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    61.
    发明专利
    未知

    公开(公告)号：DE2829080A1

    公开(公告)日：1979-04-12

    申请号：DE2829080

    申请日：1978-07-01

    Applicant: CONTROL DATA CORP

    Inventor： HARTE KENNETH J

    IPC: H01J3/38 ,  G09G1/04 ,  G11C11/30 ,  H01J27/00 ,  H01J29/46 ,  H01J29/56 ,  H01J29/70 ,  H01J31/08 ,  H01J31/60 ,  H01J29/74 ,  H01J3/30

    Abstract: An electron beam tube electrostatic deflection system and method of operation is described. The electron beam tube includes an eight-fold deflector and means are provided for applying two different quadrupole correction electric potentials to selected ones of the eight-fold deflector members and for applying an octupole correction electrical potential to all eight deflector members. In the preferred embodiment, the quadrupole and octupole correction potentials applied to one set of four deflector members are represented by the respective values (V2c - V), (-V2c - V), (V2c - V) and (-V2c - V), and the quadrupole and octupole correction potentials applied to the second set of four deflector members are represented respectively by the values (V2s + V), (-V2s + V), (V2s + V) and (-V2s + V) where the quadrupole correction electric potential V2c = [A2c(Vx2 - Vy2)]/Vc, (1) THE QUADRUPOLE CORRECTION ELECTRIC POTENTIAL V2s = (2A2s VxVy)/Vc, (2) AND THE OCTUPOLE CORRECTION POTENTIAL V applied to all eight of the eight-fold deflector members is given by the expression V = [A4(Vx4 - 6Vx2Vy2 + Vy4)]/4Vc3 (3) WHERE A2c, A2s and A4 are constants, Vx and Vy are the x and y deflection electric potentials, and -Vc is the cathode voltage of the electron gun used in the electron beam tube apparatus. In preferred arrangements, the electrostatic deflection system further includes means for applying a dynamic focusing electric potential to the objective lens assembly of the electron beam tube apparatus in conjunction with both the correction and deflection electric potentials described above. The dynamic focusing electric potential is VOBJ(DF) = VOBJ(0) + [(ADF(Vx2 + Vy2))/Vc](4) WHERE ADF is a constant and VOBJ(O) is the uncorrected value of the direct current objective lens supply voltage. Both deflection and correction electric potentials are developed by an eight-fold deflector voltage generator which includes as its heart a novel octupole-quadrupole generator.

    CHARGED PARTICLE BEAM TUBE ELECTROSTATIC DEFLECTION APPARATUS
    62.
    发明专利
    CHARGED PARTICLE BEAM TUBE ELECTROSTATIC DEFLECTION APPARATUS 未知

    公开(公告)号：GB2000903A

    公开(公告)日：1979-01-17

    申请号：GB7827691

    申请日：1978-06-23

    Applicant: CONTROL DATA CORP

    IPC: H01J3/38 ,  G09G1/04 ,  G11C11/30 ,  H01J27/00 ,  H01J29/46 ,  H01J29/56 ,  H01J29/70 ,  H01J31/08 ,  H01J31/60 ,  H01J29/74

    Abstract: An electron beam tube electrostatic deflection system and method of operation is described. The electron beam tube includes an eight-fold deflector and means are provided for applying two different quadrupole correction electric potentials to selected ones of the eight-fold deflector members and for applying an octupole correction electrical potential to all eight deflector members. In the preferred embodiment, the quadrupole and octupole correction potentials applied to one set of four deflector members are represented by the respective values (V2c - V), (-V2c - V), (V2c - V) and (-V2c - V), and the quadrupole and octupole correction potentials applied to the second set of four deflector members are represented respectively by the values (V2s + V), (-V2s + V), (V2s + V) and (-V2s + V) where the quadrupole correction electric potential V2c = [A2c(Vx2 - Vy2)]/Vc, (1) THE QUADRUPOLE CORRECTION ELECTRIC POTENTIAL V2s = (2A2s VxVy)/Vc, (2) AND THE OCTUPOLE CORRECTION POTENTIAL V applied to all eight of the eight-fold deflector members is given by the expression V = [A4(Vx4 - 6Vx2Vy2 + Vy4)]/4Vc3 (3) WHERE A2c, A2s and A4 are constants, Vx and Vy are the x and y deflection electric potentials, and -Vc is the cathode voltage of the electron gun used in the electron beam tube apparatus. In preferred arrangements, the electrostatic deflection system further includes means for applying a dynamic focusing electric potential to the objective lens assembly of the electron beam tube apparatus in conjunction with both the correction and deflection electric potentials described above. The dynamic focusing electric potential is VOBJ(DF) = VOBJ(0) + [(ADF(Vx2 + Vy2))/Vc](4) WHERE ADF is a constant and VOBJ(O) is the uncorrected value of the direct current objective lens supply voltage. Both deflection and correction electric potentials are developed by an eight-fold deflector voltage generator which includes as its heart a novel octupole-quadrupole generator.

    64.
    发明专利
    未知

    公开(公告)号：DE1589929C3

    公开(公告)日：1973-01-04

    申请号：DE1589929

    申请日：1967-03-02

    Applicant: INTERNATIONAL BUSINESS MACHINES CORP., ARMONK, N.Y. (V.ST.A.)

    Inventor： LOEFFLER, KARL-HEINZ, SAN JOSE ,  SALBU, ERIK OIVIND JARL, MOUNTAIN VIEW

    IPC: G11B7/09 ,  G11C13/04 ,  H01J29/52 ,  H01J29/82 ,  H01J37/04 ,  H01J37/09 ,  H01J37/21 ,  H01J37/244 ,  H01J37/304 ,  H01J3/38

    Abstract: 1,162,732. Electron beam apparatus. INTERNATIONAL BUSINESS MACHINES CORP. 1 Aug., 1967 [29 Aug., 1966], No. 35206/67. Heading H1D. In a device, which may be readily disassembled, for generating focusing, and accrately directing an electron beam-for use, for example, in electron microscopes, data recording systems, or electron beam cutting, welding, and etching apparatus-all the beam-forming elements, including polepieces and beam-diameterlimiting aperture assemblies, are mounted within and slidably removable from a straight tube of non-magnetic material around which electromagnetic coils for the polepieces are mounted. In the arrangement shown, a beam from the cathode assembly 6 is directed on to and scanned over a memory element 17, by being projected through the alignment coils 25 and 26; the aperture assemblies 85, 87, 89 and 91; the polepieces assemblies 86 and 88 of magnetic lenses 10 and 11; the vernier focusing coil assembly 59 which co-operates with lens 12 to focus the beam in the plane of the memory element; the blanking assembly 90 consisting of electrostatic plates 103 and 104, which permit the beam to be diverted to miss the opening of the final aperture assembly 91; the dynamic focusing coil 14; and the deflecting coil 16. The coil assemblies for the magnetic lenses are separated by spacers 46 and 47, and lenses 10 and 11 each include non-magnetic inserts 35a 97 and 40a, 100, respectively. The structure is assembled by sliding the aperture assemblies, polepiece assemblies 86 and 88, and blanking assembly 90, along the inside of the non- magnetic tube 66, where they are maintained in position between spring clips 92 and 93. The various coil assemblies are slid over the tube 66 and within the outer housing 9 and are compressed between an end flange 48 secured to one end of housing 9, and a clamping ring 50, which is removably held within the housing by a plurality of radially extending screws 51, the axially extending screws 54 permitting the coil assemblies to be pressed against one another. The housing 18 for the memory element 17 is clamped to flange 48, and housing 19 for the cathode assembly 6 is clamped to the end flange 68 of the tube 66. Tube 66 is positioned within housing 9 by one or more members 75 which are pivotally mounted on pins 76 secured to the clamping ring 50, and the inner ends of which engage in recesses 78 in the wall of the tube 66; adjustment of screws 80, which engage against the bevelled outer ends 81 of members 75, cause the latter to pivot anti-clockwise and press the tube 66 forward so that its other end abuts against the plate 71 clamped between the polepiece 43 and the housing 18. Hermetic sealing is ensured by ring seals 69, 70, and 74. Electrical contact to the aperture and blanking assemblies is achieved by conductors passing through insulating sleeves mounted on the wall of tube 66 and projecting on the inside and the outside of the tube to contact spring contacts on the beamforming members within the tube, and conductive portions of the coil assemblies outside the tube, when the apparatus is fully assembled (Fig. 3, not shown). The aperture assemblies incorporate heating coils to reduce the deposition of contamination upon the surfaces exposed to the beam. The memory element 17 is of electron-sensitive or thermoplastic film.

    65.
    发明专利
    未知

    公开(公告)号：DE1589929B2

    公开(公告)日：1972-06-15

    申请号：DE1589929

    申请日：1967-03-02

    IPC: G11B7/09 ,  G11C13/04 ,  H01J29/52 ,  H01J29/82 ,  H01J37/04 ,  H01J37/09 ,  H01J37/21 ,  H01J37/244 ,  H01J37/304 ,  H01J3/38

    Abstract: 1,162,732. Electron beam apparatus. INTERNATIONAL BUSINESS MACHINES CORP. 1 Aug., 1967 [29 Aug., 1966], No. 35206/67. Heading H1D. In a device, which may be readily disassembled, for generating focusing, and accrately directing an electron beam-for use, for example, in electron microscopes, data recording systems, or electron beam cutting, welding, and etching apparatus-all the beam-forming elements, including polepieces and beam-diameterlimiting aperture assemblies, are mounted within and slidably removable from a straight tube of non-magnetic material around which electromagnetic coils for the polepieces are mounted. In the arrangement shown, a beam from the cathode assembly 6 is directed on to and scanned over a memory element 17, by being projected through the alignment coils 25 and 26; the aperture assemblies 85, 87, 89 and 91; the polepieces assemblies 86 and 88 of magnetic lenses 10 and 11; the vernier focusing coil assembly 59 which co-operates with lens 12 to focus the beam in the plane of the memory element; the blanking assembly 90 consisting of electrostatic plates 103 and 104, which permit the beam to be diverted to miss the opening of the final aperture assembly 91; the dynamic focusing coil 14; and the deflecting coil 16. The coil assemblies for the magnetic lenses are separated by spacers 46 and 47, and lenses 10 and 11 each include non-magnetic inserts 35a 97 and 40a, 100, respectively. The structure is assembled by sliding the aperture assemblies, polepiece assemblies 86 and 88, and blanking assembly 90, along the inside of the non- magnetic tube 66, where they are maintained in position between spring clips 92 and 93. The various coil assemblies are slid over the tube 66 and within the outer housing 9 and are compressed between an end flange 48 secured to one end of housing 9, and a clamping ring 50, which is removably held within the housing by a plurality of radially extending screws 51, the axially extending screws 54 permitting the coil assemblies to be pressed against one another. The housing 18 for the memory element 17 is clamped to flange 48, and housing 19 for the cathode assembly 6 is clamped to the end flange 68 of the tube 66. Tube 66 is positioned within housing 9 by one or more members 75 which are pivotally mounted on pins 76 secured to the clamping ring 50, and the inner ends of which engage in recesses 78 in the wall of the tube 66; adjustment of screws 80, which engage against the bevelled outer ends 81 of members 75, cause the latter to pivot anti-clockwise and press the tube 66 forward so that its other end abuts against the plate 71 clamped between the polepiece 43 and the housing 18. Hermetic sealing is ensured by ring seals 69, 70, and 74. Electrical contact to the aperture and blanking assemblies is achieved by conductors passing through insulating sleeves mounted on the wall of tube 66 and projecting on the inside and the outside of the tube to contact spring contacts on the beamforming members within the tube, and conductive portions of the coil assemblies outside the tube, when the apparatus is fully assembled (Fig. 3, not shown). The aperture assemblies incorporate heating coils to reduce the deposition of contamination upon the surfaces exposed to the beam. The memory element 17 is of electron-sensitive or thermoplastic film.

    Modular all-electrostatic electron-optical column and assembly of said columns into an array and method of manufacture
    70.
    发明授权
    Modular all-electrostatic electron-optical column and assembly of said columns into an array and method of manufacture 失效
    模块化全静电电子光学柱和所述色谱柱组装成阵列和制造方法

    公开(公告)号：US4661709A

    公开(公告)日：1987-04-28

    申请号：US749792

    申请日：1985-06-28

    Applicant: David M. Walker ,  Alan P. Sliski ,  Kenneth J. Harte ,  John J. Carrona

    Inventor： David M. Walker ,  Alan P. Sliski ,  Kenneth J. Harte ,  John J. Carrona

    IPC: H01J37/30 ,  H01J37/317 ,  H01J3/38

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3177

    Abstract: The invention provides a modular-building block method and system of fabrication, installation, alignment and operation of a multi-beam assembly of miniaturized, all-electrostatic charged particle optical columns, such electron beam or ion beam optical columns mounted in parallel in a closely packed cluster over a small target surface area for parallel simultaneous charged particle beam writing on the target surface with the multiple-channel cluster of charged particle beam optical columns. The assembly provides a system and method of increased thru-put in the direct charged particle beam writing on semiconductor target wafers during fabrication of semiconductor micro-circuit chips.

    Abstract translation: 本发明提供了一种用于小型化，全静电带电粒子光学柱的多光束组件的制造，安装，对准和操作的模块化构建块方法和系统，这种电子束或离子束光学柱被紧密地安装 在小目标表面区域上的堆叠簇，用于并行同时带电的粒子束在目标表面上与带有带电粒子束光柱的多通道簇一起写入。 该组件提供了在制造半导体微电路芯片期间在半导体靶晶片上的直接带电粒子束写入中增加通量的系统和方法。

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