Abstract:
A RF electrode for generating, plasma in a plasma chamber comprising an optical feedthrough. A plasma chamber comprising an RF electrode and a counter-electrode with a substrate support for holding a substrate, wherein a high-frequency alternating field for generating the plasma can be formed between the RF electrode and the counter-electrode. The chamber comprising an RF electrode with an optical feedthrough. A method, for in situ analysis or in situ processing of a layer or plasma in a plasma chamber, wherein the layer is disposed on counter-electrode and an RF electrode is disposed on the side lacing the layer. Selection of an RF electrode having an optical feedthrough, and at least one step in which electromagnetic radiation is supplied through the optical feedthrough for purposes of analysis or processing of the layer or the plasma, and by at least one other step in which the scattered or emitted or reflected radiation is supplied to an analysis unit.
Abstract:
Provided is a dielectric barrier discharge-type electrode structure for generating plasma. The electrode structure, according to the present invention, comprises: an upper conductive body electrode and a lower conductive body electrode; at least one conductive body electrode protrusion portion, which is formed on at least one surface of the upper conductive body electrode and/or the lower conductive body electrode; a dielectric layer which is formed on at least one of the inner surfaces of the upper conductive body electrode and the lower conductive body electrode that face each other, so as to have a substantially uniform thickness; and a specific gap (d) which is formed between the upper and lower conductive body electrodes and the dielectric layer, or between dielectric layers, due to the protruding effect of the conductive body electrode protrusion portion when the upper conductive body electrode and the lower conductive body electrodes come into close contact, wherein the plasma is generated by applying a pulse power or an alternating power to the upper conductive body electrode and the lower conductive body electrode.
Abstract:
The present invention provides a light-transmitting metal electrode including a substrate and a metal electrode layer having plural openings. The metal electrode layer also has such a continuous metal part that any pair of point-positions in the part is continuously connected without breaks. The openings in the metal electrode layer are periodically arranged to form plural microdomains. The plural microdomains are so placed that the in-plane arranging directions thereof are oriented independently of each other. The thickness of the metal electrode layer is in the range of 10 to 200 nm.
Abstract:
Disclosed is a transparent carbon nanotube (CNT) electrode using a conductive dispersant. The transparent CNT electrode comprises a transparent substrate and a CNT thin film formed on a surface the transparent substrate wherein the CNT thin film is formed of a CNT composition comprising CNTs and a doped dispersant. Further disclosed is a method for producing the transparent CNT electrode.The transparent CNT electrode exhibits excellent conductive properties, can be produced in an economical and simple manner by a room temperature wet process, and can be applied to flexible displays. The transparent CNT electrode can be used to fabricate a variety of devices, including image sensors, solar cells, liquid crystal displays, organic electroluminescence (EL) displays and touch screen panels, that are required to have both light transmission properties and conductive properties.
Abstract:
Electrode assemblies for plasma reactors include a structure or device for constraining an arc endpoint to a selected area or region on an electrode. In some embodiments, the structure or device may comprise one or more insulating members covering a portion of an electrode. In additional embodiments, the structure or device may provide a magnetic field configured to control a location of an arc endpoint on the electrode. Plasma generating modules, apparatus, and systems include such electrode assemblies. Methods for generating a plasma include covering at least a portion of a surface of an electrode with an electrically insulating member to constrain a location of an arc endpoint on the electrode. Additional methods for generating a plasma include generating a magnetic field to constrain a location of an arc endpoint on an electrode.
Abstract:
A ceramic member containing an insulating member is disclosed. The ceramic member comprises a ceramic body and an insulating layer on the ceramic body. The ceramic body contains aluminum oxide crystals and aluminum titanate crystals. The insulating layer contains silicon oxide as a main component. The ceramic body includes a first region that includes a first surface portion covered by the insulating layer, and a second region outside the first region, and having a surface resistivity of 1×106 to 1×109Ω/□. A surface resistivity of the first region is higher than the surface resistivity of the second region.
Abstract:
Electrode assemblies for plasma reactors include a structure or device for constraining an arc endpoint to a selected area or region on an electrode. In some embodiments, the structure or device may comprise one or more insulating members covering a portion of an electrode. In additional embodiments, the structure or device may provide a magnetic field configured to control a location of an arc endpoint on the electrode. Plasma generating modules, apparatus, and systems include such electrode assemblies. Methods for generating a plasma include covering at least a portion of a surface of an electrode with an electrically insulating member to constrain a location of an arc endpoint on the electrode. Additional methods for generating a plasma include generating a magnetic field to constrain a location of an arc endpoint on an electrode.
Abstract:
An electrode structure is provided. The electrode structure contains a first auxiliary electrode and a second auxiliary electrode, a first edge electrode and a second edge electrode disposed between the first auxiliary electrode and the second auxiliary electrode, wherein the first edge electrode forming an electrode pair with the first auxiliary electrode and having a same polarity as that of the first auxiliary electrode and the second edge electrode forming an electrode pair with the second auxiliary electrode and having a same polarity as that of the second auxiliary electrode, and at least one middle electrode disposed between the first edge electrode and the second edge electrode. The electrode structure respectively enhance an interaction between the first edge electrode and the second edge electrode and a neighboring electrode by means of the first auxiliary electrode and the second auxiliary electrode. Alternatively, the width of the edge electrode increase to be 1.5 to 4 times of its original value in order to increase the current density on the edge electrode and to increase the brightness of the edge discharging zone so that the brightness difference between the middle zone and the edge zone is not great.
Abstract:
A porous electroconductive material having light transmitting property which comprises a porous glass and, formed on the outer surface thereof and also on the surface inside fine pores thereof, an electroconductive oxide film; and a method for preparing the porous electroconductive material which comprises using the chemical vapor transporting method, the sputtering method, the impregnation method, a method wherein a silanol group present on the surface of the porous glass is reacted with an organic metal compound and the product is oxidized by heating in air, or a method wherein a mixture of a polymer compound or an amine group-containing organic metal compound with a raw material for a film is applied to a substrate and then the polymer compound or the organic component is burned and removed.
Abstract:
An electrode in a plasma display panel and a fabrication process thereof that is capable of reducing a line width of the electrode without increasing a resistance component of the electrode. In the method, a bus electrode is provided by laminating a metal film on a certain substrate and then patterning it. A transparent electrode is provided on the substrate in a shape of surrounding the bus electrode. Accordingly, the electrode is provided by the metal film such that a limit for a selection in a width or thickness of the electrode, so that a line width of the electrode can be reduced to improve the visible light transmissivity and the electrode is formed into a large thickness instead of making a minute electrode width to lower the resistance component, thereby reducing a power consumption of the PDP.