公开(公告)号：US20020144517A1

公开(公告)日：2002-10-10

申请号：US10107792

申请日：2002-03-28

Applicant: Nikon Corporation

Inventor： Seishi Fujiwara ,  Kazuhiro Nakagawa ,  Hiroki Jinbo ,  Norio Komine

IPC: C03B020/00 ,  C03B019/14

CPC classification number: C03C3/06 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/22 ,  C03B2207/24 ,  C03B2207/32 ,  C03B2207/36 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/26 ,  C03C2201/50 ,  C03C2203/52

Abstract: A method is provided for manufacturing a synthetic silica glass. The method includes the steps of emitting an oxygen containing gas and a hydrogen containing gas from a burner; emitting a mixture of an organic silicon compound and a halogen compound from the burner; and reacting the mixture with the oxygen containing gas and the hydrogen containing gas to synthesize the silica glass.

Abstract translation: 提供了一种制造合成石英玻璃的方法。 该方法包括从燃烧器发射含氧气体和含氢气体的步骤; 从燃烧器发射有机硅化合物和卤素化合物的混合物; 并使混合物与含氧气体和含氢气体反应以合成二氧化硅玻璃。

公开(公告)号：US06380110B1

公开(公告)日：2002-04-30

申请号：US09484113

申请日：2000-01-14

Applicant: Waltraud Werdecker ,  Heinz Fabian ,  Udo Gertig ,  Johann Leist ,  Rolf Göbel

Inventor： Waltraud Werdecker ,  Heinz Fabian ,  Udo Gertig ,  Johann Leist ,  Rolf Göbel

IPC: C03B2000

CPC classification number: C03C1/026 ,  C03B19/1065 ,  C03C3/06 ,  C03C2201/02 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/80 ,  C03C2203/10 ,  C03C2203/54

Abstract: In a known process for the production of opaque quartz glass a blank is formed from synthetic SiO2 granulate and is heated at a vitrification temperature to form a body of opaque quartz glass. In order to provide on this basis a process for the production of pure opaque quartz glass with a homogenous pore distribution, high density, high viscosity and a low tendency to devitrify, it is proposed according to the invention that the SiO2 granulate to be used is a SiO2 granulate (21; 31) composed of at least partially porous agglomerates of SiO2 primary particles, with a specific BET surface ranging from 1.5 m2/g to 40 m2/g and an apparent density of at least 0.8 g/cm3. A SiO2 granulate (21; 31) suitable for the implementation of the process is distinguished in that it is formed from at least partially porous agglomerates of SiO2 primary particles and in that it has a specific BET surface ranging from 1.5 m2/g to 40 m2/g and an apparent density of at least 0.6 g/cm3.

Abstract translation: 在制造不透明石英玻璃的已知方法中，由合成SiO 2颗粒形成坯料，并在玻璃化温度下加热以形成不透明石英玻璃体。 为了在此基础上提供具有均匀孔分布，高密度，高粘度和低失透倾向的纯不透明石英玻璃的制备方法，根据本发明提出使用的SiO 2颗粒是 SiO 2颗粒（21; 31），其由SiO 2一次颗粒的至少部分多孔的附聚物组成，BET比表面积为1.5m 2 / g至40m 2 / g，表观密度为至少0.8g / cm 3。 适用于实施该方法的SiO 2颗粒（21; 31）的特征在于其由SiO 2一次颗粒的至少部分多孔的附聚物形成，并且其具有范围为1.5m 2 / g至40m 2的比BET表面积 / g，表观密度为0.6g / cm 3以上。

公开(公告)号：US20010029006A1

公开(公告)日：2001-10-11

申请号：US09871979

申请日：2001-06-04

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Hiroshi Tomita ,  Tsuneo Ishii ,  Chie Hongo

IPC: F27B001/00

CPC classification number: C03B32/00 ,  C03B20/00 ,  C03C3/06 ,  C03C23/002 ,  C03C2201/20 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2203/10 ,  C03C2203/50 ,  Y10S501/905

Abstract: A quartz glass which would not become a source for the contamination even if it contains metallic impurities. This quartz glass includes a region where a concentration of Enull center as measured by means of an electron spin resonance analysis is 3null1019 cmnull3 or more. This quartz glass can be manufactured by a method including the steps of forming an initial quartz glass by melting and quenching a raw material for quartz glass, and implanting therein an ion, which is capable of entering into an SiO2 network of the initial quartz glass and substantially incapable of externally diffusing, to increase a concentration of Enull center in at least part of the initial quartz glass. This quartz glass can be manufactured by a method making use of a quartz glass raw material containing 0.01 to 0.1% by weight of silicon, by a method of irradiating ultraviolet ray to the initial quartz glass, or by a method of giving an abrasion damage to the surface of the initial quartz glass by means of sand blast.

公开(公告)号：US3378431A

公开(公告)日：1968-04-16

申请号：US62463567

申请日：1967-03-20

Applicant: PFAUDLER PERMUTIT INC

Inventor： SMITH JR CARLYLE F ,  CRANDALL WILLIAM B

IPC: C03C3/06

CPC classification number: C03C3/06 ,  C03C2201/26 ,  C03C2203/10

公开(公告)号：WO2017103125A1

公开(公告)日：2017-06-22

申请号：PCT/EP2016/081451

申请日：2016-12-16

Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

Inventor： OTTER, Matthias ,  WITTRIN, Mirko ,  WILDE, Markus

IPC: C03B20/00 ,  C03B37/012 ,  C03C3/06 ,  C03B17/04 ,  C03B19/10 ,  F26B3/12

CPC classification number: C03B19/108 ,  C03B17/04 ,  C03B19/106 ,  C03B37/0128 ,  C03C1/026 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2203/10 ,  F26B3/12

Abstract: Die Erfindung betrifft ein Verfahren zum Herstellen eines Quarzglaskörpers beinhaltend die Verfahrensschritte i.) Bereitstellen eines Siliziumdioxidgranulats, ii.) Bilden einer Glasschmelze aus dem Siliziumdioxidgranulat und iii.) Bilden eines Quarzglaskörpers aus zumindest einem Teil der Glasschmelze, wobei Schritt i.) die Schritte I. Bereitstellen eines Siliziumdioxidpulvers und II. Verarbeiten des Pulvers zu einem Siliziumdioxidgranulat umfassend das Sprühtrocknen einer Siliziumdioxidaufschlämmung unter Verwendung einer Düse umfasst. Die Düse weist eine Kontaktfläche zu der Aufschlämmung aus Glas, Kunststoff oder einer Kombination davon auf. Die Erfindung betrifft weiterhin einen Quarzglaskörper, der durch dieses Verfahren erhältlich ist. Weiterhin betrifft die Erfindung die Herstellung eines Siliziumdioxidgranulats. Die Erfindung betrifft außerdem einen Lichtleiter, ein Leuchtmittel und einen Formkörper, die jeweils durch Weiterverarbeiten des Quarzglaskörpers erhältlich sind.

Abstract translation:

本发明涉及一种用于制造石英玻璃＆OUML;包括如下工艺步骤：i）提供一Siliziumdioxidgranulats rpers，ii）形成在玻璃从Siliziumdioxidgranulat熔化和iii）形成的石英玻璃与OUML; ...的至少一个的Rpers 使用d导航用途包括本身保温;熔融玻璃，其特征在于，步骤i）包括提供二氧化硅粉末I. II和处理该粉末成包括SPR导航使用Siliziumdioxidgranulat步骤..的一部分htrocknen一个Siliziumdioxidaufschl＆AUML。 喷嘴与玻璃，塑料或其组合的外壳具有接触表面。 本发明还涉及一种石英玻璃＆OUML;主体，可以通过此方法获得BEAR是ltlich。 此外，本发明涉及二氧化硅颗粒的生产。 本发明还涉及一种光导，发光装置和模制体，其每一个都可以通过进一步处理石英玻璃体

公开(公告)号：WO2004095096A1

公开(公告)日：2004-11-04

申请号：PCT/US2004/003918

申请日：2004-02-10

Applicant: 3M INNOVATIVE PROPERTIES COMPANY ,  DOWER, William V., ,  VISWANATHAN, Nirmal K., ,  PAOLUCCI, Dora M., ,  BARRERA, Michael D.,

Inventor： DOWER, William V., ,  VISWANATHAN, Nirmal K., ,  PAOLUCCI, Dora M., ,  BARRERA, Michael D.,

IPC: G02B6/16

CPC classification number: G02B6/02114 ,  C03C3/06 ,  C03C13/045 ,  C03C13/047 ,  C03C25/607 ,  C03C25/6226 ,  C03C2201/21 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/31 ,  C03C2201/60

Abstract: The present invention relates to increasing the photosensitivity of optical fibers. One aspect of the present invention comprises a method for rapidly diffusing hydrogen or deuterium into an optical fiber from a gas mixture having a low total hydrogen content to generate changes in the refractive index of the optical fiber. The resulting photosensitive fiber may be used to create optical devices including Bragg gratings and Bragg grating-based devices.

Abstract translation: 本发明涉及增加光纤的光敏性。 本发明的一个方面包括从具有低总氢含量的气体混合物将氢或氘快速扩散到光纤中以产生光纤的折射率变化的方法。 所得到的光敏纤维可以用于产生包括布拉格光栅和基于布拉格光栅的器件的光学器件。

公开(公告)号：WO01046079A1

公开(公告)日：2001-06-28

申请号：PCT/EP2000/012687

申请日：2000-12-14

IPC: C03B20/00 ,  C01B33/12 ,  C03B19/00 ,  C03B19/09 ,  C03B19/10 ,  C03C1/02 ,  C03C3/06

CPC classification number: C03C1/026 ,  C03B19/1065 ,  C03C3/06 ,  C03C2201/02 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/80 ,  C03C2203/10 ,  C03C2203/54

Abstract: The invention relates to a method for the production of opaque quartz glass wherein a blank is made from synthetic SiO2 crystals and heated to form a blank body made of opaque quartz glass at a given vitrification temperature. A method for the production of pure, opaque quartz glass is disclosed wherein said quartz glass has a homogeneous pore distribution and a high density, a high viscosity and a lower tendency to devitrify. According to the invention, the SiO2 crystals are formed from an at least partially porous agglomerate of SiO2 primary particles (21; 31) having a specific surface (according to BET) between 1.5 m /g and 40 m /g with a stamping density of at least 0.8 g/cm . SiO2 granulate (21; 31) suitable for use in performing the procedure is characterized in that it is composed of an at least partially porous agglomerate of SiO2 primary particles and has a specific surface (according to BET) between 1.5 m /g and 40 m /g in addition to a stamping density of at least 0.6 g/cm .

Abstract translation: 在用于制造不透明石英玻璃公知的方法，成型是由合成的SiO 2颗粒尺寸，并加热在玻璃化温度以形成不透明石英玻璃制成的成型体的形成。 要指定此基础上，对于纯的，不透明的石英玻璃，其具有高密度，高粘度和低失透倾向的均匀的孔分布的制备方法，根据本发明中提出，以SiO 2的至少部分多孔附聚物的SiO 2颗粒一 形成的初级粒子的SiO 2颗粒（21; 31），其具有比表面积（按照BET）从1.5米<2> /克至40μm<2> /用至少0.8克/厘米<3的夯实密度克 使用>。 一种合适的用于该方法的实施的SiO 2颗粒（21; 31）的特征在于，它是由SiO 2一次粒子的至少部分多孔附聚物形成，并且其具有比表面积（按照BET）从1.5米<2 > /克至40μm<2> / g，并且具有厘米<用至少为0.6g / cc的夯实密度3>。

公开(公告)号：EP3390306A2

公开(公告)日：2018-10-24

申请号：EP16822145.5

申请日：2016-12-16

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： OTTER, Matthias ,  LEHMANN, Walter ,  HÜNERMANN, Michael ,  NIELSEN, Nils Christian ,  WHIPPEY, Nigel Robert ,  GROMANN, Boris ,  KPEBANE, Abdoul-Gafar

IPC: C03B20/00 ,  C03C3/06 ,  C03B37/012 ,  C03B19/10 ,  C03B17/04 ,  C03B5/06

CPC classification number: C03B37/01211 ,  C03B5/06 ,  C03B17/04 ,  C03B19/106 ,  C03B20/00 ,  C03C1/022 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2203/10

Abstract: The invention relates to a method for producing a silica glass article, involving method steps i.) providing a silica granulate, ii.) forming a glass melt from the silica granulate in a furnace, and iii.) forming a silica glass article from at least some of the glass melt, the furnace including a suspended sintered crucible. The invention further relates to a silica glass article that can be obtained by said method. The invention also relates to an optical waveguide, an illuminant and a molded article, each of which can be obtained by further processing the silica glass article.

公开(公告)号：EP3390301A1

公开(公告)日：2018-10-24

申请号：EP16815839.2

申请日：2016-12-16

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： OTTER, Matthias ,  LEHMANN, Walter ,  HÜNERMANN, Michael ,  NIELSEN, Nils Christian ,  WHIPPEY, Nigel Robert ,  GROMANN, Boris ,  KPEBANE, Abdoul-Gafar ,  KAYSER, Thomas

IPC: C03B20/00 ,  C03C12/00 ,  C03B19/10 ,  C03B37/012 ,  C03C3/06 ,  C03B19/06

CPC classification number: C03B19/106 ,  C03B17/04 ,  C03B19/066 ,  C03B19/108 ,  C03B19/1095 ,  C03B2201/07 ,  C03B2201/23 ,  C03C3/06 ,  C03C13/045 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2203/44 ,  C03C2203/54

Abstract: The invention relates to a method for producing a silica glass article, involving method steps i.) providing a silica granulate, ii.) forming a glass melt from the silica granulate, and iii.) forming a silica glass article from at least some of the glass melt, step i.) consisting of steps I. producing a silica powder using at least two particles made from a silicon-chlorine compound, II. bringing the silica powder into contact with ammonia so as to obtain a treated silica powder, and III. granulating the treated silica powder so as to obtain a silica granulate, the chlorine content of the silica powder being higher than the chlorine content of the silica granulate. The invention further relates to a silica glass article that can be obtained by said method. The invention also relates to a method for producing a silica granulate. The invention finally relates to an optical waveguide, an illuminant and a molded article, each of which can be obtained by further processing the silica glass article.

公开(公告)号：EP1894896A1

公开(公告)日：2008-03-05

申请号：EP07114836.5

申请日：2007-08-23

Applicant: Heraeus Quarzglas GmbH & Co. KG ,  SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

Inventor： Sato, Tatsuhiro

IPC: C03B19/01 ,  C03B19/09 ,  C03C3/06 ,  C03C3/112 ,  C03C4/20 ,  C03C6/04 ,  C03C6/06

CPC classification number: C03C1/00 ,  C03B19/063 ,  C03B32/005 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/24 ,  C03B2201/36 ,  C03C3/06 ,  C03C3/112 ,  C03C4/20 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/3411 ,  C03C2201/3435 ,  C03C2201/36

Abstract: In order to provide quartz glass which has excellent plasma corrosion resistance and can be used for semiconductor production, it is suggested to use a mixed quartz powder which is suitable for the production of the quartz glass. Furthermore, a production process for quartz glass using the quartz powder is provided. The mixed quartz glass powder containing from 0.1 to 20 mass % in total of two or more of dope elements, in which the dope element contains one or more of first elements selected from the group consisting of N, C and F and one or more of second elements selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids.

Abstract translation: 为了提供一种具有优异的等离子体的耐腐蚀性和可用于半导体生产的石英玻璃，建议使用混合石英粉所有这些是适合于生产的石英玻璃制成。 进一步，提供了用于使用所述石英粉的石英玻璃的制造方法。 混合石英玻璃粉末在总的两个或更多个，其中所述浓液元件包含一个或多个选自N，C和F以及一个或更多个的选择的第一元素的掺杂元素的含有0.1〜20质量％ 选自镁，钙，锶，钡，钪，Y，钛，锆，铪，镧系和锕的选择的第二元素。