公开(公告)号：WO0212925A3

公开(公告)日：2002-09-06

申请号：PCT/US0124332

申请日：2001-08-03

Applicant: REFLECTIVITY INC ,  HUIBERS ANDREW G ,  ILKOV FEDOR ,  PATEL SATYADEV ,  RICHARDS PETER W ,  STOCKTON JOHN

Inventor： HUIBERS ANDREW G ,  ILKOV FEDOR ,  PATEL SATYADEV ,  RICHARDS PETER W ,  STOCKTON JOHN

IPC: B81B3/00 ,  B81B7/02 ,  B81B7/04 ,  B81C1/00 ,  G02B26/08 ,  G02B27/18 ,  G03B21/00 ,  G03B21/10 ,  H04N3/08 ,  H04N5/74 ,  G02B26/00 ,  G03B21/28

CPC classification number: G02B26/0841 ,  B81B7/0067 ,  G02B26/0833 ,  G03B21/28 ,  G03F7/70291 ,  H04N5/7458

Abstract: Micromirrors are provided which are not rectangular in order to minimize light diffraction along a direction of switching and into the acceptance cone of collection optics (115). A light source (114) is placed orthogonal to rows and columns of an array (94) though not orthogonal to any substantial portion of the sides of the micromirrors in the array. The micromirrors of the present invention result in an improved contrast ratio and the light source position results in a more compact system. The micromirrors have the ability to pivot in opposite direction to on and off positions where the movement to the on position is greater than the movement to the off position.

Abstract translation: 提供微镜，其不是矩形的，以便沿着切换方向和收集光学器件（115）的接收锥体中的光衍射最小化。 光源（114）与阵列（94）的行和列正交地放置，但并非与阵列中的微镜的任何相当部分正交。 本发明的微反射镜导致对比度提高，光源位置导致更紧凑的系统。 微型镜具有相对于打开位置的运动大于移动到关闭位置的打开和关闭位置的相反方向枢转的能力。

公开(公告)号：WO2006001921A3

公开(公告)日：2006-05-11

申请号：PCT/US2005016732

申请日：2005-05-12

Applicant: REFLECTIVITY INC ,  PATEL SATYADEV ,  RICHARDS PETER ,  DOAN JONATHAN ,  TARN TERRY

Inventor： PATEL SATYADEV ,  RICHARDS PETER ,  DOAN JONATHAN ,  TARN TERRY

IPC: G02B26/00

CPC classification number: G02B26/0841 ,  H04N9/3114

Abstract: Disclosed herein a microelectromechanical device having first and second substrates (120 and 122) that are bonded together with a gap formed therebetween. A plurality of functional members is disposed within the gap. The two substrates are bonded with a bonding agent (136) that comprises an electrically conductive adhesive material.

Abstract translation: 本文公开了一种具有第一和第二基板（120和122）的微机电装置，所述第一和第二基板以其间形成的间隙结合在一起。 多个功能构件设置在间隙内。 两个基板与包含导电粘合剂材料的粘合剂（136）粘合。

公开(公告)号：WO2005045889A3

公开(公告)日：2005-12-29

申请号：PCT/US2004033773

申请日：2004-10-12

Applicant: REFLECTIVITY INC ,  HUIBERS ANDREW ,  PATEL SATYADEV

Inventor： HUIBERS ANDREW ,  PATEL SATYADEV

IPC: G02B26/08 ,  G02B26/00

CPC classification number: G02B26/0841

Abstract: A micromirror of a micromirror array of a spatial light modulator used in display systems comprises a mirror plate attached to a hinge that is supported by two posts formed on a substrate. Also the mirror plate is operable to rotate along a rotation axis that is parallel to but offset from a diagonal of the mirror plate when viewed from the top. An imaginary line connecting the two posts is not parallel to either diagonal of the mirror plate.

Abstract translation: 显示系统中使用的空间光调制器的微镜阵列的微镜包括附接到铰链的镜板，所述铰链由形成在基板上的两个柱支撑。 而且，当从顶部看时，镜板可操作成沿着平行于镜板的对角线但偏离镜板的对角线的旋转轴线旋转。 连接两个柱的假想线不平行于镜板的任一对角线。

公开(公告)号：WO2005036596A3

公开(公告)日：2005-12-15

申请号：PCT/US2004027760

申请日：2004-08-25

Applicant: REFLECTIVITY INC ,  SHI HONGQIN ,  SCHAADT GREGORY P

Inventor： SHI HONGQIN ,  SCHAADT GREGORY P

IPC: B81C1/00 ,  C23F1/12 ,  H01L20060101 ,  H01L21/00 ,  H01L21/302 ,  H01L21/311 ,  H01L21/3213 ,  H01L21/461

CPC classification number: H01L21/31116 ,  B81C1/00531 ,  B81C2201/0109 ,  C23F1/12 ,  H01L21/32135 ,  H01L21/67069 ,  H01L21/67253

Abstract: The present invention provides a method for removing sacrificial materials in fabrications of microstructures using a selected spontaneous vapor phase chemical etchants. During the etching process, an amount of the etchant is fed into an etch chamber for removing the sacrificial material. Additional amount of the etchant are fed into the etch chamber according to a detection of an amount or an amount of an etching product so as to maintaining a substantially constant etching rate of the sacrificial materials inside the etch chamber. Accordingly, an etching system is provided for removing the sacrificial materials based on the disclosed etching method.

Abstract translation: 本发明提供一种使用选定的自发气相化学蚀刻剂去除微结构制造中的牺牲材料的方法。 在蚀刻过程中，将一定量的蚀刻剂送入用于去除牺牲材料的蚀刻室中。 根据蚀刻产物的量或量的检测，将蚀刻剂的额外量进料到蚀刻室中，以保持蚀刻室内的牺牲材料的蚀刻速率基本上恒定。 因此，提供了基于所公开的蚀刻方法去除牺牲材料的蚀刻系统。

公开(公告)号：WO2005076802A2

公开(公告)日：2005-08-25

申请号：PCT/US2005/001935

申请日：2005-01-24

Applicant: REFLECTIVITY, INC. ,  HUIBERS, Andrew ,  COMBES, Michel ,  RICHARDS, Peter

Inventor： RICHARDS, Peter

IPC: G02B7/00 ,  G09G3/34 ,  H04N9/31

CPC classification number: H04N9/315 ,  G02B26/008 ,  G09G3/3413 ,  G09G2310/0235 ,  G09G2310/024 ,  H04N9/3114

Abstract: The present invention provides an illumination system for providing sequential colour light beams for display systems employing light modulators. The illumination system comprises a light source, a lightpipe, and a colour filter that is positioned after the lightpipe on the propagation path of the illumination light such that primary colour light beams shining on the light modulator have defined boundaries during colour transition periods.

Abstract translation: 本发明提供了一种用于为采用光调制器的显示系统提供顺序彩色光束的照明系统。 照明系统包括光源，光管和滤光器，其位于照明光的传播路径上的光管之后，使得发光在光调制器上的原色光束在颜色过渡期间具有界定。

公开(公告)号：WO2004107829A3

公开(公告)日：2005-08-11

申请号：PCT/US2004016421

申请日：2004-05-24

Applicant: REFLECTIVITY INC ,  TARN TERRY

Inventor： TARN TERRY

IPC: B81B7/00 ,  G02B26/08 ,  H01L23/10 ,  H01L29/22

CPC classification number: B81C1/00269 ,  B81C2203/0181 ,  G02B26/0841 ,  H01L23/10 ,  H01L2924/0002 ,  H01L2924/01079 ,  H01L2924/09701 ,  H01L2924/12044 ,  H01L2924/16195 ,  Y10T156/10 ,  H01L2924/00

Abstract: A novel method of packaging electronic devices (105) (e.g. any device that receives or transmits electronic signals) including microelectromechanical devices, semiconductor devices, light emitting devices, light modulating devices, and light detecting device has been provided herein. The electronic device (105) is placed between two substrates (102, 110), at least one of which has a cavity for holding the electronic device. The two substrates are then bonded and hermetically sealed with a sealing medium (106). The adhesion of the healing medium (106) to the substrates, especially when one of the two substrate is ceramic, can be improved by applying a metallization layer (104) to the surface of the substrate.

Abstract translation: 本文提供了一种包括微机电装置，半导体装置，发光装置，光调制装置和光检测装置的电子装置（105）（例如接收或发送电子信号的装置）的新型方法。 电子设备（105）被放置在两个基板（102,110）之间，其中至少一个具有用于保持电子设备的空腔。 然后将两个基板粘合并用密封介质（106）气密密封。 通过将金属化层（104）施加到基板的表面，可以改善愈合介质（106）对基板的粘附，特别是当两个基板中的一个是陶瓷时。

公开(公告)号：WO2005036596A2

公开(公告)日：2005-04-21

申请号：PCT/US2004/027760

申请日：2004-08-25

Applicant: REFLECTIVITY, INC. ,  SHI, Hongqin ,  SCHAADT, Gregory, P.

Inventor： SHI, Hongqin ,  SCHAADT, Gregory, P.

IPC: H01L

CPC classification number: H01L21/31116 ,  B81C1/00531 ,  B81C2201/0109 ,  C23F1/12 ,  H01L21/32135 ,  H01L21/67069 ,  H01L21/67253

Abstract: The present invention provides a method for removing sacrificial materials in fabrications of microstructures using a selected spontaneous vapor phase chemical etchants. During the etching process, an amount of the etchant is fed into an etch chamber for removing the sacrificial material. Additional amount of the etchant are fed into the etch chamber according to a detection of an amount or an amount of an etching product so as to maintaining a substantially constant etching rate of the sacrificial materials inside the etch chamber. Accordingly, an etching system is provided for removing the sacrificial materials based on the disclosed etching method,

Abstract translation: 本发明提供一种使用选定的自发气相化学蚀刻剂去除微结构制造中的牺牲材料的方法。 在蚀刻过程中，将一定量的蚀刻剂送入用于去除牺牲材料的蚀刻室中。 根据蚀刻产物的量或量的检测，将蚀刻剂的额外量进料到蚀刻室中，以保持蚀刻室内的牺牲材料的蚀刻速率基本上恒定。 因此，提供了基于所公开的蚀刻方法去除牺牲材料的蚀刻系统，

公开(公告)号：WO2005035090A2

公开(公告)日：2005-04-21

申请号：PCT/US2004027573

申请日：2004-08-25

Applicant: REFLECTIVITY INC ,  SCHAADT GREGORY P ,  HONGQIN SHI

Inventor： SCHAADT GREGORY P ,  HONGQIN SHI

IPC: B01D20060101 ,  C23F1/00 ,  G01R31/00 ,  H01L21/00 ,  H01L21/302 ,  H01L21/461 ,  B01D

CPC classification number: B81C1/00595 ,  B81C2201/0132

Abstract: The present invention teaches a method and apparatus for removing sacrificial materials in fabrications of microstructures using one or more selected spontaneous vapor phase etchants. The selected etchant is fed into an etch chamber containing the microstructure during each feeding cycle of a sequence of feeding cycles until the sacrificial material of the microstructure is exhausted through the chemical reaction between the etchant and the sacrificial material, Specifically, during a first feeding cycle, a first amount of selected spontaneous vapor phase etchant is fed into the etch chamber. At a second feeding cycle, a second amount of the etchant is fed into the etch chamber. The first amount and the second amount of the selected etchant may or may not be the same, The time duration of the feeding cycles are individually adjustable.

Abstract translation: 本发明教导了使用一种或多种选择的自发气相蚀刻剂去除微结构制造中的牺牲材料的方法和装置。 在一系列进料循环的每个进料循环期间，将所选择的蚀刻剂进料到含有微结构的蚀刻室中，直到微结构的牺牲材料通过蚀刻剂和牺牲材料之间的化学反应排出。具体地，在第一进料循环期间 ，将第一量的选择的自发气相蚀刻剂送入蚀刻室。 在第二进料循环中，将第二量的蚀刻剂送入蚀刻室。 所选择的蚀刻剂的第一量和第二量可以是相同的也可以不相同。进料循环的持续时间可以单独调节。

公开(公告)号：WO2004093083A3

公开(公告)日：2004-10-28

申请号：PCT/US2004/009221

申请日：2004-03-24

Applicant: REFLECTIVITY, INC. ,  RICHARDS, Peter

Inventor： RICHARDS, Peter

IPC: G11C05/00

Abstract: Methods and apparatus for selectively updating memory cells of a memory cell array are provided. The memory cells of each row of the memory cell array are provided with a plurality of wordlines. Memory cells of the row are activated and updated by separated wordlines. In an application of display systems using memory cell arrays for controlling the pixels of the display system and pulse-width-modulation (PWM) technique for displaying grayscales, the pixels can be modulated by different PWM waveforms. The perceived dynamic-false-contouring artifacts are reduced thereby. In another application, the provision of multiple wordlines enables precise measurements of voltages maintained by memory cells of the memory cell array.

公开(公告)号：WO2004049017A2

公开(公告)日：2004-06-10

申请号：PCT/US0337941

申请日：2003-11-25

Applicant: REFLECTIVITY INC ,  HUIBERS ANDREW G ,  PATEL SATYADEV R ,  DUBOC ROBERT M

Inventor： HUIBERS ANDREW G ,  PATEL SATYADEV R ,  DUBOC ROBERT M

IPC: B81B3/00 ,  B81B7/04 ,  G02B26/08 ,  G02B

CPC classification number: G02B26/0841 ,  B82Y30/00 ,  Y10T428/30

Abstract: A projection system, a spatial light modulator, and a method for forming micromirrors are disclosed. A substrate comprises circuitry and electrodes for electrostatically deflecting micromirror elements that are disposed within an array of such elements forming the spatial light modulator. In one embodiment, the substrate is a silicon substrate having circuitry and electrodes thereon for electrostatically actuating adjacent micromirror elements, and the substrate is fully or selectively covered with a light absorbing material.

Abstract translation: 公开了投影系统，空间光调制器和用于形成微镜的方法。 衬底包括用于静电偏转微镜元件的电路和电极，微镜元件设置在形成空间光调制器的这种元件的阵列内。 在一个实施例中，衬底是具有电路和电极的硅衬底，用于静电地驱动相邻的微镜元件，并且衬底被完全或选择性地覆盖有光吸收材料。