61.
    发明专利
    未知

    公开(公告)号:DE69822280D1

    公开(公告)日:2004-04-15

    申请号:DE69822280

    申请日:1998-12-18

    Abstract: Disclosed is a semiconductor memory employing a hierarchical bitline architecture which allows for a widened master bitline pitch as well as low bitline capacitance. In an exemplary embodiment, the memory (30) includes a plurality of memory cells (MC) arranged in rows and columns for storing data. Each column has at least one sense amplifier (SAi), at least one pair of master bitlines (MBLi, MBLi) operatively coupled to the sense amplifier, and at least two pairs of local bitlines (LBL1i, LBL1i, LBL2i, LBL2i), coupled to memory cells and selectively coupled to the sense amplifier. At least one of the local bitline pairs is selectively coupled to the sense amplifier via the master bitline pair. Each master bitline pair has a length shorter than a column length, and the master bitlines are arranged in an interleaved configuration. The pitch of at least a portion of at least some of the master bitlines is greater than the local bitline pitch. The master bitlines may be arranged in either folded or open configurations. The master bitline pitch may be about twice the local bitline pitch.

    64.
    发明专利
    未知

    公开(公告)号:DE10058047A1

    公开(公告)日:2002-06-13

    申请号:DE10058047

    申请日:2000-11-23

    Abstract: An integrated memory with a configuration of non-volatile memory cells based on ferromagnetic storage contains both powerful memory cells with a magnetoresistive effect with a transistor control and cost-effective memory cells with a magnetoresistive effect with memory elements connected between the word lines and bit lines. The memory elements connected directly between the bit line and the word line are preferably inserted in memory cell arrays that can be stacked one above the other above the memory cells with the transistor, and thereby achieve a high integration density. The fact that the memory, which contains both types and thereby satisfies all the system requirements, is fabricated in one module and in one process sequence considerably lowers the fabrication costs.

Patent Agency Ranking