公开(公告)号：WO2007053721A2

公开(公告)日：2007-05-10

申请号：PCT/US2006042742

申请日：2006-10-31

Applicant: IMAGO SCIENT INSTR CORP ,  BUNTON JOSEPH HALE

Inventor： BUNTON JOSEPH HALE

IPC: G01N23/00

CPC classification number: H01J37/285 ,  B82Y15/00 ,  H01J2237/2852 ,  H01J2237/2855

Abstract: The present invention relates to atom probe pulse energy. One aspect of the invention is directed toward a method that includes establishing a data relationship between pulse energy and bias energy for a target evaporation rate. In selected embodiments, establishing a data relationship can include determining an equivalent pulse fraction for a selected pulse energy and bias energy combination based on a local change in bias energy compared to a local change in pulse energy associated with the selected pulse energy and bias energy combination. Another aspect of the invention is directed toward a method that includes determining an equivalent pulse fraction for a first bias energy and pulse energy combination and/or a second bias energy and pulse energy combination based on the difference between the first bias energy and the second bias energy compared to the difference between the first pulse energy and the second pulse energy.

Abstract translation: 本发明涉及原子探针脉冲能量。 本发明的一个方面涉及一种方法，其包括针对目标蒸发速率建立脉冲能量和偏压能量之间的数据关系。 在选择的实施例中，建立数据关系可以包括基于与所选择的脉冲能量和偏置能量组合相关联的脉冲能量的局部变化，基于偏置能量的局部变化来确定所选择的脉冲能量和偏置能量组合的等效脉冲分数 。 本发明的另一方面涉及一种方法，其包括基于第一偏置能量和第二偏压之间的差异来确定第一偏置能量和脉冲能量组合的等效脉冲分数和/或第二偏置能量和脉冲能量组合 与第一脉冲能量和第二脉冲能量之间的差相比。

公开(公告)号：WO2005003731A3

公开(公告)日：2006-01-12

申请号：PCT/US2004021291

申请日：2004-07-01

Applicant: CHISM WILLIAM W II

Inventor： CHISM WILLIAM W II

IPC: G01Q70/00 ,  H01J37/285 ,  H01J49/00 ,  B01D59/44

CPC classification number: H01J49/161 ,  H01J37/285 ,  H01J49/0004 ,  H01J2237/2852 ,  H01J2237/2855

Abstract: A pulsed laser atom probe having a pulsed UV laser source (10) which focuses light onto a semiconductor tip (28) causing photoionization of atoms on said tip where the ions produced are detected at a position sensitive detector or time of flight detection means (26).

Abstract translation: 一种脉冲激光原子探针，其具有脉冲的UV激光源（10），其将光聚焦到半导体尖端（28）上，导致在位置敏感检测器或飞行时间检测装置（26）处检测所产生的离子的所述尖端上的原子的光离子化 ）。

公开(公告)号：WO2005104307A3

公开(公告)日：2005-12-29

申请号：PCT/US2004027062

申请日：2004-08-19

Applicant: IMAGO SCIENT INSTR CORP ,  BUNTON JOSEPH H ,  KELLY THOMAS F ,  GRIBB TYE T

Inventor： BUNTON JOSEPH H ,  KELLY THOMAS F ,  GRIBB TYE T

IPC: H01J37/285 ,  H01J49/40 ,  H01S1/00

CPC classification number: H01J37/285 ,  B82Y35/00 ,  H01J49/0004 ,  H01J49/067 ,  H01J49/164 ,  H01J2237/2855

Abstract: A laser atom probe (100) situates a counter electrode between a specimen mount and a detector (106), and provides a laser (116) having its beam (122) aligned to illuminate the specimen (104) through the aperture (110) of the counter electrode (108). The detector, specimen mount (102), and then be pulsed to bring the specimen to ionization. The timing of the laser pulses may be used to determine ion departure and arrival times allowing determination of the mass-to-charge ratios of the ions, thus their identities. Automated alignment methods are described wherein the laser is automatically directed to areas of interest.

Abstract translation: 激光原子探针（100）将对电极置于样品座和检测器（106）之间，并且提供激光（116），其具有对准的光束（122），以通过孔（110）的孔（110）照射样品 对电极（108）。 检测器，样品架（102），然后被脉冲以使样本电离。 激光脉冲的定时可用于确定离子离开和到达时间，从而确定离子的质荷比，因此确定它们的身份。 描述了自动对准方法，其中激光被自动导向到感兴趣的区域。

公开(公告)号：WO2004111604A3

公开(公告)日：2005-08-18

申请号：PCT/US2004016590

申请日：2004-05-26

Applicant: IMAGO SCIENT INSTR ,  GRIBB TYE TRAVIS

Inventor： GRIBB TYE TRAVIS

IPC: G01N20060101 ,  G01N25/00 ,  H01J37/285

CPC classification number: H01J37/285 ,  B82Y15/00 ,  H01J37/05 ,  H01J37/10 ,  H01J2237/024 ,  H01J2237/0492 ,  H01J2237/053 ,  H01J2237/244

Abstract: A three dimensional atom probe comprising a sharp specimen (10) coupled to a mounting means (12) where emission of charged particles is caused by application of a potential to the specimen tip (10) such that charged particles are influenced by filtering electrodes (206, 204) before impingement on a detection screen (202).

Abstract translation: 一种三维原子探针，其包括耦合到安装装置（12）的尖锐的样本（10），其中通过向所述样本末端（10）施加电位而引起带电粒子的发射，使得带电粒子受到过滤电极（206 ，204），然后冲击到检测屏（202）上。

公开(公告)号：WO2004066331A2

公开(公告)日：2004-08-05

申请号：PCT/EP2004/000370

申请日：2004-01-19

Applicant: ICT, INTEGRATED CIRCUIT TESTING GESELLSCHAFT FÜR HALBLEITERPRÜFTECHNIK MBH ,  ADAMEC, Pavel ,  DEGENHARDT, Ralf ,  FEUERBAUM, Hans-Peter ,  MUNACK, Harry ,  WINKLER, Dieter

Inventor： ADAMEC, Pavel ,  DEGENHARDT, Ralf ,  FEUERBAUM, Hans-Peter ,  MUNACK, Harry ,  WINKLER, Dieter

IPC: H01J

CPC classification number: H01J37/285 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0435 ,  H01J2237/049 ,  H01J2237/2855 ,  H01J2237/2857

Abstract: A charged particle beam apparatus is provided which comprises a charged particle source (1) for producing a primary beam of charged particles, aperture means (2) for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam to a width appropriate for serial imaging of a sample (8) as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample (8), a condenser lens (3) for condensing said primary beam of charged particles, scanning means (5) for deflecting said primary beam of charged particles, an objective lens (6) for focusing said condensed primary beam, a sectorized detector (7) for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.

Abstract translation: 提供带电粒子束装置，其包括用于产生带电粒子的一次束的带电粒子源（1），用于准直所述带电粒子的一次束的孔口装置（2），其中所述孔口装置适于在准直 的所述主光束适合于样品（8）的串行成像的宽度以及所述主光束的准直到适合于所述样品（8）的平行成像的宽度;聚光透镜（3），用于冷凝所述主光束 带电粒子束，用于偏转所述带电粒子的一次束的扫描装置（5），用于聚焦所述冷凝的主光束的物镜（6），用于检测次级带电粒子的扇形检测器（7）。 此外，描述了束装置的几种不同的操作模式，允许串行成像以及平行成像。

公开(公告)号：WO2002093615A1

公开(公告)日：2002-11-21

申请号：PCT/JP2002/002802

申请日：2002-03-22

Applicant: 学校法人金沢工業大学 ,  西川 治

Inventor： 西川 治

IPC: H01J37/285

CPC classification number: G01Q30/02 ,  H01J37/256 ,  H01J37/285 ,  H01J49/06 ,  H01J49/40 ,  H01J2237/2443 ,  H01J2237/2446 ,  H01J2237/2818 ,  Y10S977/852

Abstract: In a scan atom probe (100), firstly, a surface shape analysis block (20) analyzes a surface shape of a sample (3). Next, an extraction electrode (5) is positioned on a desired analysis region of the sample surface. When analyzing an electron state in the analysis region, minus bias voltage is applied from a DC high voltage power source (2) to the sample (3) and field−emitted electrons are detected by a screen (9). When analyzing an atom arrangement and composition in the analysis region, the sample (3) is subjected to positive voltage from the DC high voltage power source (2) and a pulse generator (1) and cations generated by field evaporation are detected by a position detection type ion detector (11) or a reflectron type mass analyzer (13).

Abstract translation: 在扫描原子探针（100）中，首先，表面形状分析块（20）分析样品（3）的表面形状。 接下来，将引出电极（5）定位在样品表面的期望分析区域上。 当分析分析区域中的电子状态时，从DC高压电源（2）向样品（3）施加负偏压，并且通过屏幕（9）检测场发射的电子。 当分析分析区域中的原子排列和组成时，样品（3）经受直流高压电源（2）和脉冲发生器（1）的正电压，并且通过场蒸发产生的阳离子被位置 检测型离子检测器（11）或反射型质量分析器（13）。

公开(公告)号：WO0161725B1

公开(公告)日：2001-11-22

申请号：PCT/PL0100010

申请日：2001-02-05

Applicant: GRZELAKOWSKI KRZYSZTOF

Inventor： GRZELAKOWSKI KRZYSZTOF

IPC: G01Q30/02 ,  H01J37/285

CPC classification number: H01J37/285

Abstract: The invention relates to an emission electron microscope, comprising an objective lens, an imaging system with at least one lens and a stigmator. The invention is characterised in that said microscope comprises a second, independent imaging system (K2), parallel to the first imaging system (K1) and two electron detector devices (25) and (27), by means of which two independent images are recorded: a real image and an image of the angle distribution of the electrons as a result of electronically switching the potentials of the deflector elements (13) and (17). Both identical deflector elements comprise pairs of spherical and concentric electrodes and are electron-optically separated from each other (13a), (13b) and (17a), (17b) by double the focal length thereof and turn the electron beam through an angle corresponding to ( beta ) and (- beta ), which leads to a parallel shift of the electron beam. The electrode (13b) contains a passage (13c), which allows the electron drift along the electron-optical main axis (29a), whilst the deflection is switched off. Said emission electron microscope also comprises an electron source (8), arranged close to the electron-optical axis (29) of the objective lens, which emits primary electrons along the electron-optical axis (28) at an angle ( alpha ) to the electron-optical axis (29) of the objective lens, a contrast diaphragm system (4a) in a plane correlated to the focal plane of the objective and an image diaphragm system (11), in one of the image planes of the system.

Abstract translation: 发射电子显微镜，它由一个物镜，一个带有至少一个透镜和一个柱镜的成像系统组成。 它的特征在于，它具有第二，独立的和至第一成像系统K1平行，成像系统K2和两个电子检测装置（25）和（27）与所述两个独立的图像被检测到：一个真实图像和图像 由于偏转元件（13）和（17）的电位的电子切换，电子的角度分布。 由对球形和同心电极（13A），（13B）和（17A）的所述的两个相同的偏转元件，（17B）由间隔开的电子光学拆下来的双焦距和根据本发明的角度（测试版）和引导所述电子束（ - β），这导致电子束的平行位移。 电极（13b）包括允许在关断偏转期间电子沿着主电子光轴（29a）漂移的孔（13c）。 发射电子显微镜也有一个紧密邻近所述物镜安装电子源（8），沿电子光学轴线（28）下角（阿尔法）的物镜的电子光学轴线（29）的一次电子被发射，对比度隔膜系统的电子光学轴线（29）（图4a ）在与物镜的焦平面相关的一个平面中以及在系统的一个图像平面中的屏幕系统（11）。

公开(公告)号：WO9923684A9

公开(公告)日：1999-08-12

申请号：PCT/US9822706

申请日：1998-10-26

Applicant: KLA TENCOR CORP

Inventor： ADLER DAVID A ,  WALKER DAVID J ,  BABIAN FRED ,  WOLFE TRAVIS

IPC: G01N23/225 ,  G01Q30/02 ,  H01J37/244 ,  H01J37/28 ,  H01J37/285 ,  H01L21/66 ,  H01J37/26

CPC classification number: H01J37/285

Abstract: An apparatus and method for inspecting a surface of a sample (S), particularly but not limited to a semiconductor device, using an electron beam presented. The technique is called Secondary Electron Emission Microscopy (SEEM), and has significant advantages over both Scanning Electron Microscopy (SEM) and Low Energy Electron Microscopy (LEEM) techniques. In particular, the SEEM technique utilizes a beam of relatively high-energy primary electrons (11) having a beam width approximate for parallel, multi-pixel imaging. The electron energy is near a charge-stable condition to achieve faster imaging than was previously attainable with SEM, and charge neutrality unattainable with LEEM.

Abstract translation: 一种用于检查样本（S）的表面的装置和方法，特别是但不限于半导体装置，使用呈现的电子束。 该技术被称为次级电子发射显微镜（SEEM），并且与扫描电子显微镜（SEM）和低能量电子显微镜（LEEM）技术相比具有显着的优点。 具体而言，SEEM技术利用具有近似于平行多像素成像的光束宽度的相对高能的一次电子束（11）。 电子能量接近电荷稳定状态以实现比之前用SEM可获得的成像更快的成像，并且LEEM无法实现电荷中性。

公开(公告)号：WO1987000682A1

公开(公告)日：1987-01-29

申请号：PCT/GB1986000437

申请日：1986-07-22

Applicant: SMITH, George, David, William ,  CEREZO, Alfred

IPC: H01J37/285

CPC classification number: H01J49/0004 ,  H01J37/285 ,  H01J49/025 ,  H01J49/40

Abstract: An atom probe with an ion detector (7) capable of giving direct electrical indication of the position of incidence of ions field-evaporated from a specimen (1). Position information is obtained serially for successive ions and correlatd with time of flight signals related to the same ions. In this way data is made available for subsequent computer-assisted three-dimensional reconstruction of the atomic-scale chemistry of the specimen.

Abstract translation: 具有离子检测器（7）的原子探针，其能够对从样品（1）中蒸发的离子的入射位置进行直接电指示。 连续离子获得位置信息，并与与相同离子相关的飞行时间信号相关。 以这种方式，数据可用于随后的计算机辅助三维重建样品的原子尺度化学。

公开(公告)号：WO2018226770A1

公开(公告)日：2018-12-13

申请号：PCT/US2018/036168

申请日：2018-06-06

Applicant: KLA-TENCOR CORPORATION

Inventor： NASSER-GHODSI, Mehran ,  PLETTNER, Tomas ,  SEARS, Christopher ,  HAYNES, Robert ,  GERLING, John ,  WELK, Aron ,  FUKS, Felipe

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/02

CPC classification number: H01J37/1474 ,  H01J37/065 ,  H01J37/14 ,  H01J37/143 ,  H01J37/147 ,  H01J37/1471 ,  H01J37/18 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/024 ,  H01J2237/032

Abstract: A multi-column scanning electron microscopy (SEM) system is disclosed. The SEM system includes a source assembly. The source assembly includes two or more electron beam sources configured to generate a plurality of electron beams. The source assembly also includes two or more sets of positioners configured to actuate the two or more electron beam sources. The SEM system also includes a column assembly. The column assembly includes a plurality of substrate arrays. The column assembly also includes two or more electron-optical columns formed by a set of column electron-optical elements bonded to the plurality of substrate arrays. The SEM system also includes a stage configured to secure a sample that at least one of emits or scatters electrons in response to the plurality of electron beams directed by the two or more electron-optical columns to the sample.