公开(公告)号：KR100468855B1

公开(公告)日：2005-01-29

申请号：KR1020020069593

申请日：2002-11-11

Applicant: 삼성전자주식회사

Inventor： 조은형 ,  손진승 ,  이명복 ,  박영필

IPC: G02B1/12

CPC classification number: G02B3/08 ,  G02B5/1814 ,  G02B27/4238 ,  G11B7/1367 ,  G11B7/1374

Abstract: A hybrid lens with a high numerical aperture is described. The hybrid lens comprises a refractive surface that refracts incident light and a diffractive surface that diffracts light exiting the lens, the diffracting surface designed by a sag satisfying the following Equation: s ⁢ ⁢ a ⁢ ⁢ g = f D + m ⁢ ⁢ lambda - f D ⁢ 2 + r ⁢ 2 n - 1 , wherein f D is a distance from a center peak to a focal point of the hybrid lens, r is a height from a center axis to each peak of the hybrid lens, n is the refractive index of the hybrid lens, lambda is the wavelength of incident light and m is an integer. The hybrid lens is small and lightweight and capable of removing chromatic aberration.

Abstract translation: 描述具有高数值孔径的混合透镜。 该混合透镜包括折射入射光的折射表面和衍射从透镜出射的光的衍射表面，衍射表面由下垂设计，满足下式：＆lt; maths id =“MATH-US-00001” NUM = QUOT; 00001＆QUOT;＆GT; ＆lt; MATH OVERFLOW =＆quot; SCROLL＆quot;＆gt; ＆LT; MROW＆GT; ＆LT; MROW＆GT; ＆LT; MROW＆GT; ＆LT; MI＆GT; S＆LT; / MI＆GT; ＆LT; MO＆GT;＆安培;＃x2062;＆LT; / MO＆GT; ＆LT; MSTYLE＆GT; ＆LT; MTEX​​T＆GT; ＆LT; / MTEX​​T＆GT; ＆LT; / MSTYLE＆GT; ＆LT; MO＆GT;＆安培;＃x2062;＆LT; / MO＆GT; ＆LT; MI＆gt;一种与LT; / MI＆GT; ＆LT; MO＆GT;＆安培;＃x2062;＆LT; / MO＆GT; ＆LT; MSTYLE＆GT; ＆LT; MTEX​​T＆GT; ＆LT; / MTEX​​T＆GT; ＆LT; / MSTYLE＆GT; ＆LT; MO＆GT;＆安培;＃x2062;＆LT; / MO＆GT; ＆LT; MI＆GT;克LT; / MI＆GT; ＆LT; / MROW＆GT; ＆LT; MO＆GT; =＆LT; / MO＆GT; ＆LT; MFRAC＆GT; ＆LT; MROW＆GT; ＆LT; MSUB＆GT; ＆LT; MI＆GT; F＆LT; / MI＆GT; ＆LT; MI＆GT; d＆LT; / MI＆GT; ＆LT; / MSUB＆GT; ＆LT; MO＆GT + LT; / MO＆GT; ＆LT; MROW＆GT; ＆LT; MI＆GT; M＆LT; / MI＆GT; ＆LT; MO＆GT;＆安培;＃x2062;＆LT; / MO＆GT; ＆LT; MSTYLE＆GT; ＆LT; MTEX​​T＆GT; ＆LT; / MTEX​​T＆GT; ＆LT; / MSTYLE＆GT; ＆LT; MO＆GT;＆安培;＃x2062;＆LT; / MO＆GT; ＆LT; MI＆GT;拉姆达＆LT; / MI＆GT; ＆LT; / MROW＆GT; ＆LT; MO＆GT; - ＆LT; / MO＆GT; ＆LT; MSQRT＆GT; ＆LT; MROW＆GT; ＆LT; MSUBSUP＆GT; ＆LT; MI＆GT; F＆LT; / MI＆GT; ＆LT; MI＆GT; d＆LT; / MI＆GT; ＆LT; MROW＆GT; ＆LT; MSTYLE＆GT; ＆LT; MTEX​​T＆GT; ＆LT; / MTEX​​T＆GT; ＆LT; / MSTYLE＆GT; ＆LT; MO＆GT;＆安培;＃x2062;＆LT; / MO＆GT; ＆LT; MN＆GT; 2'; / MN＆GT; ＆LT; / MROW＆GT; ＆LT; / MSUBSUP＆GT; ＆LT; MO＆GT + LT; / MO＆GT; ＆LT; MSUP＆GT; ＆LT; MI＆GT;为r / MI＆GT; ＆LT; MROW＆GT; ＆LT; MSTYLE＆GT; ＆LT; MTEX​​T＆GT; ＆LT; / MTEX​​T＆GT; ＆LT; / MSTYLE＆GT; ＆LT; MO＆GT;＆安培;＃x2062;＆LT; / MO＆GT; ＆LT; MN＆GT; 2'; / MN＆GT; ＆LT; / MROW＆GT; ＆LT; / MSUP＆GT; ＆LT; / MROW＆GT; ＆LT; / MSQRT＆GT; ＆LT; / MROW＆GT; ＆LT; MROW＆GT; ＆LT; MI将N＆LT; / MI＆GT; ＆LT; MO＆GT; - ＆LT; / MO＆GT; ＆LT; MN大于1＆LT; / MN＆GT; ＆LT; / MROW＆GT; ＆LT; / MFRAC＆GT; ＆LT; / MROW＆GT; ＆LT; MO＆GT;，＆LT; / MO＆GT; ＆LT; / MROW＆GT; ＆LT; / MATH＆GT; ＆LT; /数学及GT; 其中f＆lt; SUB＆gt; D＆lt; /＆gt;是从中心峰值到混合透镜的焦点的距离，r是从中心轴到混合透镜的每个峰值的高度，n是 混合透镜，λ是入射光的波长，m是整数。 混合镜头体积小，重量轻，可消除色差。

公开(公告)号：KR1020040096764A

公开(公告)日：2004-11-17

申请号：KR1020040029854

申请日：2004-04-29

Applicant: 삼성전자주식회사

Inventor： 손진승 ,  이명복 ,  정미숙 ,  조은형

IPC: G11B7/22

CPC classification number: G11B7/1353 ,  G11B7/123 ,  G11B7/22

Abstract: PURPOSE: An integrated optical pickup is provided to comprise an optical bench forming an optical path, and to separate the optical bench and a condenser/optical path separation member into plural assemblies. CONSTITUTION: Main optical detectors(36a,36b) receive a light reflected from an optical information storage medium(D). A condenser/optical path separation member(37) focuses a light irradiated from a light source(32) on the optical information storage medium(D), and separates optical paths of the incident light of the optical information storage medium(D) and a reflected light of the optical information storage medium(D). An optical bench(31) is coupled with the condenser/optical path separation member(37), and forms an optical path. The optical bench(31) and the condenser/optical path separation member(37) are formed on wafers, respectively, and are separated into plural assemblies.

Abstract translation: 目的：提供集成的光学拾取器，其包括形成光路的光学台，以及将光学台和冷凝器/光路分离构件分离成多个组件。 构成：主光学检测器（36a，36b）接收从光学信息存储介质（D）反射的光。 聚光器/光路分离构件（37）将从光源（32）照射的光聚焦在光信息存储介质（D）上，并分离光信息存储介质（D）的入射光的光路和 光信息存储介质（D）的反射光。 光台（31）与冷凝器/光路分离部件（37）连接，形成光路。 光学台（31）和冷凝器/光路分离构件（37）分别形成在晶片上，并被分离成多个组件。

公开(公告)号：KR1020040093607A

公开(公告)日：2004-11-06

申请号：KR1020030027544

申请日：2003-04-30

Applicant: 삼성전자주식회사

Inventor： 조은형 ,  이명복 ,  손진승 ,  정미숙 ,  박영필

IPC: G02B3/00

Abstract: PURPOSE: A method for fabricating a hybrid micro-lens array is provided to form a low-priced hybrid micro-lens by improving a fabrication process. CONSTITUTION: A plurality of holes are formed on a substrate(11). A plurality of micro lens(13) are inserted into the holes. A melted glass solution(15) is injected into the micro lens. The melted glass solution is hardened. A polishing process for the substrate, the micro lens, and the glass is performed. A polymer is coated on an unpolished surface of the micro lens. The surface of the micro lens including the polymer is pressed by an aspheric mold(22). The polymer is hardened by the light. The aspheric mold is removed therefrom. The polishing process for the substrate, the micro lens, and the glass is performed.

Abstract translation: 目的：提供一种制造混合微透镜阵列的方法，通过改进制造工艺来形成低价混合微型透镜。 构成：在基板（11）上形成多个孔。 多个微透镜（13）插入孔中。 将熔融的玻璃溶液（15）注入微透镜。 熔化的玻璃溶液硬化。 执行基板，微透镜和玻璃的抛光工艺。 将聚合物涂覆在微透镜的未抛光表面上。 包括聚合物的微透镜的表面被非球面模具（22）压制。 聚合物被光硬化。 从其中移除非球面模具。 进行基板，微透镜和玻璃的抛光处理。

公开(公告)号：KR1020040068694A

公开(公告)日：2004-08-02

申请号：KR1020030005197

申请日：2003-01-27

Applicant: 삼성전자주식회사

Inventor： 이명복 ,  손진승 ,  조은형 ,  박영필

IPC: G02B3/00

CPC classification number: G02B3/0018 ,  G02B3/0068 ,  G03F7/0005 ,  G03F7/0035 ,  G03F7/40

Abstract: PURPOSE: A method for manufacturing a micro lens array is provided to manufacture the micro lens array having a high accuracy of curvature by adding some process to the manufacturing process of a conventional micro lens array. CONSTITUTION: A method for manufacturing a micro lens array includes the steps of: forming a photoresist mask(40) in the form of cylinder on one side of the substrate(10) by using a photolithography; forming a predetermined shape corresponding to the micro lens by reflowing the mask with a heat; forming the micro lens by transferring the mask shape on the surface of the substrate by using a plasma etching; forming the photoresist(30) having a shape to compensate the curvature of the micro lens on the surface of the micro lens; and transferring the curvature shape of the photoresist(30) to the surface of the micro lens by plasma etching the photoresist(30).

Abstract translation: 目的：提供一种制造微透镜阵列的方法，通过向常规微透镜阵列的制造工艺添加一些工艺来制造具有高曲率精度的微透镜阵列。 构成：用于制造微透镜阵列的方法包括以下步骤：通过光刻在基底（10）的一侧上形成圆柱形式的光致抗蚀剂掩模（40）; 通过用热回流掩模来形成对应于微透镜的预定形状; 通过使用等离子体蚀刻在基板的表面上转印掩模形状来形成微透镜; 形成具有补偿微透镜表面上的微透镜的曲率的形状的光致抗蚀剂（30）; 以及通过等离子体蚀刻光致抗蚀剂（30）将光致抗蚀剂（30）的曲率形状转移到微透镜的表面。

公开(公告)号：KR1020150059494A

公开(公告)日：2015-06-01

申请号：KR1020130143152

申请日：2013-11-22

Applicant: 삼성전자주식회사

Inventor： 조은형 ,  고웅 ,  김재관 ,  문창렬 ,  심홍식 ,  유인경 ,  정철호

IPC: G02B5/20 ,  G02B5/00 ,  H01L51/50

CPC classification number: H01L51/5275 ,  B29C33/3885 ,  B29D11/00365 ,  B29D11/00788 ,  B29K2029/04 ,  B29K2905/00 ,  B29K2907/00

Abstract: 광학필름제조방법은다수의마이크로렌즈패턴에대응하는형상이음각된마스터를형성하는단계; 상기마스터를이용하여, 상기다수의마이크로렌즈패턴이형성된저굴절률패턴층을형성하는단계; 기판상의제1면에, 상기저굴절률패턴층의굴절률보다큰 굴절률을가지는고굴절률물질층을형성하고, 상기저굴절률패턴층을상기고굴절률물질층에임프린트하여고굴절률패턴층을형성하는단계;를포함한다.

Abstract translation: 光学膜的制造方法包括： 形成其中刻有与多个微透镜图案相对应的形状的主体的步骤; 形成低折射率图案层的步骤，其中通过使用母版形成微透镜图案; 在所述基板的第一表面上形成折射率高于所述低折射率图案层的折射率的高折射率材料层的步骤，并且通过将所述低折射率图案层压印在所述高折射率图案层上而形成高折射率图案层 折射率材料层。 根据本发明，低折射率图案层用作压印用模具以形成高折射率图案层。 因此，不存在将压印用模具与高折射率图案层分离的剥离处理。 此外，可以形成具有较少缺陷的微透镜阵列图案。

公开(公告)号：KR1020140074447A

公开(公告)日：2014-06-18

申请号：KR1020120142239

申请日：2012-12-07

Applicant: 삼성전자주식회사

Inventor： 조은형 ,  최준희 ,  손진승

IPC: H01L27/14 ,  H01L31/04

CPC classification number: H01L21/568 ,  H01L21/6835 ,  H01L2221/6835 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Disclosed is a method of transferring a semiconductor element which can be used for transferring the semiconductor element formed on a non-flexible substrate to a flexible substrate. Also, disclosed is a method of manufacturing a flexible semiconductor device based on the method of transferring a semiconductor element. A vertical type semiconductor element formed or grown on a substrate can be more effectively transferred to a resin layer while its arrangement is maintained. The resin layer functions as a flexible substrate which supports the vertical type semiconductor element.

Abstract translation: 公开了一种转移可用于将形成在非柔性基板上的半导体元件转移到柔性基板上的半导体元件的方法。 另外，公开了基于半导体元件的转印方法来制造柔性半导体器件的方法。 形成或生长在基板上的垂直型半导体元件可以更有效地转移到树脂层，同时保持其布置。 树脂层用作支撑垂直型半导体元件的柔性基板。

公开(公告)号：KR1020140064526A

公开(公告)日：2014-05-28

申请号：KR1020120131944

申请日：2012-11-20

Applicant: 삼성전자주식회사

Inventor： 손진승 ,  조은형

IPC: G09F9/00 ,  G02F1/1335 ,  G02B5/30

CPC classification number: F21V13/08 ,  G02F1/133528 ,  G02F1/133553 ,  G02F2001/133565 ,  G02F2001/133607

Abstract: Disclosed are a display panel having improved light usage efficiency by efficiently recycling light provided from a light source, a display apparatus including the display panel, and a method of fabricating the display panel. The disclosed display panel according to an embodiment of the present invention may include a plurality of opening regions for forming an image by controlling transmission and blocking of the incident light; and an inclined reflecting plate disposed in a non-opening region to reflect the incident light obliquely.

Abstract translation: 公开了通过有效地回收从光源提供的光，具有显示面板的显示装置和制造显示面板的方法，提高了光使用效率的显示面板。 根据本发明的实施例的所公开的显示面板可以包括通过控制入射光的透射和阻挡来形成图像的多个开口区域; 以及设置在非开口区域中以倾斜地反射入射光的倾斜反射板。

公开(公告)号：KR1020130058585A

公开(公告)日：2013-06-04

申请号：KR1020120039966

申请日：2012-04-17

Applicant: 삼성전자주식회사

Inventor： 박성훈 ,  조은형 ,  손진승 ,  김동언 ,  김동욱 ,  김하진 ,  배민종 ,  손윤철 ,  이상의 ,  주건모

IPC: B82B1/00 ,  C08K3/04 ,  H05B3/18

CPC classification number: B32B3/30 ,  B82Y30/00 ,  Y10T428/24355

Abstract: PURPOSE: A manufacturing method of a nanocomposite having a superhydrophobic surface is provided to obtain the resistance improved nanocomposite for pollution and damages by directly forming the superhydrophobic surface on the surface of the nanocomposite. CONSTITUTION: A nanocomposite having a superhydrophobic surface comprises a bulk portion(10) and a surface portion(11) having the superhydrophobic surface. The bulk portion and the surface portion comprise the same material. The width, length, or distance between patterns of the superhydrophobic surface is 10 nanometers to 500 micrometers. The surface portion has the contact angle of 130 degrees to 180 degrees. The nanocomposite comprises a polymer base and a conductive filter. A superhydrophobic pattern is directly formed by molding or press-stamping on the nanocomposite.

Abstract translation: 目的：提供具有超疏水表面的纳米复合材料的制造方法，以通过在纳米复合材料表面直接形成超疏水表面来获得用于污染和损伤的电阻改善的纳米复合材料。 构成：具有超疏水表面的纳米复合材料包括主体部分（10）和具有超疏水表面的表面部分（11）。 本体部分和表面部分包括相同的材料。 超疏水表面的图案之间的宽度，长度或距离为10纳米至500微米。 表面部分的接触角为130度至180度。 纳米复合材料包括聚合物基底和导电过滤器。 通过在纳米复合材料上模压或冲压直接形成超疏水图案。

公开(公告)号：KR1020130034379A

公开(公告)日：2013-04-05

申请号：KR1020110098359

申请日：2011-09-28

Applicant: 삼성전자주식회사

Inventor： 조은형 ,  손진승 ,  박성훈 ,  문창렬 ,  김하진

IPC: H05K9/00 ,  C01B13/02

CPC classification number: H01J1/52 ,  B05D1/42 ,  B05D5/08 ,  H05K9/009 ,  Y10T428/31511 ,  Y10T428/3154 ,  Y10T428/31663 ,  Y10T428/31786

Abstract: PURPOSE: A super hydrophobic electromagnetic field shielding material and a method for preparing the same are provided to secure a super hydrophobic property by forming at least two recess patterns on a surface. CONSTITUTION: A super hydrophobic electromagnetic field shielding material(30) comprises a curing resin and a carbon material. The carbon material is 3 to 20 weight %. The super hydrophobic electromagnetic field shielding material includes a first recess pattern(40) and a second recess pattern(50). The first recess pattern includes a first recess groove formed in a solid surface. The second recess pattern includes a second recess groove(51). The size of the second recess groove(51) is smaller than that of the first recess groove. The second recess pattern is formed in the surface of the super hydrophobic electromagnetic field shielding material.

Abstract translation: 目的：提供超疏水电磁场屏蔽材料及其制备方法，以通过在表面上形成至少两个凹槽图案来确保超疏水性。 构成：超疏水电磁场屏蔽材料（30）包括固化树脂和碳材料。 碳材料为3〜20重量％。 超疏水电磁场屏蔽材料包括第一凹槽图案（40）和第二凹槽图案（50）。 第一凹槽图案包括形成在固体表面中的第一凹槽。 第二凹部图案包括第二凹槽（51）。 第二凹槽（51）的尺寸小于第一凹槽的尺寸。 在超疏水电磁场屏蔽材料的表面形成第二凹槽图案。

公开(公告)号：KR1020100121943A

公开(公告)日：2010-11-19

申请号：KR1020090040893

申请日：2009-05-11

Applicant: 삼성전자주식회사

Inventor： 김해성 ,  조은형 ,  손진승 ,  마동준

IPC: G02B5/20 ,  G02B6/13

Abstract: PURPOSE: A method of manufacturing a photonic crystal type color filter is provided to improve the regularity of a pattern by reducing the number of process. CONSTITUTION: A refraction material layer is formed on a substrate(130) and is pushed through a mold to form a two-dimensional photonic crystal color pattern structure. Crystallizing energy is applied to the refraction material layer. The mold adopts the two- dimensional photonic crystal color pattern structure and then the mold is separated.

Abstract translation: 目的：提供一种制造光子晶体型滤色器的方法，通过减少工艺数量来提高图案的规则性。 构成：在基板（130）上形成折射材料层，并且通过模具被推入以形成二维光子晶体彩色图案结构。 将结晶能量施加到折射材料层。 模具采用二维光子晶体彩色图案结构，然后模具分离。