公开(公告)号：KR1020100013093A

公开(公告)日：2010-02-09

申请号：KR1020080074605

申请日：2008-07-30

Applicant: 전자부품연구원

Inventor： 이철승 ,  한종훈 ,  이경일 ,  김성현

IPC: B41J2/01 ,  B41J2/00 ,  B82Y40/00

Abstract: PURPOSE: A carbon nanotube ink-jet apparatus and a heat-treating method using the same are provided to simultaneously jet ink including carbon nanotube and selectively heat-treat a metal layer by installing a laser irradiator and a lens in an ink-jet apparatus. CONSTITUTION: A carbon nanotube ink-jet apparatus(200) comprises an ink jetting device(240), a laser irradiator(250) and a lens(260). The ink jetting device jets ink(230) including carbon nanotube on a cathode substrate(210) in which a metal layer(220) is formed. The laser irradiator is formed on one side of the ink jetting device. The laser irradiator selectively heat-treats the metal layer. The lens is formed on the laser irradiator. The lens focuses the laser on the metal layer. The laser irradiator is located on one or both parts between an upward part and a lower part of a cathode substrate.

Abstract translation: 目的：提供一种碳纳米管喷墨装置及使用其的热处理方法，以同时喷射包括碳纳米管的墨水，并通过在喷墨装置中安装激光照射器和透镜来选择性地热处理金属层。 构成：碳纳米管喷墨装置（200）包括喷墨装置（240），激光照射器（250）和透镜（260）。 喷墨装置在其上形成有金属层（220）的阴极基板（210）上喷射包括碳纳米管的墨（230）。 激光照射器形成在喷墨装置的一侧。 激光照射器选择性地热处理金属层。 透镜形成在激光照射器上。 透镜将激光器聚焦在金属层上。 激光照射器位于阴极基板的上部和下部之间的一个或两个部分上。

公开(公告)号：KR1020090019226A

公开(公告)日：2009-02-25

申请号：KR1020070083492

申请日：2007-08-20

Applicant: 전자부품연구원

Inventor： 이철승 ,  조진우 ,  장세홍 ,  이경일 ,  서문석 ,  한종훈 ,  이유진 ,  김성현 ,  신진국

IPC: C03C17/30

CPC classification number: C03C23/006 ,  C03C17/32 ,  C03C23/007

Abstract: A silica glass film formation method for passivating surface using polysilazane is provided to have no deformity by impurity when cured in a room temperature and to form glass film having high density. A glass film formation method for passivating surface comprises steps of: coating polysilazane on a substrate; and curing the polysilazane by using atmospheric pressure plasma process. A process time of the curing step is 10-20 minutes. A processing temperature of the curing step is 50~120°C. A process gas of the atmospheric pressure plasma process is argon gas and oxygen gas.

Abstract translation: 提供使用聚硅氮烷钝化表面的二氧化硅玻璃膜形成方法，其在室温下固化时不会产生杂质变形，并形成高密度的玻璃膜。 钝化表面的玻璃成膜方法包括以下步骤：在基材上涂布聚硅氮烷; 并使用大气压等离子体处理固化聚硅氮烷。 固化步骤的处理时间为10-20分钟。 固化步骤的加工温度为50〜120℃。 大气压等离子体工艺的工艺气体是氩气和氧气。

公开(公告)号：KR1020090019059A

公开(公告)日：2009-02-25

申请号：KR1020070083195

申请日：2007-08-20

Applicant: 전자부품연구원

Inventor： 이철승 ,  조진우 ,  장세홍 ,  이경일 ,  서문석 ,  한종훈 ,  이유진 ,  김성현 ,  신진국

IPC: B32B33/00

CPC classification number: B32B33/00 ,  B32B17/06 ,  B32B38/0008 ,  B32B2255/205 ,  B32B2307/402 ,  B32B2307/554 ,  B32B2307/584 ,  B32B2310/14

Abstract: A structure having a glass protection layer formed on the surface thereof is provided to protect the surface of the structure from scratches, wear, finger printing, dust, etc. while maintaining color or gloss of the substrate, to reduce the entire coating process time, and to allow the glass protection layer to exhibit best physical properties even at room temperature. In a structure having a glass protection layer(240) in which a matrix(210) and a silver coating layer(220) are sequentially formed, a structure having a glass protection layer formed on the surface thereof comprises the glass protection layer formed on the silver coating layer using polysilazane. The structure having a glass protection layer formed on the surface thereof further comprises a coloring layer(230) formed between the silver coating layer and glass protection layer to display gloss and color of the structure. The formation of the glass protection layer is performed using atmospheric pressure plasma hardening, pressurized wet hardening, or seam hardening. The sliver coating layer and glass protection layer are formed by spray coating, dip coating, or spin coating. The glass protection layer is coated to a thickness of 0.1 to 5 mum.

Abstract translation: 提供了在其表面上形成有玻璃保护层的结构，以保持结构的表面免受划伤，磨损，指纹印刷，灰尘等，同时保持基底的颜色或光泽，从而减少整个涂布处理时间， 并且即使在室温下也允许玻璃保护层表现出最好的物理性能。 在其中依次形成有基体（210）和银涂层（220）的玻璃保护层（240）的结构中，在其表面上形成有玻璃保护层的结构包括形成在玻璃保护层 银涂层采用聚硅氮烷。 具有形成在其表面上的玻璃保护层的结构还包括形成在银涂层和玻璃保护层之间的着色层（230），以显示结构的光泽和颜色。 玻璃保护层的形成使用大气压等离子体硬化，加压湿固化或接缝硬化进行。 纱线涂层和玻璃保护层通过喷涂，浸涂或旋涂形成。 将玻璃保护层涂覆至0.1〜5μm的厚度。