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    METHOD FOR THE PRODUCTION OF LOW-ODOR HYDROGEL-FORMING POLYMERS
    62.
    发明专利
    METHOD FOR THE PRODUCTION OF LOW-ODOR HYDROGEL-FORMING POLYMERS 未知

    公开(公告)号：CA2507548A1

    公开(公告)日：2004-06-24

    申请号：CA2507548

    申请日：2003-12-08

    Applicant: BASF AG

    Inventor： NESTLER GERHARD ,  MUELLER-ENGEL KLAUS JOACHIM ,  WICKEL STEFAN

    IPC: A61L15/60 ,  C08F8/00 ,  C08F20/06 ,  C08J3/12 ,  C07C51/43

    Abstract: The invention relates to a method for producing low-odor, hydrogel-forming polymers based on acrylic acid. Said method comprises the following steps: a ) a polymeric hydrogel is produced by radically polymerizing a monomer composition containing at least 50 percent by weight of acrylic acid in an aqueous polymerizing medium, and the hydrogel is transformed into a particle - shaped hydrogel or a powder forming a hydrogel; and optionally b) the partic le- shaped hydrogel or the powder forming a hydrogel is treated with a crosslinking substance comprising at least two functional groups that are reactive towards the carboxyl groups of the polymer, optionally in a latent form. The inventive method is characterized by the fact that the acrylic aci d used in step a) comprises a total amount of oligomers of less than 500 ppm, preferably no more than 400 ppm, and especially no more than 300 ppm, ppm referring to proportions by weight relative to the acrylic acid. Advantageously, the proportion of triacrylic acid (compound I in which x = 2 ) and higher oligomers of the acrylic acid amounts to less than 100 ppm, especially less than 50 ppm, and particularly less than 10 ppm.

    Heterogeneously catalyzed gas-phase partial oxidation of acrolein to acrylic acid, used to produce polymers for adhesives, involves using active multimetal oxide material containing e.g. molybdenum and vanadium
    63.
    发明专利
    Heterogeneously catalyzed gas-phase partial oxidation of acrolein to acrylic acid, used to produce polymers for adhesives, involves using active multimetal oxide material containing e.g. molybdenum and vanadium 未知

    公开(公告)号：DE10246119A1

    公开(公告)日：2004-04-15

    申请号：DE10246119

    申请日：2002-10-01

    Applicant: BASF AG

    Inventor： HECHLER CLAUS ,  SCHINDLER GOETZ-PETER ,  PETZOLDT JOCHEN ,  ADAMI CHRISTOPH ,  MACHHAMMER OTTO ,  MUELLER-ENGEL KLAUS JOACHIM ,  MARTAN HANS

    IPC: C07C47/22 ,  C07C57/04 ,  C07C253/18 ,  C07C255/08 ,  C07D301/08 ,  C07D303/04

    Abstract: A heterogeneously catalyzed gas-phase partial oxidation of acrolein to acrylic acid over a catalytically active multimetal oxide material which contains the elements molybdenum and vanadium, tellurium or antimony, and elements consisting of niobium, tantalum, tungsten or titanium, whose X-ray diffraction pattern has no reflections with the peak position 2 theta = 50 +/- 0.30 but has reflections whose peaks are at specified diffraction angles. Heterogeneously catalyzed gas-phase partial oxidation of acrolein to acrylic acid over a catalytically active multimetal oxide material which contains the elements molybdenum and vanadium, tellurium or antimony, and elements consisting of niobium, tantalum, tungsten or titanium, whose X-ray diffraction pattern has no reflections with the peak position 2 theta = 50 +/- 0.30 but has reflections h, i and k whose peaks are at the diffraction angles (2 theta) 22.2 +/- 0.5 degrees (h), 27.3 +/- 0.50 (i) and 28.2 +/- 0.50 (k). The reflection (h ) is the one with the strongest intensity within the X-ray diffraction pattern and having a full width at half height of not more than 0.50; the intensity (Pi) of the reflection (i) and the intensity (Pk) of the reflection (k) fulfill the relationship that R is 0.65-0.85, where R is the intensity ratio defined by the formula R = Pi/(Pi + Pk); and the full width at half height of the reflection (i) and of the reflection (k) is in each case at most 10. The catalytically active multimetal oxide material is of formula (I). Mo1VaM1bM2cM3dOn (I). M1 = element(s) from the group consisting of Te and Sb; M2 = element(s) from the group consisting of Nb, Ti, W, Ta and Ce; M3 = element(s) consisting of Pb, Ni, Co, Bi, Pd, Ag, Pt, Cu, Au, Ga, Zn, Sn, In, Re, Ir, Sm, Sc, Y, Pr, Nd or Tb; a = 0.01-1; b = 0-1; c = 0-1; d = 0-0.5; n = number that is determined by the valency and frequency of the elements other than oxygen in formula (I).

    Process for the separation of acrylic acid, useful for absorbent resins, comprises recovery of crude acrylic acid, treatment with an aldehyde trap, distillation and thin film evaporation
    67.
    发明专利
    Process for the separation of acrylic acid, useful for absorbent resins, comprises recovery of crude acrylic acid, treatment with an aldehyde trap, distillation and thin film evaporation 未知

    公开(公告)号：DE10138101A1

    公开(公告)日：2002-11-14

    申请号：DE10138101

    申请日：2001-08-03

    Applicant: BASF AG

    Inventor： FUCHS EBERHARD ,  MARTAN HANS ,  NESTLER GERHARD ,  MUELLER-ENGEL KLAUS JOACHIM

    IPC: C07C51/215 ,  C07C51/25 ,  C07C51/44 ,  C07C51/48 ,  C07C51/487 ,  C07C57/07

    Abstract: Process for the separation of acrylic acid from the reaction product of the catalytic gas phase oxidation of propane, propylene and/or acrolein comprises recovery of crude acrylic acid, treatment with an aldehyde trap, distillation and thin film evaporation of the residue. Process for the separation of acrylic acid from the reaction gases from the catalytic gas phase oxidation of propane, propylene and/or acrolein comprises: (a) recovery of crude acrylic acid in which either (a1) acrylic acid is absorbed in an absorbent liquid and crude acrylic acid isolated from the absorbent liquid or (a2) a crude acrylic acid fraction is separated from the reaction gases by fractional condensation with an optional purification step by crystallization; (b) the crude acrylic acid is treated with an aldehyde trap; (c) the treated crude acrylic acid is thermally treated in a distillation column to separate a first amount of an acrylic acid-containing vapor and a first residue such that the first residue comprises at least 8 wt.% of the crude acrylic acid; (d) the first residue is fed to a film evaporator and separated to form a second amount of an acrylic acid-containing vapor and a second residue; and (e) the first and second acrylic acid-containing vapors are combined and condensed to form pure acrylic acid and the second residue is discarded.

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