PROCESS FOR PRODUCTION OF METHANEDIPHOSPHONIC ACID

    公开(公告)号:CA2174435A1

    公开(公告)日:1996-02-29

    申请号:CA2174435

    申请日:1995-08-24

    Abstract: A process for producing a 1-alkylthiomethanediphosphonic acid compound or a 1arylthiomethanediphosphonic acid compound by the condensation reaction represented by formula (A), wherein the thiolate as the by-product is removed in the form of an insoluble salt (wherein R'1 represents C1-C6 linear or branched alkyl; R2 represents alkyl or aryl; and R1 represents a pharmacologically acceptable cation, hydrogen, or C1-C6 linear or branched alkyl). As compared with the conventional processes, this process is so improved in the yield that the product can readily be purified, thus being useful from the economic and industrial viewpoints.

    52.
    发明专利
    未知

    公开(公告)号:FI944998A0

    公开(公告)日:1994-10-24

    申请号:FI944998

    申请日:1994-10-24

    Abstract: A process for producing a 1-alkylthio- or 1-arylthiomethanediphosphonate compound by conducting the coupling reaction represented by formula (I) in the presence of a metallic oxide, wherein four R'1 groups represent each independently C1-C6 linear or branched alkyl; four R1 groups represent each independently a pharmacologically acceptable cation, hydrogen or C1-C6 linear or branched alkyl; and R2 represents alkyl or aryl. This process is extremely useful from the economic and industrial points of view, because the yield is remarkably improved and accordingly the purification procedure is simplified as compared with the conventional ones.

    Process for producing methanediphosphonate compound

    公开(公告)号:AU6115094A

    公开(公告)日:1994-09-14

    申请号:AU6115094

    申请日:1994-02-23

    Abstract: A process for producing a 1-alkylthio- or 1-arylthiomethanediphosphonate compound by conducting the coupling reaction represented by formula (I) in the presence of a metallic oxide, wherein four R'1 groups represent each independently C1-C6 linear or branched alkyl; four R1 groups represent each independently a pharmacologically acceptable cation, hydrogen or C1-C6 linear or branched alkyl; and R2 represents alkyl or aryl. This process is extremely useful from the economic and industrial points of view, because the yield is remarkably improved and accordingly the purification procedure is simplified as compared with the conventional ones.

    PROCESS FOR PREPARING A THIN FILM AND APPARATUS THEREFOR

    公开(公告)号:CA1274963A

    公开(公告)日:1990-10-09

    申请号:CA500353

    申请日:1986-01-24

    Abstract: A process is disclosed for preparing a thin film having a large area. A casting solution comprising a film-forming material and a solvent is fed to the surface of a liquid substrate immiscible with the solution by utilizing a interfacial tension. Spontaneous spreading of the casting solution occurs across the surface of the liquid substrate and evaporation of the solvent produces the thin film on the liquid surface which is continuously collected. The feed of the casting solution to the surface of the substrate comprises at least either a material which shows selective wettability for the casting solution in preference to the liquid substrate or a structure capable of developing capillarity.

    TREATMENT OF IMAGE-FORMING LAMINATED PLATE

    公开(公告)号:CA1243880A

    公开(公告)日:1988-11-01

    申请号:CA432855

    申请日:1983-07-20

    Abstract: TREATMENT OF IMAGE-FORMING LAMINATED PLATE An image-forming laminated plate, particularly a dry planographic printing unprocessed plate, comprising a base substrate, a photosensitive layer containing a substance with quinonediazide structure and a silicone rubber layer in laminating order is treated with a base after imagewise exposure. In addition, the image-forming laminated plate may be subjected to a whole surface slight exposure to the extent that 5 to 60 molar % of the quinonediazide structure in the photosensitive layer to be exposed is photo-decomposed into carboxylic acid structure before or after the usual imagewise exposure for obtaining a negative working plate, or the image-forming laminated plate may be subjected to a imagewise slight exposure to the same extent without the usual imagewise exposure for obtaining a positive working plate. The base-treatment alone or in combination with the slight exposure enhances both the adhesion of the photosensitive layer to the silicone rubber layer and the solvent resistance of the photosensitive layer in non-image areas.

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