公开(公告)号：US07643157B2

公开(公告)日：2010-01-05

申请号：US12005882

申请日：2007-12-28

Applicant: Hideo Takizawa ,  Koji Miyazaki ,  Haruhiko Kusunose

Inventor： Hideo Takizawa ,  Koji Miyazaki ,  Haruhiko Kusunose

IPC: G01B9/02

CPC classification number: G03F1/84 ,  G01J9/0215 ,  G01J2009/0234 ,  G01N21/45 ,  G03F1/32

Abstract: A phase shift amount measurement apparatus able to further correctly measure a phase shift amount of a phase shifter, wherein a laterally offset interference image of a phase shift mask is formed by a shearing interferometer, the interference image is captured by a two-dimensional imaging device, an output signal output from each light receiving element of the two-dimensional imaging device is supplied to a signal processing device, the phase shift amount is calculated for each light receiving element, the light receiving area of the light receiving element is very small, therefore the phase shift amount of any light receiving element outputting a peculiar phase amount due to incidence of diffraction light or multi-reflection light is excluded and the phase shift amount is determined based on the phase shift amount found from output signals of the remaining light receiving elements.

Abstract translation: 一种相移量测量装置，其能够进一步正确地测量移相器的相移量，其中通过剪切干涉仪形成相移掩模的横向偏移干涉图像，所述干涉图像由二维成像装置 从二维成像装置的每个光接收元件输出的输出信号被提供给信号处理装置，针对每个光接收元件计算相移量，光接收元件的光接收面积非常小， 因此排除由于衍射光或多反射光的入射而输出特殊相位量的任何光接收元件的相移量，并且基于从剩余的光接收的输出信号中发现的相移量来确定相移量 元素。

公开(公告)号：US07580433B2

公开(公告)日：2009-08-25

申请号：US11742800

申请日：2007-05-01

Applicant: Tomiji Tanaka ,  Kageyasu Sako ,  Ryo Kasegawa ,  Shinji Yamada ,  Katsuhiro Agatsuma

Inventor： Tomiji Tanaka ,  Kageyasu Sako ,  Ryo Kasegawa ,  Shinji Yamada ,  Katsuhiro Agatsuma

IPC: H01S3/04

CPC classification number: G01J9/00 ,  G01J9/0246 ,  G01J2009/0234 ,  H01S5/0014 ,  H01S5/0071 ,  H01S5/0612 ,  H01S5/0654 ,  H01S5/141 ,  H01S5/143

Abstract: A laser system includes a laser diode that oscillates in a multi-mode and has characteristics in which its oscillation wavelength varies with temperature, a grating that receives a light beam emitted from the laser diode and returns a diffracted beam to the laser diode, a mechanism that changes the wavelength of the diffracted beam returned to the laser diode, a wavelength detector that detects the wavelength of an output beam which is the same as that of the diffracted beam returned to the laser diode, a temperature regulator that maintains the laser diode at a predetermined temperature, and a control unit that controls the mechanism so that the output beam having a predetermined wavelength is output and controls the temperature regulator so that the laser diode oscillates at the predetermined wavelength.

Abstract translation: 激光系统包括以多模振荡并具有其振荡波长随温度变化的特性的激光二极管，接收从激光二极管发射的光束并将衍射光束返回到激光二极管的光栅，机构 其改变了返回到激光二极管的衍射光束的波长，检测与返回到激光二极管的衍射光束相同的输出光束的波长的波长检测器，将激光二极管保持在 以及控制单元，其控制机构，使得具有预定波长的输出光束被输出并控制温度调节器，使得激光二极管以预定波长振荡。

公开(公告)号：US20070206201A1

公开(公告)日：2007-09-06

申请号：US11680968

申请日：2007-03-01

Applicant: Peter de Groot ,  Leslie Deck

Inventor： Peter de Groot ,  Leslie Deck

IPC: G01B11/02

CPC classification number: G01B9/02011 ,  G01B9/02002 ,  G01B9/02004 ,  G01B9/02007 ,  G01B9/02012 ,  G01B9/02057 ,  G01B2290/45 ,  G01B2290/70 ,  G01J2009/0234 ,  G01J2009/0265

Abstract: An interferometer system is disclosed which is configured to combine measurement light with reference light to form an optical interference pattern, where the interferometer system includes a modulator configured to repetitively introduce a sequence of phase shifts between the measurement and reference light; and a camera system positioned to measure the optical interference pattern, where the camera system is configured to separately accumulate time-integrated images of the optical interference pattern corresponding to the different phase shifts in the sequence during the repetitions of the sequence.

Abstract translation: 公开了一种干涉仪系统，其被配置为将测量光与参考光结合以形成光学干涉图案，其中所述干涉仪系统包括被配置为在所述测量参考光和所述参考光之间重复地引入相移序列的调制器; 以及定位成测量光学干涉图案的相机系统，其中相机系统被配置为在序列的重复期间分别累积对应于序列中的不同相移的光学干涉图案的时间集成图像。

公开(公告)号：US20070177157A1

公开(公告)日：2007-08-02

申请号：US10590443

申请日：2005-03-04

Applicant: David McMurtry ,  James Henshaw ,  Michael Homer ,  Mark Chapman ,  Raymond Chaney ,  William Lee ,  Jason Slack

Inventor： David McMurtry ,  James Henshaw ,  Michael Homer ,  Mark Chapman ,  Raymond Chaney ,  William Lee ,  Jason Slack

IPC: G01B9/02

CPC classification number: G01B9/02081 ,  G01B9/02041 ,  G01B9/02084 ,  G01B2290/70 ,  G01J9/02 ,  G01J2009/0234 ,  G01J2009/0261

Abstract: Interferometry apparatus which comprises a measurement light beam (2a, 2b) and a reference light beam (2c, 2d) which interact with each other to cause a spatial fringe pattern (24). An optical device (12) is provided which interacts with the spatial fringe pattern (24), such that light is spatially separated into different directions (30, 32, 34, 36). The intensity modulation in two or more directions of the spatially separated light is phase shifted. The optical device may comprise, for example, a diffractive device, a refractive device or a diffractive optical element.

Abstract translation: 干涉测量装置，其包括彼此相互作用以产生空间条纹图案（24）的测量光束（2a，2b）和参考光束（2c，2d）。 提供了与空间条纹图案（24）相互作用的光学装置（12），使得光在空间上分离成不同的方向（30,32,34,36）。 在空间分离的光的两个或更多个方向上的强度调制是相移的。 光学装置可以包括例如衍射装置，折射装置或衍射光学元件。

公开(公告)号：US20070024854A1

公开(公告)日：2007-02-01

申请号：US11193999

申请日：2005-07-29

Applicant: Douglas Jungwirth

Inventor： Douglas Jungwirth

IPC: G01B9/02

CPC classification number: G01B9/02097 ,  G01B9/02051 ,  G01B2290/70 ,  G01J9/02 ,  G01J2009/0234

Abstract: A method and apparatus for correcting an input beam that uses an array of detectors sensing a scanning fringe pattern to generate phase error information which can be corrected by a physically adjacent beam correction device such as an array of micro-electrical-mechanical-system (MEMS) mirrors.

Abstract translation: 一种用于校正输入光束的方法和装置，其使用感测扫描条纹图案的检测器阵列来产生相位误差信息，所述相位误差信息可由物理上相邻的光束校正装置校正，例如微机电系统阵列（MEMS ）镜子。

公开(公告)号：US6122056A

公开(公告)日：2000-09-19

申请号：US56521

申请日：1998-04-07

Applicant: Michael Straight Hibbs ,  Song Peng

Inventor： Michael Straight Hibbs ,  Song Peng

IPC: H01L21/027 ,  G03F1/84 ,  G01B9/02

CPC classification number: G03F1/84 ,  G01N21/45 ,  G01J2009/0203 ,  G01J2009/0234

Abstract: A method of measuring the phase shift between two regions of a phase shift mask. A workpiece is provided including a first pair of slits each having a substantially similar phase shift characteristic and a second pair of slits each having a different phase shift characteristic. Electromagnetic radiation is directed through the first pair of slits and the second pair of slits on the workpiece. A relative shift is measured between interference patterns caused by the first pair of slits and the second pair of slits.

Abstract translation: 一种测量相移掩模的两个区域之间的相移的方法。 提供工件，其包括具有基本相似的相移特性的第一对狭缝和具有不同相移特性的第二对狭缝。 电磁辐射被引导通过工件上的第一对狭缝和第二对狭缝。 在由第一对狭缝和第二对狭缝引起的干涉图案之间测量相对移动。

公开(公告)号：US5170221A

公开(公告)日：1992-12-08

申请号：US713155

申请日：1991-06-11

Applicant: Keiji Matsui ,  Atsushi Ieki

Inventor： Keiji Matsui ,  Atsushi Ieki

IPC: G01J1/04 ,  G01J1/42 ,  G01J9/02

CPC classification number: G01J1/4228 ,  G01J1/04 ,  G01J1/0407 ,  G01J1/0448 ,  G01J1/4257 ,  G01J9/02 ,  G01J2009/0219 ,  G01J2009/0234

Abstract: A parallel light ray measuring apparatus invention measures the parallelism of a light beam by: receiving a light beam which has passed through two gratings having the same grating period by means of at least two photoelectric converting elements, and by detecting the light intensity obtained from those aforementioned photoelectric converting elements and the phase difference between the periodic signals obtained when either of the gratings is moved, using the at least photoelectric converting elements. Further, the parallel light ray measuring apparatus includes: a first grating; a second grating having the same grating period as that of the first grating, and being disposed such that the grating lines of the second grating are in parallel with those of the first grating; a light pick-up screen for receiving a light beam which has passed through both gratings, whereby the light intensity distribution appearing on the light pick-up screen is detected so as to measure the parallelism of the light beam.

Abstract translation: 平行光线测量装置通过以下方式测量光束的平行度：通过至少两个光电转换元件接收已经通过具有相同光栅周期的两个光栅的光束，并且通过检测从这些光束获得的光强度 上述光电转换元件和使用至少光电转换元件移动任何一个光栅时获得的周期信号之间的相位差。 此外，平行光线测量装置包括：第一光栅; 第二光栅具有与第一光栅相同的光栅周期，并且被布置成使得第二光栅的光栅线与第一光栅的光栅线平行; 用于接收已经通过两个光栅的光束的光拾取屏幕，由此检测在拾光屏幕上出现的光强度分布，以便测量光束的平行度。

公开(公告)号：US4558952A

公开(公告)日：1985-12-17

申请号：US467847

申请日：1983-02-18

Applicant: Vladimir P. Kulesh ,  Leonid M. Moskalik ,  Anatoly A. Orlov ,  Jury A. Bliznjuk ,  Stanislav K. Shtandel

Inventor： Vladimir P. Kulesh ,  Leonid M. Moskalik ,  Anatoly A. Orlov ,  Jury A. Bliznjuk ,  Stanislav K. Shtandel

IPC: G01B9/02 ,  G01J9/02 ,  G01J9/04 ,  G01N21/45 ,  G01B11/02

CPC classification number: G01B9/02057 ,  G01B9/02002 ,  G01B9/02012 ,  G01J9/04 ,  G01N21/45 ,  G01B2290/25 ,  G01B2290/45 ,  G01B2290/70 ,  G01J2009/0219 ,  G01J2009/0234 ,  G01J2009/0261

Abstract: A method for measuring an optical length of light path based on use of multiple-beam interference of light and carried into effect by forming an original light beam with two collinear components having mutually independent polarizations and different frequencies in such a manner that when forming each of the following interfering light beams from the preceding one, polarizations of the light components having different frequencies are mutually converted, whereupon the interfered light is converted into an electric signal and its phase is measured, by which the light path optical length is determined. A laser interferometer carrying said method into effect comprises: a laser and arranged consecutively along the direction of run of the light beam: a device for offsetting the frequency of one of the light components, reflecting elements, a polarizing element for separating the light of the interfering beams according to polarization, and a photoelectric converter of the interfered light into an electric signal, as well as a unit for measuring the phase of an electric signal, connected to the photoelectric converter and also a birefringent plate located between the reflecting elements and adapted for mutual conversion of polarizations of the two light components.

Abstract translation: 一种用于基于使用光的多光束干涉来测量光路的光学长度的方法，其通过用具有相互独立的极化和不同频率的两个共线分量形成原始光束来实现，使得当形成 来自前述的以下干涉光束被相互转换，因此被干扰的光被转换为电信号，并且测量其相位，由此确定光路光学长度。 携带所述方法的激光干涉仪实现包括：沿着光束的行进方向连续布置的激光器：用于抵消一个光分量，反射元件的频率的装置，用于分离光束的光的偏振元件 根据偏振的干涉光束和被干扰的光的光电转换器变成电信号，以及连接到光电转换器的电信号的相位测量单元，以及位于反射元件之间的双折射板， 用于两个光分量的偏振的相互转换。

公开(公告)号：KR1020170115010A

公开(公告)日：2017-10-16

申请号：KR1020170121858

申请日：2017-09-21

Applicant: 캐논 가부시끼가이샤

Inventor： 사토히로시

IPC: B29C59/02 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: G03F7/0002 ,  G01J2009/0234 ,  G03F9/7042 ,  G03F9/7049 ,  G03F9/7065

Abstract: 본발명은, 기판상의임프린트재료그리고몰드의패턴을서로접촉시킴으로써임프린트재료에패턴을형성하도록구성되는임프린트장치에있어서, 임프린트재료와몰드의패턴의일부를접촉시키고그 다음에몰드의패턴과임프린트재료사이의접촉표면적이증가되도록임프린트재료와패턴을접촉시키는구동유닛과; 몰드의패턴으로부터의반사광 그리고기판으로부터의반사광에의해발생되는간섭프린지를검출하는간섭프린지검출유닛과; 간섭프린지를기초로하여몰드의패턴과임프린트재료사이의접촉상태를검출하는상태검출유닛을포함하는임프린트장치를제공한다.

Abstract translation: 根据由压印材料和在彼此在基板上的模具的图案接触配置的压印装置本发明以在压印材料接触的图案和模制的，然后压印材料之间的压印材料的图案的部分和所述模具和图案 用于材料与所述压印图案接触的驱动单元，使得接触表面面积增大和; 反映从模具的图案光，并检测通过从衬底反射的光所产生的干涉条纹的干涉条纹检测部; 压印的基础上的干涉条纹提供了包含用于检测所述压印图案和模具的材料之间的接触状态的状态检测单元的装置。

公开(公告)号：KR101783081B1

公开(公告)日：2017-09-28

申请号：KR1020140120855

申请日：2014-09-12

Applicant: 캐논 가부시끼가이샤

Inventor： 사토히로시

IPC: B29C59/02 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: G03F7/0002 ,  G01J2009/0234 ,  G03F9/7042 ,  G03F9/7049 ,  G03F9/7065

Abstract: 본발명은, 기판상의임프린트재료그리고몰드의패턴을서로접촉시킴으로써임프린트재료에패턴을형성하도록구성되는임프린트장치에있어서, 임프린트재료와몰드의패턴의일부를접촉시키고그 다음에몰드의패턴과임프린트재료사이의접촉표면적이증가되도록임프린트재료와패턴을접촉시키는구동유닛과; 몰드의패턴으로부터의반사광 그리고기판으로부터의반사광에의해발생되는간섭프린지를검출하는간섭프린지검출유닛과; 간섭프린지를기초로하여몰드의패턴과임프린트재료사이의접촉상태를검출하는상태검출유닛을포함하는임프린트장치를제공한다.