Abstract:
PURPOSE: A silicon wafer texturing method for a solar battery having a tight and uniform pyramid structure, a silicon wafer for solar battery textured using the same, and a solar battery including the same are provided to form a regular and small pyramid structure on a wafer surface by removing the blocking effect of hydrogen effectively through a texturing process in a low pressure. CONSTITUTION: A wafer is kept in a state of normal pressure after a silicon wafer is dipped into an etching liquid within a chamber. After low pressure is applied to the etching liquid, the pressure is maintained at a constant rate. A high pressure is then applied to the etching liquid in a decompression process and maintained. The pressure applied to the etching solution is controlled again to be a low pressure. The above steps are repeated several times.
Abstract:
PURPOSE: A solar cell, a method for preparing the same, and an apparatus for preparing the same are provided to minimize the physical damage to a thin silicon substrate by manufacturing an electrode through only transfer an electrode. CONSTITUTION: A silicon substrate(220) is laminated on a first electrode metal transfer paper(210). A second electrode metal transfer paper(230) is laminated on the silicon substrate. A first and a second electrode metal transfer paper are plasticized and are adhered to the substrate. A first electrode is a rear electrode and a second electrode is the front electrode. The first electrode metal transfer paper contains aluminum. The second electrode metal transfer paper contains silver.
Abstract:
A high efficient solar cell is provided to insert the pattern layer of cone or the corn type into the interface of the silicon semiconductor layer and silicon substrate and to improve the absorption rate of sunlight. The pattern layer(120) is formed on the substrate(110). The pattern layer has the slope etch profile. The semiconductor layer(130) is formed on the pattern layer. The transparent conduction layer(140) is formed on the semiconductor layer. The upper electrode(160) is formed on the transparent conductive layer. The bottom electrode(150) is formed in the backside surface of substrate. The unevenness pattern layer of the pyramid type or the corn type is formed in the top of the substrate by the pattern layer.