VERFAHREN ZUM HERSTELLEN EINER VORRICHTUNG MIT EINER DREIDIMENSIONALEN MAGNETISCHEN STRUKTUR

    公开(公告)号:EP3234968A1

    公开(公告)日:2017-10-25

    申请号:EP15816399.8

    申请日:2015-12-11

    Abstract: The invention relates to a method for producing a device (120) having a three-dimensional magnetic structure (132), comprising a step of applying magnetic particles (130) onto or into a carrier element (122), wherein a plurality of hollow spaces that are at least partially connected to one another are formed between the magnetic particles, and wherein the magnetic particles are brought into contact with one another at contact points. The method also comprises a step of joining the magnetic particle at the contact points by coating the assembly formed by magnetic particles and the carrier element, wherein the hollow spaces are penetrated at least partially by the layer generated by the coating. The device comprises a conductor loop assembly (124) on the carrier element or a further carrier element, such that in the event of a current flow through the conductor loop assembly (1), an inductivity of the conductor loop assembly is altered by the three-dimensional magnetic structure, or (2) a force acts on the three-dimensional magnetic structure or the conductor loop assembly via a magnetic field generated by the current flow, or (3) in the event of a change of position of the three-dimensional magnetic structure, a current flow is induced via the conductor loop assembly.

    Abstract translation: 本发明涉及一种用于制造具有三维磁结构(132)的装置(120)的方法,包括将磁性颗粒(130)施加到载体元件(122)上或载体元件(122)中的步骤,其中多个空腔 至少部分彼此连接的所述磁性颗粒形成在所述磁性颗粒之间,并且其中所述磁性颗粒在接触点处彼此接触。 该方法还包括通过涂覆由磁性颗粒和载体元件形成的组件而在接触点处接合磁性颗粒的步骤,其中,中空空间至少部分地被涂层产生的层穿透。 该装置包括在载体元件或另一载体元件上的导体环组件(124),使得在电流流过导体环组件(1)的情况下,导体环组件的感应性被三个 或(2)力通过由电流产生的磁场作用于三维磁结构或导体环组件,或(3)在三维磁结构的位置改变的情况下, 通过导体环组件引起电流流动。

    FLACHSPULE UND LITHOGRAPHISCHES VERFAHREN ZUR HERSTELLUNG VON MIKROBAUTEILEN
    57.
    发明公开
    FLACHSPULE UND LITHOGRAPHISCHES VERFAHREN ZUR HERSTELLUNG VON MIKROBAUTEILEN 有权
    扁平线圈和光刻工艺用于生产微型元件

    公开(公告)号:EP1238311A1

    公开(公告)日:2002-09-11

    申请号:EP00976041.4

    申请日:2000-11-17

    Abstract: The invention relates to a flat coil and to a lithographic method for producing microcomponents with metal component structures in the sub-millimeter range. According to the inventive method, a resist material is structured by means of selective exposition and removing the unexposed zones and filling in the gaps between the resist structures with metal by means of a galvanic method to produce the metal component structures. The aim of the invention is to improve such a method so that the microcomponents can be subdivided during said process. To this end, a structured three-dimensional sacrificial metal layer is produced during the production of the microcomponent, said sacrificial layer delimiting the microcomponent and being removed once the microcomponent is due to be subdivided. The invention also relates to a method for producing microcomponents with component structures of cross-linkable resist material and to a flat coil for micromotors with at least one coil layer with strip conductors in the sub-millimeter range.

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