-
51.
公开(公告)号:AU7660400A
公开(公告)日:2001-04-30
申请号:AU7660400
申请日:2000-09-29
Applicant: BASF AG
Inventor: SCHWALM REINHOLD , PAULUS WOLFGANG , MEISENBURG UWE , BECK ERICH , BRUCHMANN BERND , SCHROF WOLFGANG , VOLLINGER FRANK
IPC: C08L75/04 , C08G18/00 , C08G18/08 , C08G18/67 , C08G18/78 , C08G18/79 , C08G18/80 , C09D4/00 , C09D175/04 , C09D175/14 , C09D175/16
Abstract: UV- and heat-curable aqueous polyurethane dispersions comprise compounds attached via polyisocyanates and containing UV-polymerizable C=C double bonds, aliphatic diols incorporated by way of isocyanates and having a molecular weight of less than 500 g/mol, compounds attached via isocyanates and containing carboxylic acid or sulfonic acid groups and/or salts thereof, free hydroxyl groups, and compounds containing blocked isocyanate groups. They are suitable for coating heat-stable substrates such as metal substrates and may be used with advantage for automotive clearcoats.
-
公开(公告)号:AT199918T
公开(公告)日:2001-04-15
申请号:AT96118614
申请日:1996-11-20
Applicant: BASF AG
Inventor: HAEUSSLING LUKAS , BERNHARD LUDWIG , REICH WOLFGANG , SCHWALM REINHOLD , BECK ERICH , HARTMANN GABRIELE
IPC: C08F2/46 , C08F2/54 , C08F10/14 , C08F20/10 , C08F210/14 , C08F290/00 , C08F290/06 , C09D4/02
Abstract: A radiation-hardenable compsn. based on radiation-hardenable radically-polymerisable cpds. contains alpha -olefins with more than 8 C.
-
公开(公告)号:DE19940312A1
公开(公告)日:2001-03-01
申请号:DE19940312
申请日:1999-08-25
Applicant: BASF AG
Inventor: JAWOREK THOMAS , SCHWALM REINHOLD , KOENIGER RAINER , KRANWETVOGEL REINER
Abstract: The invention relates to a method for producing scratch-resistant coatings. The inventive method comprises the following steps: applying at least one coating means that can be hardened by UV radiation to at least one surface of an object to be coated, whereby the coating means comprises at least one polymer and/or oligomer P1 with, on average, at least one ethylenically unsaturated double bond per molecule, hardening the coating means under the influence of UV radiation. The inventive method is characterised in that the coating means is hardened in an oxygen-containing protective gas which is provided with an oxygen partial pressure ranging from 0.2 to 18 kPa.
-
公开(公告)号:CA2382094A1
公开(公告)日:2001-03-01
申请号:CA2382094
申请日:2000-08-24
Applicant: BASF AG
Inventor: JAWOREK THOMAS , SCHWALM REINHOLD
IPC: B05D3/04 , B05D3/06 , C08F2/46 , C08F2/48 , C09D4/00 , C09D4/06 , C09D175/16 , C09D175/04 , C09D4/02 , C08J7/04 , C08F290/06
Abstract: The invention relates to a method for producing scratch resistant coatings. A UV hardenable coating agent contains at least one aliphatic urethane(meth)acrylate prepolymer PU with at least two double bonds per molecule or a mixture of at least one urethane(meth)acrylate prepolymer PU a nd at least one reactive diluent, said contents being the photochemically cross - linkable component. At least one of said coating agents is applied to the substrate to be coated. The humid coating thus obtained is hardened in an inert gas atmosphere under the influence of ultraviolet radiation.
-
公开(公告)号:DE19917965A1
公开(公告)日:2000-10-26
申请号:DE19917965
申请日:1999-04-21
Applicant: DAIMLER CHRYSLER AG , BASF AG
Inventor: KOENIGER RAINER , BECK ERICH , GREFENSTEIN ACHIM , SCHWALM REINHOLD , AICHHOLZER WALTER , GRUBER THOMAS , HOLDIK KARL , VEEH MARGIT , VOGEL CLAUDIA
IPC: B32B27/18 , B05D3/06 , B29C35/08 , B29C45/14 , B29C47/02 , B29C47/06 , B29K23/00 , B29L9/00 , B29L31/30 , B32B27/08 , B32B27/16 , B32B27/32 , B32B27/36 , B32B37/00 , B32B37/15 , B32B38/12 , B32B27/30 , B32B31/28 , B29C59/16 , B29D9/00
Abstract: A radiation curable laminate sheet or film (I) comprises (A) a substrate layer and (B) a covering layer. (B) comprises a radiation curable composition that contains a binding agent having a glass transition temperature of greater than 40 deg C. Independent claims are included for (i) a process for the production of (I) by applying (B) in the form of a melt, solution or dispersion and drying as required and (ii) a process for the production of coated molded polymer articles, preferably motor vehicle parts bonding the laminate (I) onto the molded article and curing (B) by irradiation.
-
公开(公告)号:DE19905836A1
公开(公告)日:2000-08-17
申请号:DE19905836
申请日:1999-02-12
Applicant: BASF AG
Inventor: BAUER STEPHAN , WAGNER KLAUS , PAULUS WOLFGANG , SCHWALM REINHOLD
Abstract: Compounds with amino-(2-20C (cyclo)alkane)-carboxylate groups are used as catalysts in a process for the production of polyisocyanate-polyaddition products from isocyanates, isocyanate-reactive compounds of molecular weight 500-8500 and optionally chain-extenders and/or crosslinkers, optionally in the presence of blowing agents. A process for the production of polyisocyanate-polyaddition products involves reacting (a) isocyanates with (b) isocyanate-reactive compounds with molecular weight of 500-8500 and optionally (c) chain extenders and/or crosslinkers with molecular weight of 60-499, in presence of (d) catalysts and optionally (e) blowing agents and/or (f) other additives etc. The catalysts used (d) comprise compound(s) with structural units of formula (I). R = an optionally branched, optionally substituted 2-20C aliphatic or cycloaliphatic residue. An Independent claim is also included for polyisocyanate-polyaddition products obtained by this process.
-
公开(公告)号:DE19543464A1
公开(公告)日:1997-05-28
申请号:DE19543464
申请日:1995-11-22
Applicant: BASF AG
Inventor: HAEUSSLING LUKAS , BERNHARD LUDWIG , REICH WOLFGANG , SCHWALM REINHOLD , BECK ERICH
IPC: C07C67/08 , C07C67/62 , C07C69/54 , C08G65/332 , C09D4/02 , C08L33/06 , C08K5/17 , C08J3/28 , C09D133/06 , C09D167/07 , C09D171/02
Abstract: A process for the production of (meth)acrylate esters (I) by esterification of (meth)acrylic acid (II) with mono- or poly- hydric alcohols (III) is claimed. The reaction mixture, still containing (II) in amounts equivalent to an acid number of at least 5 mg KOH/g, is treated with amino compound(s) (IV) containing at least one prim., sec. or tert. amino group. Also claimed are: (1) esters (I) obtained by this process; and (2) radiation-curable materials (RCM) containing (I).
-
公开(公告)号:CA2190989A1
公开(公告)日:1997-05-23
申请号:CA2190989
申请日:1996-11-21
Applicant: BASF AG
Inventor: HAEUSSLING LUKAS , BERNHARD LUDWIG , REICH WOLFGANG , SCHWALM REINHOLD , BECK ERICH
IPC: C07C67/08 , C07C67/62 , C07C69/54 , C08G65/332 , C09D4/02
Abstract: A process for preparing (meth)acrylic esters by esterifying (meth)acrylic acid with monohydric or polyhydric alcohols comprises adding to the reaction mixture still comprising (meth)acrylic acid corresponding to an acid number of at least 5 mg of KOH per 1 g of reaction mixture at least one amino compound having at least one primary, secondary or tertiary amino group
-
公开(公告)号:AU604932B2
公开(公告)日:1991-01-03
申请号:AU1861288
申请日:1988-07-01
Applicant: BASF AG
Inventor: SCHWALM REINHOLD , BOETTCHER ANDREAS , BINDER HORST
IPC: G03C1/72 , G03F7/004 , G03F7/039 , G03F7/075 , C08L61/08 , C08L61/10 , C08L25/18 , C08L33/10 , C08K5/36 , C08K5/49 , C08K5/54 , C08K5/55 , C08K5/59 , C08K5/00 , G03C1/73 , G03F7/30
Abstract: A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.
-
公开(公告)号:AU1861288A
公开(公告)日:1989-01-05
申请号:AU1861288
申请日:1988-07-01
Applicant: BASF AG
Inventor: SCHWALM REINHOLD , BOETTTCHER ANDREAS , BINDER HORST
IPC: G03C1/72 , G03F7/004 , G03F7/039 , G03F7/075 , C08L61/08 , C08L61/10 , C08L25/18 , C08L33/10 , G03C1/727 , C08K5/36 , C08K5/49 , C08K5/54 , C08K5/55 , C08K5/59 , C08K5/00 , G03F7/26
Abstract: A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.
-
-
-
-
-
-
-
-
-