公开(公告)号：DE3889977D1

公开(公告)日：1994-07-14

申请号：DE3889977

申请日：1988-06-24

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BOETTCHER ANDREAS DR ,  BINDER HORST

IPC: G03C1/72 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.

公开(公告)号：DE58906521D1

公开(公告)日：1994-02-10

申请号：DE58906521

申请日：1989-05-10

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BOETTCHER ANDREAS DR ,  FISCHER MARTIN DR ,  BINDER HORST

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

Abstract: The invention relates to a radiation-sensitive mixture which contains… (a) a polymeric binder insoluble in water and soluble in aqueous-alkaline solutions and… (b) an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping which is cleavable by acid and additionally one grouping which forms a strong acid under the action of radiation, and additionally… (c) an organic compound which is not photosensitive and contains at least one bond cleavable by acid and whose solubility in an aqueous-alkaline developer is increased by the action of acid, or… (d) an organic compound which is not photosensitive and contains at least one bond cleavable by acid and which decomposes under the action of acid in such a way that it can be completely removed from the layer by treatment at temperatures from 60 to 120 DEG C. … This mixture is suitable for the formation of relief patterns.

公开(公告)号：DE4202845A1

公开(公告)日：1993-08-05

申请号：DE4202845

申请日：1992-01-31

Applicant: BASF AG

Inventor： BINDER HORST ,  SCHWALM REINHOLD DR ,  FUNHOFF DIRK DR

IPC: G03F7/004 ,  C08L61/10 ,  G03F7/039 ,  H01L21/027

Abstract: The invention relates to a radiation-sensitive mixture essentially comprising (a) a water-insoluble binder or binder mixture, and (b) a compound which forms a strong acid on irradiation, where component (a) is a phenolic resin all or some of whose phenolic hydroxyl groups have been replaced by groups (IA) or (IB) in which R , R and R are alkyl radicals, or R together with R forms a ring, and X is CH2, O, S, SO2 or NR . This radiation-sensitive mixture is suitable for the production of relief structures.

公开(公告)号：DE3871553D1

公开(公告)日：1992-07-09

申请号：DE3871553

申请日：1988-02-20

Applicant: BASF AG

Inventor： KOCH HORST DR ,  SCHUPP HANS DR ,  SCHWALM REINHOLD DR

IPC: G03F7/032 ,  G03F7/004 ,  G03F7/027 ,  G03F7/033

Abstract: Light-sensitive copying material for producing printing plates or resist patterns has a photopolymerisable copying layer on a dimensionally stable substrate, which can be developed with aq. alkali or organic solvent. This contains a polymeric binder, which is soluble or dispersible in aq. alkaline medium or organic solvent, low mol. ethylenically unsatd. photopolymerisable organic cpd(s), photopolymerisation initiator(s), and opt. other additives. The novelty is that the binder consists of film-forming copolymer(s) (I) with multiphase morphology, in which at least one phase has a Tg below room temp. and at least one other phase of Tg above room temp. (I) is produced by free radical copolymerisation of macromer(s) (II) with other olefinically unsatd. copolymerisable organic cpd(s) (III).

公开(公告)号：DE4032161A1

公开(公告)日：1992-04-16

申请号：DE4032161

申请日：1990-10-10

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BINDER HORST

IPC: G03F7/039 ,  G03F7/38 ,  H01L21/027

公开(公告)号：DE3914407A1

公开(公告)日：1990-10-31

申请号：DE3914407

申请日：1989-04-29

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR

IPC: C08G64/00 ,  C08G75/00 ,  C08G77/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027 ,  H01L21/30 ,  H01L21/312 ,  H01L21/47

公开(公告)号：DE3837438A1

公开(公告)日：1990-05-10

申请号：DE3837438

申请日：1988-11-04

Applicant: BASF AG

Inventor： NGUYEN KIM SON DR ,  HOFFMANN GERHARD DR ,  SCHWALM REINHOLD DR

IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027 ,  H01L21/30

Abstract: The invention relates to a radiation-sensitive mixture essentially consisting of (a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions, (b) a compound which upon irradiation forms a strong acid and (c) one or more organic compounds which inhibit the solubility of (a) in aqueous alkaline solutions, where the organic compound (c) is a malonic acid ester. This radiation-sensitive mixture may be used to prepare photoresists.

公开(公告)号：DE3721740A1

公开(公告)日：1989-01-12

申请号：DE3721740

申请日：1987-07-01

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BOETTCHER ANDREAS DR

IPC: C07D333/46 ,  C07C67/00 ,  C07C69/96 ,  C07C325/00 ,  C07C381/12 ,  C07F7/08 ,  C07F7/18 ,  C08F2/50 ,  C08F4/00 ,  C09D7/12 ,  G03F7/004 ,  G03F7/029 ,  G03F7/031 ,  G03F7/26 ,  C07C149/46 ,  G03F7/10

Abstract: Sulphonium salts of the formula … … in which R , R and R are identical to or different from one another and represent aliphatic and/or aromatic radicals which may contain heteroatoms, or two of the radicals R to R are linked to one another to form a ring, with the proviso that at least one of the radicals R to R contains at least one grouping cleavable by acid or one of the radicals R to R is linked to one or more further sulphonium salt radicals, if desired via groupings cleavable by acid, and X denotes a non-nucleophilic counterion… are suitable as photoinitiators for cationic polymerisation.

公开(公告)号：DE3706561A1

公开(公告)日：1988-09-08

申请号：DE3706561

申请日：1987-02-28

Applicant: BASF AG

Inventor： KOCH HORST DR ,  SCHUPP HANS DR ,  SCHWALM REINHOLD DR

IPC: G03F7/032 ,  G03F7/004 ,  G03F7/027 ,  G03F7/033 ,  G03F7/10 ,  G03C1/68

公开(公告)号：DE3701569A1

公开(公告)日：1988-08-04

申请号：DE3701569

申请日：1987-01-21

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BINDER HORST

IPC: G03C1/72 ,  C08F20/34 ,  C08F220/36 ,  C08F220/42 ,  C08F220/48 ,  C08F222/22 ,  G03F7/039 ,  C08F220/34 ,  C08F220/04 ,  G03F7/10

Abstract: Copolymers containing from 5 to 50 mol % of monomers having o-nitrocarbinol ester groups, from 94 to 30 mol % of methacrylonitrile, from 1 to 20 mol % of olefinically unsaturated copolymerizable carboxylic acid and from 0 to 30 mol % of other copolymerizable monomers as copolymerized units are useful for fabricating semiconductor components.