公开(公告)号：KR1020050041709A

公开(公告)日：2005-05-04

申请号：KR1020030076966

申请日：2003-10-31

Applicant: 삼성전자주식회사

Inventor： 이헌정 ,  박상오

IPC: H01L21/304

Abstract: 본 발명은 반도체 기판을 건조하는 방법에 관한 것으로, 상기 방법은 마란고니 효과를 이용하여 반도체 기판을 1차적으로 건조하는 단계와 상기 반도체 기판에 부착된 탈이온수를 IPA 증기로 치환하여 반도체 기판을 2차적으로 건조하는 단계를 포함한다. 2차 건조시에 상기 챔버 내의 IPA 증기는 1차 건조시에 비해 고농도로 유지되며, 2차 건조시 챔버 내에서 IPA 증기가 응축되는 것을 방지하기 위해 챔버는 히터에 의해 가열된다.

公开(公告)号：KR1020050023573A

公开(公告)日：2005-03-10

申请号：KR1020030059904

申请日：2003-08-28

Applicant: 삼성전자주식회사

Inventor： 박상오 ,  이헌정

IPC: H01L21/304

Abstract: PURPOSE: A method for cleaning and drying wafers is provided to remove efficiently particles on wafers and to dry efficiently deionized water between patterns having the large aspect ratio. CONSTITUTION: A first density isopropyl alcohol(IPA) is injected onto the surface of a cleaning solution with the wafers entirely dipped thereinto. The surface level of the cleaning solution within a bath is lowered by a first speed during injecting the first density IPA. The second density IPA is injected when the wafers is entirely exposed to the out side of the cleaning solution. The first density is 0.1 to 1.0 mol%. The second density is 5 to 10 mol%. The first speed is 3.5 to 6 mm/second. The cleaning solution is deionized water.

Abstract translation: 目的：提供清洁和干燥晶片的方法，以有效地去除晶片上的颗粒，并在具有大纵横比的图案之间有效地干燥去离子水。 构成：将第一密度异丙醇（IPA）注入到清洁溶液的表面上，并将晶片完全浸入其中。 在注入第一密度IPA期间，洗涤液中的清洁溶液的表面水平降低第一速度。 当晶片完全暴露于清洁溶液的外侧时，注入第二密度IPA。 第一密度为0.1〜1.0摩尔％。 第二密度为5〜10摩尔％。 第一速度为3.5至6毫米/秒。 清洗液是去离子水。

公开(公告)号：KR100447285B1

公开(公告)日：2004-09-07

申请号：KR1020020053631

申请日：2002-09-05

Applicant: 삼성전자주식회사

Inventor： 고용균 ,  류재준 ,  이헌정 ,  전필권

IPC: H01L21/304

CPC classification number: H01L21/67034

Abstract: An apparatus for drying a substrate using an isopropyl alcohol vapor includes a container for receiving an isopropyl alcohol vapor to dry a plurality of substrates wherein an opening is vertically formed through an upper portion of the container to permit the loading and unloading of the substrates; a supporting member for supporting the plurality of substrates in the container in a vertical direction and for supporting the substrates side by side in a horizontal direction, wherein the supporting member extends through the container and through the opening; and a cover for obstructing a flow of clean air from flowing directly from an air cleaner disposed over the container into the container through the opening. In addition, the apparatus may include an inert gas supplying member to supply an inert gas onto the substrates to prevent native oxide films from forming on the substrates.

Abstract translation: 一种使用异丙醇蒸汽干燥衬底的设备包括：用于接收异丙醇蒸气以干燥多个衬底的容器，其中通过容器的上部竖直地形成开口以允许衬底的装载和卸载; 支撑部件，用于在垂直方向上支撑所述容器中的所述多个基板，并用于沿水平方向并排支撑所述基板，其中所述支撑部件延伸穿过所述容器并穿过所述开口; 以及用于阻止清洁空气流从设置在容器上方的空气清洁器通过开口直接流入容器的盖。 另外，所述设备可以包括惰性气体供应构件，以将惰性气体供应到基板上以防止在基板上形成自然氧化膜。

公开(公告)号：KR100426988B1

公开(公告)日：2004-04-14

申请号：KR1020010069422

申请日：2001-11-08

Applicant: 삼성전자주식회사

Inventor： 이헌정 ,  전필권 ,  이기석 ,  김우일

IPC: H01L21/66

CPC classification number: H01L21/67253 ,  H01J37/32935

Abstract: An etching end point detector and its related method of use detect a point of time when an etching process ends by using plasma light generated during a plasma process in a chamber of plasma etching equipment. The detector comprises an optical device receiving light generated in a chamber during the etching process and producing from the light a plurality of optical signals having different corresponding wavelengths; signal converting means receiving the plurality of optical signals and converting the plurality of optical signals into corresponding light intensity values indicating an intensity of the corresponding optical signal; and a signal processor accumulating selected ones of the light intensity values corresponding to predetermined wavelengths to produce an EPD value, and in response to the EPD value, determining an end point of the etching process.

Abstract translation: 刻蚀终点检测器及其相关使用方法通过使用等离子体刻蚀设备的腔室中的等离子体处理期间产生的等离子光来检测刻蚀处理结束的时间点。 所述检测器包括光学装置，所述光学装置接收在所述蚀刻过程期间在腔室中产生的光并且从所述光产生具有不同对应波长的多个光学信号; 信号转换装置，用于接收多个光信号并将该多个光信号转换为指示相应光信号强度的对应光强度值; 以及信号处理器，累积对应于预定波长的光强度值中的选定光强度值以产生EPD值，并且响应于EPD值，确定蚀刻处理的结束点。

公开(公告)号：KR1020040009043A

公开(公告)日：2004-01-31

申请号：KR1020020042851

申请日：2002-07-22

Applicant: 삼성전자주식회사

Inventor： 고용균 ,  이헌정 ,  전필권 ,  박상오 ,  전상문 ,  김진성 ,  임광신

IPC: H01L21/304

CPC classification number: H01L21/02052 ,  H01L21/02057 ,  H01L21/67028 ,  H01L21/67034

Abstract: PURPOSE: An apparatus for drying a semiconductor substrate by an azeotrope effect is provided to completely eliminate the moisture remaining on the front surface of a patterned semiconductor substrate by heating the semiconductor substrate that crosses an azeotrope layer and an organic solvent layer having a higher density than that of the azeotrope layer. CONSTITUTION: Liquid(5) is stored in a wet bath(1). A space is prepared over the liquid by a chamber(3) installed in the upper portion of the wet bath. A distributor(11) supplies organic solvent to the surface of the liquid in the wet bath to form the azeotrope layer(5a) on the liquid while forming the organic solvent layer(11a) on the azeotrope layer. A heater heats the organic solvent layer and the atmosphere over the organic solvent layer. A drying gas conduit(17) supplies dry gas to the inside of the chamber.

Abstract translation: 目的：提供一种通过共沸效应对半导体衬底进行干燥的装置，通过加热半导体衬底与半导体衬底相交，从而完全消除残留在图案化半导体衬底的表面上的水分，该半导体衬底穿过共沸层和具有比 共沸层的。 构成：将液体（5）储存在湿浴（1）中。 通过安装在湿浴的上部的室（3）在液体上制备空间。 分配器（11）在湿浴中向液体的表面提供有机溶剂，以在液体上形成共沸物层（5a），同时在共沸层上形成有机溶剂层（11a）。 加热器在有机溶剂层上加热有机溶剂层和大气。 干燥气体管道（17）将干燥气体供应到腔室的内部。

公开(公告)号：KR1020030049057A

公开(公告)日：2003-06-25

申请号：KR1020010079146

申请日：2001-12-14

Applicant: 삼성전자주식회사

Inventor： 이헌정 ,  박상오 ,  이보용

IPC: H01L21/304

Abstract: PURPOSE: An isopropyl alcohol bubbler is provided to prevent defective dry of a wafer when isopropyl alcohol vapor is not sufficient in a drying apparatus by maximizing vaporization of the isopropyl alcohol contained in the isopropyl alcohol bubbler. CONSTITUTION: The isopropyl alcohol of a liquid state is contained in an airtight receptacle(102). The first supply unit supplies the isopropyl alcohol of a liquid state to the inside of the airtight receptacle. The second supply unit supplies nitrogen gas to the isopropyl alcohol contained in the airtight receptacle. An exhausting unit(108) exhausts the isopropyl alcohol vapor volatilized by the supplied nitrogen gas and the nitrogen gas. A plurality of plates(110) is installed in the airtight receptacle at regular intervals so that the bottom of the airtight receptacle confronts the lower surface of the airtight receptacle. The plurality of plates include a plurality of holes(110a) penetrating through the plates from the upper surface to the lower surface to make air bubbles of the nitrogen gas supplied to the inside of the airtight receptacle.

Abstract translation: 目的：提供异丙醇鼓泡器，以通过使异丙醇鼓泡机中所含的异丙醇的汽化最大化，在干燥装置中异丙醇蒸气不足时防止晶片的有缺陷的干燥。 构成：液体状态的异丙醇被包含在气密容器（102）中。 第一供应单元将液体状态的异丙醇供应到气密容器的内部。 第二供应单元向包含在气密容器中的异丙醇供应氮气。 排气单元（108）排出由供给的氮气和氮气挥发的异丙醇蒸气。 多个板（110）以规定的间隔安装在气密容器中，使得气密容器的底部面对气密容器的下表面。 多个板包括从上表面向下表面穿透板的多个孔（110a），以将氮气的气泡供给到气密容器的内部。