen Pavlik , Yan Zhou , Konstantin S. Zuyev
CPC classification number: C03C1/02 , C03B1/00 , C03B2201/075 , C03B2201/08 , C03B2201/23 , C03B2201/24 , C03B2201/31 , C03B2201/32 , C03B2201/34 , C03B2201/50 , C03B2201/54 , C03C3/06 , C03C2201/08 , C03C2201/23 , C03C2201/24 , C03C2201/31 , C03C2201/32 , C03C2201/34 , C03C2201/40 , C03C2201/50
Abstract: The invention relates to a silica glass compound having improved physical and chemical properties. In one embodiment, the present invention relates to a silica glass having a desirable brittleness in combination with a desirable density while still yielding a glass composition having a desired hardness and desired strength relative to other glasses. In another embodiment, the present invention relates to a silica glass composition that contains at least about 85 mole percent silicon dioxide and up to about 15 mole percent of one or more dopants selected from F, B, N, Al, Ge, one or more alkali metals (e.g., Li, Na, K, etc.), one or more alkaline earth metals (e.g., Mg, Ca, Sr, Ba, etc.), one or more transition metals (e.g., Ti, Zn, Y, Zr, Hf, etc.), one or more lanthanides (e.g., Ce, etc.), or combinations of any two or more thereof.
Abstract translation: 本发明涉及具有改善的物理和化学性质的二氧化硅玻璃化合物。 在一个实施方案中，本发明涉及具有期望的脆性以及所需密度的二氧化硅玻璃，同时仍然产生相对于其它玻璃具有所需硬度和所需强度的玻璃组合物。 在另一个实施方案中，本发明涉及二氧化硅玻璃组合物，其含有至少约85摩尔％的二氧化硅和至多约15摩尔％的选自F，B，N，Al，Ge的一种或多种掺杂剂，一种或多种 碱金属（如Li，Na，K等），一种或多种碱土金属（如Mg，Ca，Sr，Ba等），一种或多种过渡金属（如Ti，Zn，Y， Zr，Hf等），一种或多种镧系元素（例如Ce等），或其任何两种或多种的组合。
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49.发明授权Component of quartz glass for use in semiconductor manufacture and method for producing the same 有权用于半导体制造的石英玻璃的组分及其制造方法公开(公告)号：US08017536B2
公开(公告)日：2011-09-13
申请号：US12226861
申请日：2007-09-04
Applicant: Juergen Weber , Tatsuhiro Sato , Ralf Schneider , Achim Hofmann , Christian Gebauer
Inventor： Juergen Weber , Tatsuhiro Sato , Ralf Schneider , Achim Hofmann , Christian Gebauer
CPC classification number: C03C3/06 , C03B19/06 , C03B19/066 , C03B20/00 , C03B2201/07 , C03B2201/075 , C03B2201/24 , C03B2201/34 , C03B2201/36 , C03C4/20 , C03C2201/23 , C03C2201/24 , C03C2201/3411 , C03C2201/3435 , C03C2203/10 , C03C2203/54
Abstract: The invention starts from a known component of quartz glass for use in semiconductor manufacture, which component at least in a near-surface region shows a co-doping of a first dopant and of a second oxidic dopant, said second dopant containing one or more rare-earth metals in a concentration of 0.1-3% by wt. each (based on the total mass of SiO2 and dopant). Starting from this, to provide a quartz glass component for use in semiconductor manufacture in an environment with etching action, which component is distinguished by both high purity and high resistance to dry etching and avoids known drawbacks caused by co-doping with aluminum oxide, it is suggested according to the invention that the first dopant should be nitrogen and that the mean content of metastable hydroxyl groups of the quartz glass is less than 30 wtppm.
Abstract translation: 本发明从用于半导体制造的石英玻璃的已知组件开始，至少在近表面区域中的该组分表现出第一掺杂剂和第二氧化物掺杂剂的共掺杂，所述第二掺杂剂含有一种或多种稀有金属 - 浓度为0.1-3重量％的矿物金属。 每个（基于SiO 2和掺杂剂的总质量）。 从此开始，为了在具有蚀刻作用的环境中提供用于半导体制造的石英玻璃组分，该组分通过高纯度和高耐干蚀刻性而被区分，并避免了与氧化铝共掺杂引起的已知缺点。 根据本发明建议第一掺杂剂应为氮，并且石英玻璃的亚稳态羟基的平均含量小于30重量ppm。
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50.发明申请Holder Made From Quartz Glass for the Processing of Semiconductor Wafers and Method for Production of the Holder 有权由石英玻璃制成的用于半导体晶片加工的支架及其制造方法公开(公告)号：US20080066497A1
公开(公告)日：2008-03-20
申请号：US11630405
申请日：2006-03-30
Applicant: Juergen Weber , Tobias Pogge , Martin Trommer , Bodo Kuehn , Ulrich Kirst , Waltraud Werdecker
Inventor： Juergen Weber , Tobias Pogge , Martin Trommer , Bodo Kuehn , Ulrich Kirst , Waltraud Werdecker
CPC classification number: C03C3/06 , C03B19/06 , C03B19/09 , C03B32/00 , C03B2201/07 , C03B2201/075 , C03B2201/24 , C03B2201/32 , C03C15/00 , C03C19/00 , C03C23/0025 , C03C23/006 , C03C2201/11 , C03C2201/12 , C03C2201/23 , C03C2201/24 , C03C2201/32 , C03C2201/50 , C03C2203/54 , C30B25/12 , C30B31/14 , C30B35/00 , Y02P40/57
Abstract: An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.
Abstract translation: 用于具有蚀刻效果的环境中的晶片夹具的理想石英玻璃的特征在于高纯度和高耐干蚀刻性。 为了表明基本满足这些要求的石英玻璃，根据本发明提出，石英玻璃至少在近表面积中掺杂氮，其平均含量小于30重量ppm， 其假想温度低于1250℃，在1200℃的温度下其粘度至少为10-13Pa。制备这种石英玻璃的经济方法包括以下方法步骤 ：将SiO 2原料熔化，得到石英玻璃坯料，将SiO 2原料或石英玻璃坯料进行脱水处理，加热SiO 2 原料或石英玻璃坯料，在含氨气氛中在1050℃至1850℃的范围内的氮化温度，使用石英玻璃的石英玻璃 将玻璃坯料设定为1250℃以下的假想温度，进行表面处理 石英玻璃夹具形成石英玻璃夹具。
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