公开(公告)号：JP2001166478A

公开(公告)日：2001-06-22

申请号：JP34491099

申请日：1999-12-03

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  KOBAYASHI HIDEKAZU ,  SHIOTANI TAKEO ,  SHIMOKAWA TSUTOMU

IPC: H01L21/027 ,  C08L25/18 ,  C08L33/06 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition useful as an excellent chemical amplification type resist which prevents a change of the line width of a resist pattern and the formation of T shape due to the time elapsed from exposure until heating after exposure [post-exposure delay(PED)], is not affected by a stationary wave due to reflection from a substrate and can be applied even in a very small pattern size. SOLUTION: The radiation sensitive resin composition contains (A) a copolymer containing repeating units of formula 1 (where R1 is H or methyl; and R2 is an acid releasable >=11C alicyclic alkyl having a tertiary carbon atom> and repeating units derived from hydroxystyrenes and (B) a radiation sensitive acid generating agent.

公开(公告)号：JP2000336168A

公开(公告)日：2000-12-05

申请号：JP14808499

申请日：1999-05-27

Applicant: JSR CORP

Inventor： EGUCHI KAZUHIRO ,  YASUDA YOSHITOMO ,  SHIMOKAWA TSUTOMU

IPC: G02F1/1337 ,  C08G73/06 ,  C08G73/10

Abstract: PROBLEM TO BE SOLVED: To obtain the subject polymer capable of manifesting favorable orientation characteristics, and useful as a liquid crystal orientation agent capable of forming highly reliable liquid crystal orientation membranes with short afterimage vanishing time in liquid crystal display devices by reaction between specific tetracarboxylic acid anhydrides and a specific diamine. SOLUTION: This polymer is obtained by reaction between (A) at least one kind of acid dianhydride selected from respective compounds of formula I and formula II (R1 and R2 are each a tetravalent organic group; respective acid anhydride groups situated left and right relative to R1 as the center form the corresponding six-membered rings together with R1 to which they are bound, and an acid anhydride group situated right relative to R2 as the center forms a five-membered ring together with R2 to which it is bound, while an acid anhydride group situated left relative to R2 form a six-membered ring together with R2 to which it is bound), (B) at least one kind of acid dianhydride of formula III (R3 is a tetravalent organic group, and respective acid anhydride groups situated left and right relative to R3 as the center form the corresponding five-membered rings together with R3 to which they are bound) and (C) a compound of the formula H2N-R4-NH2 (R4 is a bivalent organic group).

公开(公告)号：JP2000191781A

公开(公告)日：2000-07-11

申请号：JP36732898

申请日：1998-12-24

Applicant: JSR CORP

Inventor： TOKUHISA HIROAKI ,  SHIMOKAWA TSUTOMU ,  BESSHO NOBUO

IPC: C08J5/18 ,  C08G73/10 ,  C08L79/08 ,  G02F1/1337

Abstract: PROBLEM TO BE SOLVED: To obtain a liquid crystal orienting agent, in which orientation ability of a liquid crystal molecule is surely imparted by rubbing treatment, capable of providing a liquid crystal orienting film having excellent liquid crystal orientation property by including polyamic acid and/or polyimide and a specific compound. SOLUTION: This liquid crystal orienting agent is obtained by including (A) 0.1-20 wt.% (i) polyamic acid and/or (ii) polyimide, preferably having 0.05-10 dl/g intrinsic viscosity and (B) 0.01-1 wt.% compound of the formula [R is H or an aliphatic hydrocarbon having (n) valence; (n) is >=1; when R is H, (n) is 1]. The component (i) is prepared by reacting a tetracarboxylic dianhydride with a diamine compound. The component (ii) is prepared by a method heating, e.g. the component (i) to carry out cyclodehydration, or the like. The component B includes water, methanol, ethanol, butanediol or ethylene glycol.

公开(公告)号：JPH11322742A

公开(公告)日：1999-11-24

申请号：JP12632798

申请日：1998-05-08

Applicant: JSR CORP

Inventor： NISHIKUBO TATATOMI ,  KAMEYAMA ATSUSHI ,  SHIMOKAWA TSUTOMU

IPC: G02B1/04 ,  C07D341/00 ,  C08G75/08 ,  C08G75/26 ,  C09K3/00

Abstract: PROBLEM TO BE SOLVED: To obtain a new cyclic compound having a high molecular weight, a relatively high refractive index by making the compound include sulfur, useful as a material for an optical member. SOLUTION: This compound is a cyclic thioaryl ester of formula I. The cyclic compound is obtained by reacting 4,4'-thiobisbenzenethiol with a phenylenedicarboxylic acid halide. The cyclic compound of formula I is reacted with a sulfide compound of formula II [X is a CH2 -O-R (R is a 1-6C alkyl or phenyl); Y is H or is bonded to X to form a 2-6C alkylene] to give a sulfur atom-containing cyclic compound of formula III of macrocyclic structure. A sulfur atom-containing cyclic compound of macrocyclic structure can be obtained by carrying out the reaction in the more excessive ratio of the sulfide compound of formula II based on the cyclic compound of formula I.

公开(公告)号：JP2013084950A

公开(公告)日：2013-05-09

申请号：JP2012216903

申请日：2012-09-28

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ISHII HIROYUKI ,  INOMATA KATSUMI ,  SHIMOKAWA TSUTOMU ,  YAMAGUCHI TORAHIKO

IPC: H01L21/02 ,  H01L21/301 ,  H01L21/304

Abstract: PROBLEM TO BE SOLVED: To provide a substrate-processing method capable of forming a temporary fixing material without floatation between a substrate or a support and a temporary fixing material when laminating a substrate and a support in a method for temporary fixing via a temporary fixing material having an adhesive layer and a peeling layer partially formed.SOLUTION: A substrate-temporary fixing method has steps of: (1) forming an adhesive layer and a peeling layer, in this order, on a substrate with a temporary fixing composition having a polymer (A) and a compound (B) substantially immiscible with the polymer (A); (2) temporarily fixing the above substrate and a support via an adhesive layer, except for a part of the above peeling layer; (4) forming the rest of the adhesive layer, the rest of the peeling layer and the support, in this order, on the substrate, except for a part of the above adhesive layer; and (5) peeling the substrate after processing from the support; in this order.

Abstract translation: 要解决的问题：提供一种能够在基板或支撑体之间形成临时固定材料的基板处理方法和在临时固定方法中通过 临时固定材料具有粘合剂层和部分形成的剥离层。 基板临时固定方法具有以下步骤：（1）依次在具有聚合物（A）和化合物（B）的临时固定组合物的基材上形成粘合剂层和剥离层 ）与聚合物（A）基本上不混溶; （2）除了上述剥离层的一部分之外，经由粘合剂层临时固定上述基板和支撑体; （4）除了上述粘合剂层的一部分之外，依次将剩余的粘合剂层，剩余的剥离层和载体依次形成在基材上; 和（5）从载体加工后剥离基板; 按此顺序 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011070209A

公开(公告)日：2011-04-07

申请号：JP2010246045

申请日：2010-11-02

Applicant: Internatl Business Mach Corp ,  Jsr Corp ,  Jsr株式会社 ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： NISHIMURA YUKIO ,  YAMAHARA NOBORU ,  YAMAMOTO MASASHI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU ,  ITO HIROSHI

IPC: G03F7/039 ,  C08F214/18 ,  C08F220/22 ,  C08F220/24 ,  C08F232/08 ,  C08G61/08 ,  C08K5/10 ,  C08L27/12 ,  C08L33/06 ,  C08L33/16 ,  C08L35/00 ,  C08L101/08 ,  G03F20060101 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a novel radiation sensitive resin composition having high transparency to radiation, excellent basic physical properties for a resist pattern such as in sensitivity, resolution, and pattern shapes, without causing development defects during fine machining, to manufacture semiconductor elements at a high yield.
SOLUTION: The radiation-sensitive resin compositions comprises (A) a resin containing an acid dissociable group obtained by the open ring polymerization of the norbornene derivative having a structure shown by the following general formula (1), and (B) a radiation-sensitive acid generator. In the general formula (1), R
1 represents a hydrogen atom and a univalent acid dissociation group, X
1 a low-grade fluorinated alkyl group, and R
2 a hydrogen atom, an alkyl group or a fluorinated alkyl group.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种对辐射具有高透明度的新颖的辐射敏感性树脂组合物，用于抗敏剂图案的极好的基本物理性能，例如灵敏度，分辨率和图案形状，而不会在精加工期间引起显影缺陷， 以高产率制造半导体元件。 解决方案：辐射敏感性树脂组合物包含（A）含有通过具有下列通式（1）所示结构的降冰片烯衍生物的开环聚合获得的酸解离基的树脂，（B） 辐射敏感酸发生器。 在通式（1）中，R 1 表示氢原子和一价酸解离基团，低级氟化烷基，X 1， 2个氢原子，烷基或氟化烷基。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011053359A

公开(公告)日：2011-03-17

申请号：JP2009200868

申请日：2009-08-31

Applicant: Jsr Corp ,  Jsr株式会社 ,  Kanagawa Univ ,  学校法人神奈川大学

Inventor： NISHIKUBO TATATOMI ,  KUDO HIROTO ,  NIINA NOBUMITSU ,  SHIMOKAWA TSUTOMU ,  KAI TOSHIYUKI ,  MARUYAMA KEN

IPC: G03F7/038 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition capable of forming a chemically amplified negative resist film, which composition is effectively sensitive to EB (electron beam) or EUV (extreme ultraviolet radiation) and excellent in roughness, etching resistance, and sensitivity and which composition stably forms a highly precise fine pattern.
SOLUTION: The negative radiation-sensitive resin composition comprises an arene-based compound (A) represented by general formula (1) or (2) (wherein R is mutually independently a hydrogen atom or a 1-8C alkyl group, X is mutually independently a 1-8C alkylene group, and at least any of Rs is a 1-8C alkyl group), a crosslinking agent (B), an acid generator (C), an acid-diffusion controller (D), and a solvent (E).
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供能够形成化学放大的负性抗蚀剂膜的辐射敏感性树脂组合物，该组合物对EB（电子束）或EUV（极紫外线辐射）有效敏感且具有优异的粗糙度，蚀刻性 电阻和灵敏度，哪种组成稳定地形成高精度的精细图案。 解决方案：负辐射敏感性树脂组合物包含由通式（1）或（2）表示的芳族基化合物（A）（其中R相互独立地为氢原子或1-8C烷基，X 相互独立地为1-8C亚烷基，并且至少任一个R 8为1-8 C烷基），交联剂（B），酸产生剂（C），酸扩散控制剂（D）和 溶剂（E）。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009046395A

公开(公告)日：2009-03-05

申请号：JP2007210723

申请日：2007-08-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SHIMIZU DAISUKE ,  MARUYAMA KEN ,  KAI TOSHIYUKI ,  SHIMOKAWA TSUTOMU

IPC: C07C37/20 ,  C07B61/00 ,  C07C39/17

Abstract: PROBLEM TO BE SOLVED: To provide a method for producing a resorcinol derivative, by which the resorcinol derivative suitable as a compound constituting a radiation-sensitive composition can easily be obtained.
SOLUTION: This method for producing the resorcinol derivative comprises reacting a compound represented by general formula (1) with a compound represented by general formula (2), mixing the reaction solution with an organic solvent, and then separating the product from the organic solvent by decantation to obtain the resorcinol derivative.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种间苯二酚衍生物的制备方法，通过该方法可以容易地获得适合作为构成辐射敏感性组合物的化合物的间苯二酚衍生物。 解决方案：这种制备间苯二酚衍生物的方法包括使通式（1）表示的化合物与通式（2）表示的化合物反应，将反应溶液与有机溶剂混合，然后将产物与 有机溶剂通过倾析得到间苯二酚衍生物。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008102457A

公开(公告)日：2008-05-01

申请号：JP2006286836

申请日：2006-10-20

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NAGAI TOMOKI ,  SHIMOKAWA TSUTOMU ,  NISHIMURA YUKIO

IPC: G03F7/039 ,  C08G75/00 ,  G03F7/029 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition suitable as a resist having sensitivity with respect to far ultraviolet rays, represented by active radiation (for example, ArF excimer laser, EUV, electron beam, and so forth), a substrate with resist film, and a pattern forming method.
SOLUTION: The radiation-sensitive resin composition for use in a lithography process includes (A) a polymer, containing a structure represented by Formulae (1) and (B) a solvent.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了提供适合作为抗紫外线敏感性的抗辐射敏感性树脂组合物，由有源辐射（例如ArF准分子激光，EUV，电子束等）表示， ，具有抗蚀剂膜的基板和图案形成方法。 解决方案：用于光刻工艺的辐射敏感性树脂组合物包括（A）含有由式（1）和（B）表示的结构的溶剂的聚合物。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007047642A

公开(公告)日：2007-02-22

申请号：JP2005234136

申请日：2005-08-12

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KAWAKAMI MINEKI ,  KUSUMOTO SHIRO ,  SHIMOKAWA TSUTOMU ,  SUGIURA MAKOTO ,  HARA HIROMICHI

IPC: G03F7/038 ,  C08F20/38 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a negative radiation-sensitive resin composition which is applicable to a conventional developer of normal concentration without problems, exhibits high resolution in a normal line-and-space pattern, can form a rectangular resist pattern, reduces resist pattern defects such as bridging after development, and is suitable for use as a chemically amplified negative resist excellent also in sensitivity, developability and dimensional faithfulness. SOLUTION: The negative radiation-sensitive resin composition contains a resin (A) containing a repeating unit represented by formula [1] and having a weight average molecular weight (expressed in terms of polystyrene) of 1,000-100,000 by gel permeation chromatography (GPC), a radiation-sensitive acid generator (B) and an acid crosslinking agent (C), wherein R 1 is hydrogen atom, methyl group, ethyl group or a 1-4C perfluoroalkyl group; one of R 2 and R 3 is RfSO 2 NHCH 2 -group (where Rf represents a 1-4C perfluoroalkyl group) and the remainder is hydrogen atom. The negative radiation-sensitive resin composition preferably contains an acid diffusion control agent (D) in combination with the resin (A), the radiation-sensitive acid generator (B) and the acid crosslinking agent (C). COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供适用于常规浓度的普通显影剂的负型辐射敏感性树脂组合物，在法线和空间图案中表现出高分辨率，可以形成矩形抗蚀剂图案， 降低抗蚀剂图案缺陷，例如显影后的桥接，并且适合用作敏感性，显影性和尺寸忠实性优异的化学放大型负型抗蚀剂。 解决方案：负型辐射敏感性树脂组合物含有含有式[1]所示重复单元并通过凝胶渗透色谱法测定的重均分子量（以聚苯乙烯换算）为1,000-100,000的树脂（A） （GPC），辐射敏感性酸产生剂（B）和酸交联剂（C），其中R 1是氢原子，甲基，乙基或1-4C全氟烷基; R 2 和R 3之一中的一个是RfSO 2，其中R f表示1-4C 全氟烷基），其余为氢原子。 负辐射敏感性树脂组合物优选含有与树脂（A），辐射敏感性酸产生剂（B）和酸交联剂（C）组合的酸扩散控制剂（D）。 版权所有（C）2007，JPO＆INPIT