Abstract:
Disclosed are a high electron mobility transistor and a method of manufacturing the same. The disclosed high electron mobility transistor includes a depletion formation region which consists of a first region which is prepared on a channel supply layer and forms a depletion region in a 2-dimensional electron gas, and a second region which is extended from the first region and is prepared between the first region and a source/drain electrode. The hole concentration of the second region is lower than that of the first region.
Abstract:
A normally off high electron mobility transistor is disclosed. The disclosed normally off high electron mobility transistor includes a channel layer which includes a first nitride semiconductor, a channel supply layer which includes a second nitride semiconductor and induces a 2D electron gas on the channel layer, a source electrode and a drain electrode in both sides of the channel supply layer, a depletion formation layer which forms a depletion region in the 2D electron gas on the channel supply layer and has at least two thicknesses, a gate insulating layer on the depletion formation layer, and a gate electrode which touches the depletion formation layer on the gate insulating layer.
Abstract:
A high electron mobility transistor (HEMT) and a manufacturing method thereof are disclosed. The disclosed HEMT includes: a channel layer; a channel supply layer which is formed on the channel layer; a source electrode and a drain electrode which are formed on the channel layer or the channel supply layer; a gate electrode which is arranged between the source electrode and the drain electrode; and a source pad and a drain pad which electrically comes in contact with each of the source electrode and the drain electrode. At least one between the source pad and the drain pad is able to have a structure in which at least one part is inserted inside an electrode which electrically comes in contact with at least one of the source pad and the drain pad.
Abstract:
PURPOSE: A unit pixel, a pixel array and an optical sensing device equipped with the pixel array for boosting a floating diffusion area are provided to maximize the initialization of a floating diffusion area. CONSTITUTION: A pixel area equips a pixel. A unit pixel equips a boosting capacitor for boosting a floating diffusion area. An optical sensing device includes a photoelectro transform unit(PD). A transfer transistor(M1) transfers electric charge which generated from the photoelectro transform unit to the floating diffusion area. A reset transistor initializes the floating diffusion area. One terminal is connected to the floating diffusion area.
Abstract:
PURPOSE: A material management system and method is provided to read bar codes of materials before putting the materials into semiconductor production lines, compare the read bar code data with the data stored in advance, and generate an alarm if the compared result is not identical so that it can prevent a wrong processing. CONSTITUTION: The method comprises steps of reading manufacturing data from bar codes adhered to materials put into a production process line or a supply equipment(S100), reading data from bar codes adhered to a target and a vessel(S102), a bar code data management computer determining if the bar code data is read, and storing the read bar code data in a database(S104, S106), the computer searching for a corresponding bar code data for a table in relation with the read bar code data, and comparing the searched data with the read data(S110), and generating an interlock signal and an alarm signal if the searched data is not to the read data(S120).
Abstract:
본 발명은 반도체 디바이스 제조용 원부자재의 데이터 관리 시스템 및 이를 이용한 원부자재의 데이터 관리 방법에 관한 것으로, 공정설비 및 공급설비에 투입되는 원부자재의 바코드를 리딩하고, 이에 대한 바코드리딩데이터를 데이터 베이스에 저장 관리함으로서 종래에 원부자재의 데이터를 수기록하거나 키보드를 통해 저장 관리하는 것보다 더 정확하고 신속하여 작업효율의 향상을 기대할 수 있다.