Abstract:
본 발명은 실리콘 태양전지의 제조방법에 관한 것으로, 본 발명은 (a) 제1 도전형 불순물이 도핑된 실리콘 기판의 전면에, 상기 실리콘 태양전지의 전면전극의 형성 위치에 대응하는 개구부를 가지도록 마스킹 페이스트를 이용하여 패턴을 형성하는 단계; (b) 상기 개구부를 통해 노출된 상기 실리콘 기판의 전면의 제1 영역에 제2 도전형 불순물이 함유된 도핑 페이스트를 프린팅하여 건조하는 단계; (c) 상기 패턴을 제거하는 단계; (d) 상기 실리콘 기판을 제1 열처리하여, 상기 도핑 페이스트에 함유된 제2 도전형 불순물을 상기 제1 영역을 통해 상기 실리콘 기판 내부로 제1 확산시킴으로서 제1 에미터층을 형성하는 단계; 및 (e) 제2 도전형 불순물을 도핑하기 위한 도핑가스 분위기에서 상기 실리콘 기판을 제2 열처리하여, 제2 에미터층을 형성하는 단계를 포함하는 것을 특징으로 한다. 이에 의해 본 발명은 패턴을 이용하여 증착된 도핑 페이스트의 넓게 퍼지는 현상을 억제함으로써 전면전극과 에미터층 사이의 접촉저항을 일정 수준 이하로 작게 유지할 수 있다.
Abstract:
The present invention locates a first gas inlet close to a plasma reaction unit and a second gas inlet far from the plasma reaction unit, and cross-arranges inlet pipes per injection gas for properly mixing first gas; is capable of performing a uniform plasma reaction between first gas and second gas in a plasma reaction region; is capable of minimizing a plasma spreading phenomenon by increasing the density of plasma in short period of staying time; is capable of easily controlling particle sizes; and improves yield by injecting cooling gas for preventing the formation of particle cohesion among produced particles. [Reference numerals] (AA) First gas; (BB) Second gas
Abstract:
PURPOSE: A container for collecting and storing silicon nanoparticles and an apparatus and method for depositing a silicion nanoparticle thin film using the same are provided to efficiently deposit nanoparticles on a substrate using carrier gas without an additional nanoparticle transfer unit. CONSTITUTION: A first inflow line(11) is connected to one side of a container(10). The nanoparticles are inputted to a first inflow line by carrier gas. A second inflow line(16) is connected to the other side of the container. The inputted nanoparticles are discharged to the outside through the second inflow line. A filter screen(13) is formed in the container. A discharge line(14) is connected to the container to discharge carrier gas passing through the filter screen to the outside. [Reference numerals] (AA) Carrier gas; (BB) Collected nanoparticles
Abstract:
PURPOSE: An apparatus and a method for deposition of a silicone-based nano-particle thin film are provided to effectively deposit nano-particles on a substrate without a separate nano-particle transfer unit because the nano-particles are injected into a deposition chamber by the pressure difference between the deposition chamber and a nano-particle container. CONSTITUTION: An apparatus for deposition of a silicone-based nano-particle thin film comprises a nano-particle container(100) and a deposition chamber(200). Silicon-based nano-particles are led by carrier gas and collected in the nano-particle container. The nano-particles in the nano-particle container are injected into the deposition chamber by the pressure difference between the nano-particle container and the deposition chamber and deposited on a substrate(S) placed in the deposition chamber. A first inlet line(102) is provided between the nano-particle container and the deposition chamber. A flow controller is provided in the first inlet line. [Reference numerals] (AA) Nano particles + gas; (BB) Reaction gas; (CC) Nano particles