Substrate processing apparatus and substrate processing method
    78.
    发明授权
    Substrate processing apparatus and substrate processing method 有权
    基板加工装置及基板处理方法

    公开(公告)号:US09387510B2

    公开(公告)日:2016-07-12

    申请号:US14366231

    申请日:2012-12-21

    Abstract: Disclosed is a substrate processing apparatus and method which facilitate to improve uniformity of thin film material and also facilitate to control quality of thin film by the use of plasma forming space and source gas distributing space separately provided from each other, wherein the substrate processing apparatus includes a process chamber; a substrate support for supporting a plurality of substrates, the substrate support rotatably provided inside the process chamber; and a electrode unit arranged above the substrate support and provided with the plasma forming space and the source gas distributing space, wherein the plasma forming space is spatially separated from the source gas distributing space.

    Abstract translation: 公开了一种有利于提高薄膜材料的均匀性的基板处理装置和方法,并且还通过使用彼此分开设置的等离子体形成空间和源气体分配空间来有助于控制薄膜的质量,其中基板处理装置包括 处理室; 用于支撑多个基板的基板支撑件,可旋转地设置在处理室内的基板支撑件; 以及电极单元,其布置在所述基板支撑件上方,并设置有所述等离子体形成空间和所述源气体分配空间,其中所述等离子体形成空间与所述源气体分配空间在空间上分离。

    Method for preparing samples for imaging
    80.
    发明授权
    Method for preparing samples for imaging 有权
    准备成像样品的方法

    公开(公告)号:US09111720B2

    公开(公告)日:2015-08-18

    申请号:US14572626

    申请日:2014-12-16

    Applicant: FEI Company

    Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

    Abstract translation: 提供了一种方法和装置,用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 在最终研磨之前或期间,使用带电粒子束沉积将材料沉积到样品上,这导致无伪影的表面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。

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