Abstract:
Die vorliegende Erfindung betrifft allgemein ein Verfahren zur Herstellung eines Schichtaufbaus (1), beinhaltend die Schritte: a) Bereitstellen einer Keramikschicht (2) mit einer die Keramikschicht (2) mindestens teilweise überlagernden ersten Metallschicht (3); b) mindestens teilweises Überlagern der ersten Metallschicht (3) mit einer weiteren Metallschicht (4), beinhaltend mindestens ein Metall der VIII. Nebengruppe; c) gegebenenfalls mindestens teilweises Überlagern der ersten Metall-Schicht (3) mit einer zusätzlichen Metallschicht (5), beinhaltend mindestens ein Metall der VIII. Nebengruppe; d) mindestens teilweises Überlagern der weiteren Metallschicht (4) oder der zusätzlichen Metallschicht (5) mit einer äußeren Schicht (6);
wobei das Überlagern in mindestens einem der Schritte b) bis d) durch Drucken mittels einer flüssigen Druckmasse (7, 8, 9) erfolgt, wobei die flüssige Druckmasse (7, 8, 9) eine metallorganische Verbindung in einer Menge in einem Bereich von 5 bis 50 Gew.-%, jeweils bezogen auf die Druckmasse (7, 8, 9) beinhaltet
Abstract:
Disclosed are a printed circuit board and a method for manufacturing the same. The printed circuit board includes a core insulating layer, at least one via formed through the core insulating layer, an inner circuit layer buried in the core insulating layer, and an outer circuit layer on a top surface or a bottom surface of the core insulating layer, wherein the via includes a first part, a second part below the first part, a third part between the first and second parts, and at least one barrier layer including a metal different from a metal of the first to third parts. The inner circuit layer and the via are simultaneously formed so that the process steps are reduced. Since odd circuit layers are provided, the printed circuit board has a light and slim structure.
Abstract:
There are provided a metal material for electronic component which has low insertability/extractability, low whisker formability, and high durability, and a method for manufacturing the metal material. The metal material 10 for electronic components has a base material 11, an A layer 14 constituting a surface layer on the base material 11 and formed of Sn, In or an alloy thereof, and a B layer 13 constituting a middle layer provided between the base material 11 and the A layer 14 and formed of Ag, Au, Pt, Pd, Ru, Rh, Os, Ir or an alloy thereof, wherein the surface layer (A layer) 14 has a thickness of 0.002 to 0.2 µm, and the middle layer (B layer) 13 has a thickness of 0.001 to 0.3 µm.
Abstract:
When a laminated body having a metal film formed on a ceramic base member is manufactured by using a cold spraying method, a laminated body having a high adhesion strength between a ceramic and the metal film and a method of manufacturing such a laminated body are provided. The laminated body includes a ceramic base member 10 having an insulating property, an intermediate layer 50 including metal or alloy as a main component formed on a surface of the ceramic base member 10, and a metal film layer (a circuit layer 20 and a cooling fin 40) formed on a surface of the intermediate layer 50 by accelerating a powder of metal or alloy with a gas and spraying and depositing the powder on the surface of the intermediate layer 50 as the powder is in a solid state.
Abstract:
The present invention provides: a method for manufacturing a metallized substrate by which a fine pattern can be formed more easily; a metallized substrate manufactured by the method; and a metal paste composition to be used in the method. The metallized substrate has: a sintered nitride ceramic substrate (10); a titanium nitride layer (20) on the sintered substrate (10); an adhesion layer (30) on the titanium nitride layer (20); and a copper plating layer (40) on or above the adhesion layer (30), wherein the adhesion layer (30) contains copper and titanium, and has a thickness of no less than 0.1 µm and no more than 5 µm.
Abstract:
A wiring substrate (10) has a pad (12) formed from a plurality of metal layers (26, 27, 28) and a via (13,17,29) connected to the pad. The plurality of metal layers have a metal layer (26) exposed through the wiring substrate, and a first metal layer (27) which is interposed between the metal layer and via and which prevents diffusion of metal included in the via into the metal layer. A second metal layer (28) which is less subject to oxidation than the first metal layer (27) is provided between the via (13) and the first metal layer, and the via is connected to a roughened surface of the second metal layer. An insulation layer (11) covers the side surfaces of the pad and the roughened surface of the second metal layer except for a region of the surface exposed by an opening section (25) in which the via is provided.
Abstract:
A wiring substrate (10) has pads (12) formed from a plurality of metal layers (26,27,28) and vias (13,17,29) connected to the pads. The plurality of metal layers have a metal layer (26) exposed through the wiring substrate, and a first metal layer (27) which is interposed between the metal layer and the vias and which prevents diffusion of metal included in the vias into the metal layer. A second metal layer (28) which is less subject to oxidation than the first metal layer (27) is provided between the vias and the first metal layer (27), and the vias are connected to the second metal layer (28).
Abstract:
In conducting wiring by masking the portion other than the portion to be wired of a metallic laminate (2) with a photoresist (6) for plating and subjecting only the portion to be wired to pattern plating (7), the provision of a noble metal layer (5) made of gold, platinum or the like, or a metallic layer (5) made of a metal having a larger ionization tendency than that of a metal used in the pattern plating (7) on the metallic layer constituting the undercoat of the photoresist (6) for plating enables the peeling of the resist (6) for plating to be prevented and excellent fine wiring to be conducted.