公开(公告)号：US11815717B2

公开(公告)日：2023-11-14

申请号：US17525293

申请日：2021-11-12

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Vibhor Jain ,  Nicholas A. Polomoff ,  Yusheng Bian

IPC: G02B6/12 ,  G02B6/122 ,  G02B6/24 ,  H01L23/00

CPC classification number: G02B6/122 ,  G02B6/243 ,  H01L23/573 ,  G02B2006/12061 ,  G02B2006/12126

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a photonic chip security structure and methods of manufacture. The structure includes an optical component and a photonic chip security structure having a vertical wall composed of light absorbing material surrounding the optical component.

公开(公告)号：US11810969B2

公开(公告)日：2023-11-07

申请号：US17509384

申请日：2021-10-25

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Haiting Wang ,  Alexander Derrickson ,  Jagar Singh ,  Vibhor Jain ,  Andreas Knorr ,  Alexander Martin ,  Judson R. Holt ,  Zhenyu Hu

IPC: H01L29/735 ,  H01L29/66 ,  H01L29/737 ,  H01L29/08 ,  H01L29/417

CPC classification number: H01L29/735 ,  H01L29/0808 ,  H01L29/0821 ,  H01L29/41708 ,  H01L29/6625 ,  H01L29/737

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a lateral bipolar transistor and methods of manufacture. A structure includes: an intrinsic base comprising semiconductor material in a channel region of a semiconductor substrate; an extrinsic base vertically above the intrinsic base; a raised collector region on the semiconductor substrate and laterally connected to the intrinsic base; and a raised emitter region on the semiconductor substate and laterally connected to the intrinsic base.

公开(公告)号：US20230268401A1

公开(公告)日：2023-08-24

申请号：US17747476

申请日：2022-05-18

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Hong Yu ,  Jianwei Peng ,  Vibhor Jain

IPC: H01L29/417 ,  H01L29/737 ,  H01L29/08 ,  H01L29/10 ,  H01L29/423 ,  H01L29/66

CPC classification number: H01L29/41708 ,  H01L29/7371 ,  H01L29/0804 ,  H01L29/0821 ,  H01L29/1008 ,  H01L29/42304 ,  H01L29/66242

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a bipolar transistor with self-aligned asymmetric spacer and methods of manufacture. The structure includes: a base formed on a semiconductor substrate; an asymmetrical spacer surrounding the base; an emitter on a first side of the base and separated from the base by the asymmetrical spacer; and a collector on a second side of the base and separated from the base by the asymmetrical spacer.

公开(公告)号：US11721719B2

公开(公告)日：2023-08-08

申请号：US17074891

申请日：2020-10-20

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Vibhor Jain ,  Anthony K. Stamper ,  John J. Ellis-Monaghan ,  Steven M. Shank ,  Rajendran Krishnasamy

IPC: H01L29/06 ,  H01L29/08 ,  H01L29/66 ,  H01L29/737 ,  H01L21/763 ,  H01L29/165

CPC classification number: H01L29/0642 ,  H01L21/763 ,  H01L29/0826 ,  H01L29/165 ,  H01L29/66242 ,  H01L29/7371

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to heterojunction bipolar transistors (HBTs) with a buried trap rich region and methods of manufacture. The structure includes: a trap rich isolation region embedded within the bulk substrate; and a heterojunction bipolar transistor above the trap rich isolation region, with its sub-collector region separated by the trap rich isolation region by a layer of the bulk substrate.

公开(公告)号：US20230067948A1

公开(公告)日：2023-03-02

申请号：US17540339

申请日：2021-12-02

Applicant: GlobalFoundries U.S. Inc.

Inventor： Vibhor Jain ,  Judson R. Holt

IPC: H01L29/739 ,  H01L29/66

Abstract: Structures for a diode and methods of fabricating a structure for a diode. The structure includes a layer comprised of a semiconductor material. The layer includes a first section, a second section, and a third section laterally positioned between the first section and the second section. The structure includes a first terminal having a raised semiconductor layer on the first section of the layer, a second terminal including a portion on the second section of the layer, and a gate on the third section of the layer.

公开(公告)号：US11574867B2

公开(公告)日：2023-02-07

申请号：US17104078

申请日：2020-11-25

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Ephrem G. Gebreselasie ,  Vibhor Jain ,  Yves T. Ngu ,  Johnatan A. Kantarovsky ,  Alain F. Loiseau

IPC: H01L23/52 ,  H01L23/525 ,  H01L21/8249 ,  H01L21/02 ,  H01L27/07 ,  H01L23/62 ,  H01L27/115 ,  H01L27/112 ,  H01L27/02

Abstract: An electrical fuse (e-fuse) includes a fuse link including a silicided semiconductor layer over a dielectric layer covering a gate conductor. The silicided semiconductor layer is non-planar and extends orthogonally over the gate conductor. A first terminal is electrically coupled to a first end of the fuse link, and a second terminal is electrically coupled to a second end of the fuse link. The fuse link may be formed in the same layer as an intrinsic and/or extrinsic base of a bipolar transistor. The gate conductor may control a current source for programming the e-fuse. The e-fuse reduces the footprint and the required programming energy compared to conventional e-fuses.

公开(公告)号：US11515397B2

公开(公告)日：2022-11-29

申请号：US16934669

申请日：2020-07-21

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Anthony K. Stamper ,  Siva P. Adusumilli ,  Vibhor Jain ,  Steven Bentley

IPC: H01L29/66 ,  H01L29/20 ,  H01L29/778 ,  H01L29/06 ,  H01L21/763 ,  H01L21/8234 ,  H01L29/36

Abstract: Semiconductor structures including electrical isolation and methods of forming a semiconductor structure including electrical isolation. A layer stack is formed on a semiconductor substrate comprised of a single-crystal semiconductor material. The layer stack includes a semiconductor layer comprised of a III-V compound semiconductor material. A polycrystalline layer is formed in the semiconductor substrate. The polycrystalline layer extends laterally beneath the layer stack.

公开(公告)号：US11469178B2

公开(公告)日：2022-10-11

申请号：US17126921

申请日：2020-12-18

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Anthony K. Stamper ,  John J. Ellis-Monaghan ,  Steven M. Shank ,  John J. Pekarik ,  Vibhor Jain

IPC: H01L23/525 ,  H01L27/12 ,  H01L23/532

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a metal-free fuse structure and methods of manufacture. The structure includes: a first metal-free fuse structure comprising a top semiconductor material of semiconductor-on-insulator (SOI) technologies, the top semiconductor material including end portions with a first electrical resistance and a fuse portion of a second, higher electrical resistance electrically connected to the end portions; and a second metal-free fuse structure comprising the top semiconductor material of semiconductor-on-insulator (SOI) technologies, the top semiconductor material of the second metal-free fuse structure including at least a fuse portion of a lower electrical resistance than the second, higher electrical resistance.

公开(公告)号：US11411081B2

公开(公告)日：2022-08-09

申请号：US16855236

申请日：2020-04-22

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Steven M. Shank ,  Anthony K. Stamper ,  Vibhor Jain ,  John J. Ellis-Monaghan

IPC: H01L27/092 ,  H01L29/08 ,  H01L29/78

Abstract: The disclosure provides a field effect transistor (FET) stack with methods to form the same. The FET stack includes a first transistor over a substrate. The first transistor includes a first active semiconductor material including a first channel region between a first set of source/drain terminals, and a first gate structure over the first channel region. The first gate structure includes a first gate insulator of a first thickness above the first channel region. A second transistor is over the substrate and horizontally separated from the first transistor. A second gate structure of the second transistor may include a second gate insulator of a second thickness above a second channel region, the second thickness being greater than the first thickness. A shared gate node may be coupled to each of the first gate structure and the second gate structure.

公开(公告)号：US20220190145A1

公开(公告)日：2022-06-16

申请号：US17120916

申请日：2020-12-14

Applicant: GLOBALFOUNDRIES U.S. Inc.

Inventor： Sarah McTaggart ,  Qizhi Liu ,  Vibhor Jain ,  Mark Levy ,  Paula Fisher ,  James R. Elliott

IPC: H01L29/737 ,  H01L29/66

Abstract: Device structures and fabrication methods for heterojunction bipolar transistors. Trench isolation regions are positioned in a semiconductor substrate to define active regions. A base layer includes first sections that are respectively positioned over the active regions and second sections that are respectively positioned over the trench isolation regions. Emitter fingers are respectively positioned on the first sections of the base layer. The first sections of the base layer include single-crystal semiconductor material, and the second sections of the base layer include polycrystalline semiconductor material. The second sections of the base layer are spaced in a vertical direction from the trench isolation regions to define a first cavity that extends about a perimeter of the base layer and second cavities that are connected to the first cavity.