Abstract:
A beam control unit and an exposure apparatus having the same are provided to control lights, whose intensities are different from each other, to be uniform without reducing the intensities of the lights by using a slit plate and a fly's eye lens array. A beam control unit(100) includes a slit plate(110) and a fly's eye lens array(120). The slit plate has a fixed size slit(112) for limiting a region through which a light is transmitted. The fly's eye lens array is integrally formed with the slit plate around the slit, and allows the intensity distribution of the light, which passes through the slit, to be uniform. The thickness of the slit plate is thicker than that of the fly's eye lens array in order to prevent the light, which passes through the fly's eye lens array, from being diffused.
Abstract:
본 발명은 디스크 드라이브의 헤드 짐벌 어셈블리 및 서보 컨트롤러에 관한 것으로서, 특히 디스크 드라이브의 디스크 진동으로 인한 오프 트랙 헤드 움직임을 줄이기 위한 메커니즘과 드라이브 제어 방법 및 장치에 관한 것이다. 본 발명은 디스크 진동 범위에서 PES를 최적화시키도록 디스크 진동 주파수 범위에서 이득을 가변시키는 서보 컨트롤러를 제공하고, 또한 트랙 미스 기입(TMR)을 줄이는 개선된 헤드 짐벌 어셈블리를 제공한다. 이 헤드 짐벌 어셈블리는 최신의 헤드 짐벌 어셈블리처럼 기계적으로 간단하고, 평평한 디스크 표면 위에 평행으로 이동되는 슬라이더를 지탱하고, 디스크 진동에 의해 유도된 TMR을 줄인다. 이것은 유사한 트랙 밀도와 회전 레이트(rate)에서 알려진 다른 접근 방식보다 보다 만들기 쉽고, 보다 신뢰성이 있으며, 적은 제조비용이 든다. 개선된 헤드 짐벌 어셈블리는 디스크 표면이 평탄할 때 디스크 표면 위로 평행하게 슬라이더를 이동시키고, 디스크 표면이 굽어졌을 때 트랙을 향하여 슬라이더를 빠르게 이동시키기 위한 개선된 메커니즘을 포함한다.
Abstract:
플라즈마를 이용하는 반도체 소자 제조 공정의 균일성을 효과적으로 확보할 수 있는 플라즈마를 이용하는 반도체 소자 제조 장비가 제공된다. 본 발명의 일 실시예에 따른 플라즈마를 이용하는 반도체 소자 제조 장비는 공정 챔버, 제 1 전극, 제 2 전극 및 제 1 전극과 제 2 전극 사이에 배치되며, 수직 방향으로 이동될 수 있는 제 1 컨파인먼트 링 및 제 1 컨파인먼트 링을 둘러싸고 배치되며, 수직 방향으로 이동될 수 있는 제 2 컨파인먼트 링을 포함하는 컨파인먼트 링 어셈블리를 포함한다. 플라즈마, 균일성, 컨파인먼트(confinement) 링
Abstract:
개시된 하드 디스크 드라이브는, 드라이브의 디스크 및 스핀들 모터에 접촉되어 로킹시킬 수 있는 로킹 액츄에이터를 가진다. 로킹 액츄에이터는 드라이브로의 전원이 끊겼을 때 디스크와 접촉되어 로킹시키는 플런저를 유발하는 형상 기억 합금 요소를 가질 수 있다. 로킹된 위치에서 액츄에이터는 특히 하드 디스크 드라이브의 선적 및 이송 중의 충격 및 진동 하중의 충격을 최소화할 수 있다. 형상 기억 합금 요소는 하드 디스크 드라이브가 전원을 공급받을 때 가열된다. 그 가열된 형상 기억 합금 요소는 디스크로부터 플런저가 떨어져서 디스크 드라이브가 동작할 수 있게 해준다.
Abstract:
Aerodynamic forces contribute to disk and actuator vibration leading to track positioning errors in storage devices such as hard disk drives. The invention provides a variety of dampening mechanisms and a method of dampening to alleviate these problems.
Abstract:
PURPOSE: A slider for reducing an off-track motion of a head caused by a disk vibration, an HGA(Head Gimbal Assembly) and an actuator assembly comprising the slider and the HGA are provided to lower an available roll central position of a slider than slider thickness, thereby decreasing an off-track motion caused by a disk vibration. CONSTITUTION: A slider(100) has an indented surface(104) to lower a roll center of an HGA than thickness of the slider(100). The HGA configured with the slider(100) can reduce off-track displacement caused by a disk vibration. A gimbal(300) disposed on a load beam(80) is contacted with the indented surface(104), and forms a slider roll center lower than the slider thickness. The slider(100) includes a slider contact cover(102) contacted with the gimbal(300). The slider contact cover(102) is coupled with the slider(100) through the indented surface(104). An actuator assembly comprises the HGA.
Abstract:
PURPOSE: A dynamic dick locking system of a disk drive using a shape memory alloy is provided to prevent components of a disk drive, such as a spindle motor, from being damaged when the disk drive is moved. CONSTITUTION: A hard disk drive(10) includes a base plate(16), a spindle motor(1) connected to the base plate, a disk(12) connected to the spindle motor, and an actuator arm(24) installed on the base plate. The hard disk drive further includes a voice coil motor(32) connected to the actuator arm, a flexure beam(22) connected to the actuator arm, a head(20) connected with the flexure beam and the disk, and a locking actuator provided on the base plate and connected to the disk. The locking actuator includes a shape memory alloy component. The locking actuator has a plunger and a biasing spring connected with the shape memory alloy component.
Abstract:
PURPOSE: A method for forming a trench isolation layer of an SOI substrate is provided to prevent the increase of leakage current by forming a trench isolation layer without a bending phenomenon of a semiconductor layer. CONSTITUTION: A substrate(130) including a base layer(110), a buried oxide layer(115), and a semiconductor layer(120) is prepared. A trench(150) is formed within the semiconductor layer(120) in order to define an active region of the semiconductor layer(120). A thermal oxidation process for the remaining semiconductor layer(120) of a bottom portion of the trench(150) is performed. A thermal oxide layer(155) is formed on an inner wall and the bottom of the trench(150) by performing the thermal process. An insulating layer is formed thereon in order to bury the trench(150) including the thermal oxide layer(155). An isolation layer(180) including the thermal oxide layer(155), a nitride layer liner pattern(165a), and an oxide layer pattern(170a) is formed within the trench(150).
Abstract:
PURPOSE: A device and a method for dampening disc vibration of a storing device are provided to improve the head positioning and reduce the fluttering of a disc rotating in a storing device. CONSTITUTION: A disc drive for dampening vibration of a storing device includes first and second discs(12), disc bases(100), an actuator providing first and second recording-reproducing head assemblies respectively connected to first and second disc surfaces of the first and second discs for communication and coupled with the disc base to pivot, spindle motors(80) stably coupled with the disc bases for rotating the discs around rotation shafts at operation rotation speeds, and a dampening mechanism(120) having a plate fixedly attached to the disc base and a first dampening surface separated from the first disc by a first gap for securing the discs with at least 175 degrees with respect to the rotation shafts and a radial width of at least 16mm with respect to the shafts.
Abstract:
PURPOSE: A method for forming a trench of a semiconductor device is provided to lengthen a meal free path of an etching gas and form a plurality of trenches having uniform depth by etching a semiconductor substrate under low pressure. CONSTITUTION: A stacked layer is formed on a semiconductor substrate(200) by stacking a silicon oxide layer and a hard mask layer. A photoresist pattern(208) is formed on the hard mask layer. A stacked layer pattern is formed on the semiconductor substrate(200) by patterning the stacked layer. The photoresist pattern(208) is removed. A plurality of trenches(210,212,214) are formed on a predetermined region of the semiconductor substrate(200) by etching the semiconductor substrate(200). The stacked layer and the semiconductor substrate(200) are patterned by using the photoresist pattern(208) as an etch mask. The photoresist pattern(208) is removed.