Line scan spectroscopic white light interferometry for semiconductor inspection and metrology

    公开(公告)号:US09863756B1

    公开(公告)日:2018-01-09

    申请号:US14877882

    申请日:2015-10-07

    Inventor: Shifang Li

    Abstract: A device and method for surface height profiling are presented. The device has a source with a source slit through which light is provided. The device includes an objective lens having a reference surface. The objective lens is configured to illuminate a sample with test light from the source and to combine test light reflected from the sample with reference light reflected from the reference surface to form combined light. A spectrometer is positioned to receive the combined light at an entrance slit. The spectrometer is configured to image the combined light as a 2D image with a wavelength dimension and a spatial position dimension. A processor in electrical communication with the spectrometer is programmed to receive a signal representing the 2D image and to determine a surface height profile of the sample based on the signal.

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