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公开(公告)号：US10001709B2
公开(公告)日：2018-06-19
申请号：US15432698
申请日：2017-02-14
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin , Antonius Johannes Josephus Van Dijsseldonk , Wilhelmus Petrus De Boeij
CPC classification number: G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
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公开(公告)号：US09952515B2
公开(公告)日：2018-04-24
申请号：US14839633
申请日：2015-08-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
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公开(公告)号：US09952513B2
公开(公告)日：2018-04-24
申请号：US15129360
申请日：2015-03-30
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich Nikipelov , Johannes Antonius Gerardus Akkermans , Leonardus Adrianus Gerardus Grimminck , Erik Roelof Loopstra , Michael Jozef Mathijs Renkens , Adrian Toma , Han-Kwang Nienhuys
CPC classification number: G03F7/70025 , G03F7/70008 , H01F6/04 , H01F7/0273 , H01F7/0278 , H01S3/0903 , H05H7/04 , H05H2007/041
Abstract: An undulator for a free electron laser includes a pipe for an electron beam and one or more periodic magnetic structures extending axially along the pipe. Each periodic magnetic structure includes a plurality of magnets and a plurality of passive ferromagnetic elements, the plurality of magnets being arranged alternately with the plurality of passive ferromagnetic elements in a line extending in an axial direction. Each of the plurality of magnets is spatially separated from the pipe, and each of the passive ferromagnetic elements extends radially from an adjacent magnet towards the pipe. A spacer element may be provided between the magnets and the pipe to provide radiation shielding for the magnets and/or cooling for the pipe.
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公开(公告)号：US09853412B2
公开(公告)日：2017-12-26
申请号：US15502462
申请日：2015-07-27
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich Nikipelov , Teis Johan Coenen , Wouter Joep Engelen , Gerrit Jacobus Hendrik Brussaard , Gijsbertus Geert Poorter , Erik Roelof Loopstra
IPC: H01S3/00 , H01S3/09 , H01S3/0959 , H01S3/11 , H01S3/102
CPC classification number: H01S3/0903 , H01S3/0071 , H01S3/0959 , H01S3/1024 , H01S3/11 , H01S3/1103
Abstract: Passage through LINACs of electron bunches in their acceleration phase is coordinated with passage through the LINACs of electron bunches in their deceleration phase. Each successive pair of electron bunches are spaced in time by a respective bunch spacing, in accordance with a repeating electron bunch sequence. The electron source provides clearing gaps in the electron bunch sequence to allow clearing of ions at the undulator. The electron source provides the clearing gaps in accordance with a clearing gap sequence such that, for each of the plurality of energy recovery LINACS, and for substantially all of the clearing gaps: for each passage of the clearing gap through the LINAC in an acceleration phase or deceleration phase the clearing gap is coordinated with a further one of the clearing gaps passing through the LINAC in a deceleration phase or acceleration phase thereby to maintain energy recovery operation of the LINAC.
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公开(公告)号：US09798246B2
公开(公告)日：2017-10-24
申请号：US15184770
申请日：2016-06-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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Patent Agency Ranking
公开(公告)号：US09753381B2
公开(公告)日：2017-09-05
申请号：US14388773
申请日：2013-02-15
Applicant: ASML Netherlands B.V.
Inventor： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Antonius Franciscus Johannes De Groot , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Hans Butler
CPC classification number: G03F7/70758 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F9/70 , H02K41/02
Abstract: A substrate table system includes a substrate table and a dual directional motor for moving the substrate table in a plane of movement that is defined by a first direction and a second direction. The dual directional motor includes: a first pusher structure extending in the first direction, the substrate table being movable in respect of the first pusher structure, the first pusher structure and the substrate table being arranged to cooperate to form a first motor to exert a force between the first pusher structure and the substrate table in the first direction; and a second pusher structure extending in the first direction, the substrate table being movable in respect of the second pusher structure, the second pusher structure and the substrate table to cooperate to form a second motor to exert a force between the second pusher structure and the substrate table in the second direction.
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公开(公告)号：US09696636B2
公开(公告)日：2017-07-04
申请号：US14350327
申请日：2012-11-06
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70558 , G03F7/70191 , G03F7/70275 , G03F7/70291 , G03F7/70308 , G03F7/70391 , G03F7/705 , G03F7/70508 , G03F7/70525 , G03F9/7026
Abstract: The invention relates to intensity values for a plurality of beams used to irradiate a plurality of locations on a target are determined with reference to the position and/or rotation of the locations. Also provided is an associated lithographic or exposure apparatus, an associated device manufacturing method and an associated computer program.
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公开(公告)号：US20170160646A1
公开(公告)日：2017-06-08
申请号：US15432698
申请日：2017-02-14
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich BANINE , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin , Antonius Johannes Josephus Van Dijsseldonk , Wilhelmus Petrus De Boeij
CPC classification number: G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
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公开(公告)号：US09623436B2
公开(公告)日：2017-04-18
申请号：US14162435
申请日：2014-01-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens
CPC classification number: G03F7/70875 , B05C9/12 , G03F7/70341
Abstract: A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.
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公开(公告)号：US09606458B2
公开(公告)日：2017-03-28
申请号：US14430507
申请日：2013-09-12
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Dekkers , Andre Bernardus Jeunink , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Michael Jozef Mathijs Renkens , Carolus Johannes Catharina Schoormans , Peter Hoekstra
CPC classification number: G03F7/70775 , G01D5/2449 , G01D5/34707 , G01D18/00 , G01D18/008 , G03F7/70516
Abstract: A method for calibrating an encoder scale having an array of marks in a first direction, includes moving the encoder scale in the first direction relative to a first encoder-type sensor, a second encoder-type sensor and a third encoder-type sensor, wherein the first encoder-type sensor and the second encoder-type sensor are fixedly spaced in the first direction at a first distance relative to each other, wherein the second encoder-type sensor and the third encoder-type sensor are fixedly spaced in the first direction at a second distance relative to each other.
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