Abstract:
A manufacturing method of diamond powder of the present invention comprises a step of forming a seed particle including diamond on a substrate; a step of injecting source gas in a reaction chamber having the substrate and a filament positioned therein; a step of heating the substrate; a step of activating the source gas by heating the filament; a step of separating the seed particle from the substrate by using the heated filament; and a step of growing diamond on the seed particle separated from the substrate by using the activated source gas. According to the manufacturing method of the present invention, diamond powder can be manufactured in a gas-to-particle synthesis method.
Abstract:
The present invention relates to a Se or S based thin film solar cell capable of improving the crystallinity and the electrical property of an upper transparent electrode layer by controlling the structure of a lower transparent layer in a Se or S based light absorption based thin film solar cell, and a method for fabricating the same. In a Se or S based thin film solar cell according to the present invention which is a Se or S based thin film solar cell having a light absorption layer and a front transparent electrode layer, the front transparent electrode layer comprises a lower transparent electrode layer and an upper transparent electrode layer. The lower transparent electrode layer comprises an oxide based thin film (impurity-doped Zn-Mg based oxide thin film) where the mixed oxide of Zn oxide and Mg oxide is mixed with an impurity element.
Abstract:
본 발명은 텅스텐 카바이드의 성장시 과포화(supersaturation) 수준의 조절을 통해 나노구조의 정렬 형태를 제어함으로써 여러 형태의 텅스텐 카바이드 특히, 나노월 구조의 텅스텐 카바이드를 합성할 수 있는 2차원 나노구조의 텅스텐 카바이드 및 그 제조방법에 관한 것으로서, 본 발명에 따른 2차원 나노구조의 텅스텐 카바이드 제조방법은 수소 플라즈마가 인가되는 화학기상증착 공정을 이용하여, 나노결정다이아몬드 박막 상에 수직 배열되는 2차원 나노구조의 텅스텐 카바이드를 제조하는 것을 특징으로 하며, 상기 수소 플라즈마가 인가되는 화학기상증착 공정은, 챔버 내의 양극 상에 나노결정다이아몬드 박막이 형성된 기판을 구비시키고, 기판의 상부 이격된 위치에 표면이 탄화된 텅스텐 음극을 구비시킨 상태에서, 챔버 내에 수소 플라즈마가 인가된다.
Abstract:
A polyphase carbon nanostructure may include graphene sheaths including at least one graphene layer; and diamond nanoflakes embedded in the graphene sheaths. The graphene sheaths may comprise multilayer graphene. Each graphene layer in the graphene sheaths may be aligned in parallel with the surface of the diamond nanoflake (111). The polyphase carbon nanostructure may further comprise a nanocrystalline diamond film positioned to surround the graphene sheaths. The polyphase carbon nanostructure has a high electric conductivity compared to a conventional nanocrystalline diamond film, which does not include graphite. [Reference numerals] (AA) Intensity (a.u.); (BB) 302.1 eV(sp^3) : second band gap; (CC) Energy loss (eV)
Abstract:
본 발명은 실리콘 산화막이 코팅된 기판 상에 나노결정다이아몬드 박막을 형성함에 있어서 기판 표면에 대해 수소 플라즈마 처리 또는 탄화수소 플라즈마 처리를 하거나 탄화수소 열처리를 수행함으로써, 후속의 초음파 파종 공정시 기판 표면과 나노다이아몬드 입자 간의 정전기 인력을 최대화하여 초음파 파종 공정시 기판의 실리콘 산화막 상에 나노다이아몬드 입자가 균일하게 분포, 결합되도록 하고, 궁극적으로 보이드(void)가 최소화된 균질의 나노결정다이아몬드 박막을 제조할 수 있는 나노결정다이아몬드 박막 및 그 제조방법에 관한 것으로서, 본 발명에 따른 나노결정다이아몬드 박막의 제조방법은 실리콘 산화막이 코팅된 실리콘 기판을 준비하는 단계와, 상기 기판을 표면처리하는 단계와, 나노다이아몬드 입자가 분산된 용액에 상기 기판 을 넣은 후, 초음파를 조사하여 상기 기판 상에 나노다이아몬드 입자를 분산, 결합시키는 단계 및 상기 나노다이아몬드 입자가 결합된 기판 상에 나노결정다이아몬드 박막을 성장시키는 단계를 포함하여 이루어지며, 상기 표면처리에 의해, 기판과 나노다이아몬드 입자 간의 전위차의 절대값이 표면처리되지 않은 경우의 기판과 나노다이아몬드 입자 간의 전위차의 절대값보다 증가하는 것을 특징으로 한다.
Abstract:
PURPOSE: A two-dimensional nanostructured tungsten carbide and a manufacturing method thereof are provided to manufacture the tungsten carbides vertically arranged on a nanocrystalline diamond film using a chemical vapor deposition process to which hydrogen plasma is applied. CONSTITUTION: A manufacturing method of a two-dimensional nanostructured tungsten carbide includes a step of vertically arranging the tungsten carbides on a nanocrystalline diamond film using a chemical vapor deposition process to which hydrogen plasma is applied. In the chemical vapor deposition process, the hydrogen plasma is applied to inside a chamber while a substrate having the film is placed on an anode inside the chamber and a tungsten cathode of which the surface is carbonized is placed above the substrate.
Abstract:
PURPOSE: A CMP(Chemical Mechanical Polishing) pad conditioner and a manufacturing method thereof are provided to basically prevent a substrate from being bent and diamond of the conditioner from being separated by forming the CMP pad conditioner using a selective deposition method. CONSTITUTION: A diamond thin film(12) is formed on a substrate(11). A mask(30) having an opening part(35) in a matrix type is placed on the diamond thin film. The mask is made of one selected from molybdenum, tungsten and graphite. A protrusion part(15) comprising diamond(40) is formed on the diamond thin film. The mask is removed.
Abstract:
PURPOSE: A Se or S system thin film solar cell and a manufacturing method thereof are provided to improve photoelectric transformation efficiency of a solar battery by controlling preferred orientation of a light absorption layer through the bulk porosity adjustment of a preferred orientation control layer. CONSTITUTION: A back contact electrode(120) is formed on a substrate(110). The back contact electrode is composed of a double layer of a first back contact electrode(121) and a second back contact electrode(122). A preferred orientation control layer(130) is formed on the back contact electrode. A light absorption layer(140) is formed on the preferred orientation control layer. A window layer(150) is formed on the light absorption layer. A transparent electrode layer(160) is formed on the window layer.
Abstract:
PURPOSE: A method for growing a ZnO thin film, a thin film solar cell using the same, and a method for manufacturing the thin film solar cell are provided to prevent a void and a crack in a silicon thin film deposition process by making the surface of the ZnO thin film with a U-shape. CONSTITUTION: Textures in a (0002) direction and a (1120) direction are simultaneously grown by controlling a deposition temperature, a deposition pressure, or the injection ratio of precursors. The deposition temperature is controlled between 90 and 150 degrees centigrade. The deposition pressure is controlled between 0.1 and 10 torr. The precursor is made of oxygen materials and zinc materials.