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    ADVANCED LIGHT EXTRACTION STRUCTURE
    82.
    发明申请
    ADVANCED LIGHT EXTRACTION STRUCTURE 审中-公开
    先进的光提取结构

    公开(公告)号：US20160149163A1

    公开(公告)日：2016-05-26

    申请号：US14903822

    申请日：2014-07-08

    Applicant: PIXELLIGENT TECHNOLOGIES LLC

    Inventor： Zhiyun CHEN ,  Gregory D. COOPER

    IPC: H01L51/52 ,  G02B3/00 ,  H01L51/00 ,  H01L27/32 ,  H01L51/56

    CPC classification number: H01L51/5275 ,  G02B3/0056 ,  G02B3/0087 ,  H01L27/3211 ,  H01L51/5253

    Abstract: This presently disclosed technology relates to Organic Light Emitting Diodes (OLEDs), more particularly it relates to OLED display extraction and nanocomposite formulations that can be used for the light extraction structure. The OLEDs comprise, in order, an encapsulation layer or a substrate layer, an array of lenses, and an array of light emitting pixels at least partially covered by said array of lenses, wherein at least one of the lenses covers at least one of the pixel, and said lenses comprises a material with higher refractive index than the encapsulation layer or substrate layer.

    Abstract translation: 本公开的技术涉及有机发光二极管（OLED），更具体地说，涉及可用于光提取结构的OLED显示提取和纳米复合材料制剂。 OLED依次包括封装层或衬底层，透镜阵列和至少部分被所述透镜阵列所覆盖的发光像素阵列，其中透镜中的至少一个覆盖至少一个透镜 像素，并且所述透镜包括具有比封装层或衬底层更高的折射率的材料。

    Programmable photolithographic mask system and method
    86.
    发明申请
    Programmable photolithographic mask system and method 失效
    可编程光刻掩模系统及方法

    公开(公告)号：US20020176062A1

    公开(公告)日：2002-11-28

    申请号：US10166615

    申请日：2002-06-12

    Applicant: Pixelligent Technologies LLC.

    Inventor： Gregory D. Cooper ,  Richard M. Mohring

    IPC: G03B027/42

    CPC classification number: G03F7/70375 ,  G03F7/70291

    Abstract: The present invention overcomes many of the disadvantages of prior lithographic microfabrication processes while providing further improvements that can significantly enhance the ability to make more complicated semiconductor chips at lower cost. A new type of programmable structure for exposing a wafer allows the lithographic pattern to be changed under electronic control. This provides great flexibility, increasing the throughput and decreasing the cost of chip manufacture and providing numerous other advantages. The programmable structure consists of an array of shutters that can be programmed to either transmit light to the wafer (referred to as its nullopennull state) or not transmit light to the wafer (referred to as its nullclosednull state). The programmable structure can comprise or include an array of selective amplifiers. Thus, each selective amplifier is programmed to either amplify light (somewhat analogous to the nullopennull or nulltransparentnull state of a shutter) or be nullnon-amplifyingnull (its nullclosednull or nullopaquenull state). In the non-amplifying state, some portion of the incident light is transmitted through the amplifier material. The shutters and selective amplifiers can work in tandem to form a nullprogrammable layernull. A programmable technique is provided for creating a pattern to be imaged onto a wafer that can be implemented as a viable production technique. Thus, the present invention also provides a technique of making integrated circuits. A diffraction limiter can be used to provide certain advantages associated with contact lithography without requiring some of the disadvantages of contact lithography.

    Abstract translation: 本发明克服了现有的平版印刷微细加工工艺的许多缺点，同时提供了可以以更低成本显着提高制造更复杂的半导体芯片的能力的进一步改进。 用于曝光晶片的新型可编程结构允许在电子控制下改变光刻图案。 这提供了极大的灵活性，增加了生产量并且降低了芯片制造的成本并且提供了许多其他优点。 可编程结构由一组快门组成，可以被编程为将光传输到晶片（称为其“打开”状态）或不将光传输到晶片（称为其“关闭”状态））。 可编程结构可以包括或包括选择放大器的阵列。 因此，每个选择放大器被编程为放大光（有点类似于快门的“打开”或“透明”状态）或者是“非放大”（其“闭合”或“不透明”状态））。 在非放大状态下，入射光的一部分透过放大器材料。 快门和选择放大器可以串联工作以形成“可编程层”。 提供了一种可编程技术，用于创建可被实现为可行的生产技术的要被成像到晶片上的图案。 因此，本发明还提供了制造集成电路的技术。 衍射限制器可以用于提供与接触光刻相关联的某些优点，而不需要接触光刻的一些缺点。

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