公开(公告)号：EP3500110B1

公开(公告)日：2024-10-02

申请号：EP17761195.1

申请日：2017-08-17

IPC: A23L3/26 ,  A01C1/08 ,  A61L2/08 ,  B65B55/08 ,  G21K5/08 ,  H01J33/00 ,  B07B13/11 ,  B07C5/00 ,  B65B55/16 ,  B65B37/04 ,  B07C5/04 ,  B07C5/342

CPC classification number: A23L3/001 ,  A23L3/26 ,  A01C1/08 ,  A61L2/087 ,  B07B13/113 ,  B07C5/04 ,  B07C5/342 ,  B07C5/3425 ,  H01J33/00 ,  B65B37/04 ,  B65B55/16 ,  G21K5/08 ,  A23B9/06

公开(公告)号：EP2534666A1

公开(公告)日：2012-12-19

申请号：EP11740108.3

申请日：2011-02-01

Applicant: Tetra Laval Holdings & Finance S.A.

Inventor： LINNÉ, Ulrika ,  ÅBERG, Andreas ,  HOSTETTLER, Urs

IPC: H01J33/04 ,  G21K5/04 ,  H01J5/18

CPC classification number: H01J33/04 ,  B65B55/08 ,  G21K5/02 ,  H01J3/027 ,  H01J5/18 ,  H01J33/00 ,  H01J33/02 ,  H01J2237/00 ,  H01J2237/164 ,  Y10T29/49002

Abstract: The present invention refers to an assembly of a support plate (22) and an exit window foil (20) for use in an electron beam device, said support plate (22) being designed to reduce wrinkles in said foil (20), which wrinkles may arise due to surplus foil arising in the assembly process. The foil (20) is being bonded to the support plate (22) along a closed bonding line (26) bounding a substantially circular area in which the support plate (22) is provided with apertures and foil support portions and in which area the foil is adapted to serve as a portion of a wall of a vacuum tight housing of the electron beam device. The invention also refers to a method for using the assembly in a filling machine, as well as a method of reducing wrinkles.

公开(公告)号：EP1982921B1

公开(公告)日：2012-08-08

申请号：EP08154775.4

申请日：2008-04-18

Applicant: Krones AG

Inventor： Humele, Heinz ,  Krüger, Jochen ,  Menz, Hans-Jürgen ,  Föll, Eberhard

IPC: B65B55/08 ,  B67C7/00 ,  H01J33/02 ,  A61L2/08

CPC classification number: B65B55/08 ,  A61L2/087 ,  A61L2202/23 ,  H01J33/00

公开(公告)号：EP2332148A1

公开(公告)日：2011-06-15

申请号：EP09778729.5

申请日：2009-09-25

Applicant: Tetra Laval Holdings & Finance SA

Inventor： HOLM, Kurt

IPC: G21K5/04 ,  B65B55/08 ,  H01J3/08

CPC classification number: G21K5/04 ,  A61L2/087 ,  A61L2/24 ,  A61L2202/181 ,  H01J3/027 ,  H01J3/08 ,  H01J33/00

Abstract: An electron beam sterilizing device, comprises: an electron- generating filament; a beam-shaper; an output window; a high-voltage supply, capable of creating a high-voltage potential between the electron-generating filament and the output window, for acceleration of electrons; a high-voltage supply for driving current through the electron-generating filament; a control unit for controlling the operation of the electron beam sterilizing device. The device is characterized in that the electron beam sterilizing device has at least three operational states: - an OFF-state, where there is no drive current through the electron-generating filament, - an ON-state, where the electron-generating filament is kept at a temperature above the emission temperature so as to generate electrons for sterilization, and - a standby state, between the OFF-state and ON-state, where the electron- generating filament is kept at a predetermined temperature just below the emission temperature, wherein the control unit is able to control the device to assume the standby state.

公开(公告)号：EP2293820A1

公开(公告)日：2011-03-16

申请号：EP09753769.0

申请日：2009-05-05

Applicant: Krones AG

Inventor： Föll, Eberhard ,  Krüger, Jochen

IPC: A61L2/08 ,  B65B55/08 ,  B67C7/00 ,  H01J33/00

CPC classification number: H01J33/00 ,  A61L2/087 ,  A61L2202/23 ,  B65B55/08 ,  H01J33/04

Abstract: A device (1) for sterilizing containers (10) comprising a treatment head (5) having an outlet window (8) for the passing of charge carriers therethrough, a charge carrier generation source for generating charge carriers and a acceleration device (6) disposed above the outlet window, said acceleration device accelerating the charge carriers in the direction of the outlet window (8) and comprising a cooling device (30) for cooling the outlet window. According to the invention, the cooling device (30) comprises a feed opening (32) for a gaseous medium, said feed opening being disposed beneath the outlet window (8) and directing the gaseous medium at least partially from below to the outlet window (8).

公开(公告)号：EP2248144A1

公开(公告)日：2010-11-10

申请号：EP09713707.9

申请日：2009-01-23

Applicant: Siemens Aktiengesellschaft

Inventor： TANKE, Eugene

IPC: H01J27/18

CPC classification number: H01J27/18 ,  A61N2005/1087 ,  H01J33/00

Abstract: The invention relates to a particle therapy installation having an ECR ion source (31) for production of charged ions, which are accelerated in an accelerator unit (33, 37), which follows the ECR ion source (31), to an energy which is required for bombardment, wherein the magnetic fields of the ECR ion source (31) are matched to operation of the ECR ion source (31) for lightweight ions, such that the ECR ion source (31) can be operated in the afterglow mode, in which, after a microwave resonance pulse (43) has been switched off, an afterglow beam pulse (39) emerges from the ECR ion source (31), the current level of which is higher than a current (47) which emerges from the ECR ion source (31) during use of the microwave resonance pulse (43).

Abstract translation: 本发明涉及一种具有用于产生带电离子的ECR离子源（31）的粒子治疗装置，所述带电离子在ECR离子源（31）之后的加速器单元（33,37）中被加速至能量 其中ECR离子源（31）的磁场与ECR离子源（31）对于轻质离子的操作相匹配，使得ECR离子源（31）能够以余辉模式操作， 其在微波谐振脉冲（43）已经关闭之后从ECR离子源（31）出现余辉光束脉冲（39），其电流水平高于从ECR出现的电流（47） 离子源（31）在微波谐振脉冲（43）的使用期间。

公开(公告)号：EP1508152A4

公开(公告)日：2008-05-14

申请号：EP03729120

申请日：2003-05-23

Applicant: ENERGY SCIENCES INC

Inventor： RANGWALLA IMTIAZ ,  CLOUGH HARVEY ,  HANNAFIN GEORGE

IPC: G21K5/04 ,  B05D3/06 ,  B41M7/00 ,  C08F2/52 ,  G21K5/00 ,  G21K5/10 ,  H01J33/00 ,  H01J33/04 ,  H01J37/06

CPC classification number: B05D3/068 ,  B41M7/0045 ,  B41M7/0081 ,  G21K5/10 ,  H01J33/00 ,  H01J33/04

Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency, and also directed to an application of such apparatus to treat a coating on a substrate of a treatable material, such as for flexible packaging. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, electrons are generated and accelerated to pass through the foil support assembly. In the flexible packaging application, the substrate is fed to the processing apparatus operating at a low voltage, such as 110 kVolts or below, and is exposed to the accelerated electrons to treat the coating on the substrate.

公开(公告)号：EP1416514B1

公开(公告)日：2006-11-22

申请号：EP03090369.4

申请日：2003-10-28

Applicant: GAMMA-Service Produktbestrahlung GmbH

Inventor： Hübner, Gerhard, Dr. habil. ,  Zeising, Manfred, Dipl.-Ing.

IPC: H01J37/317 ,  H01J37/00 ,  H01J31/00 ,  B29C35/00

CPC classification number: B29C35/08 ,  B29C35/10 ,  B29C2035/0844 ,  B29C2035/0877 ,  H01J33/00

公开(公告)号：EP1676290A1

公开(公告)日：2006-07-05

申请号：EP04805233.6

申请日：2004-10-19

Applicant: La Calhene ,  Physique & Industrie

Inventor： ROCHE, Michel ,  FONTCUBERTA, Philippe

IPC: H01J33/00 ,  H01J33/04 ,  G21K5/00

CPC classification number: A61L2/087 ,  A61L2202/23 ,  G21K5/04 ,  H01J33/00

Abstract: The invention relates to an electron gun with a focusing anode, forming a window for said gun and the application thereof to irradiation and sterilization. Said gun comprises a vacuum chamber (2) which contains a cathode (6), having an electron-emitter face (8) and an electron-transparent anode (4), formed in one of the chamber walls. The anode is curved in order to resist the pressure difference between the inside and outside of the chamber. The emitter face is also curved and cooperates with the anode to focus the electrons outside of the chamber.

公开(公告)号：EP1402553A2

公开(公告)日：2004-03-31

申请号：EP02719199.8

申请日：2002-03-12

Applicant: Advanced Electron Beams, Inc.

Inventor： AVNERY, Tzvi

IPC: H01J1/00

CPC classification number: H01J9/04 ,  H01J1/16 ,  H01J33/00 ,  Y10T29/49002 ,  Y10T29/49117

Abstract: A filament for generating electrons for an electron beam emitter where the filament has a cross section and a length. The cross section of the filament is varied along the length for producing a desired electron generation profile.