POLIMEROS PARCIALMENTE RAMIFICADOS.

    公开(公告)号:ES2228949T3

    公开(公告)日:2005-04-16

    申请号:ES01969427

    申请日:2001-07-18

    Applicant: BASF AG

    Abstract: Procedimiento para la obtención de polímeros parcialmente ramificados con un peso molecular promedio de número Mn en el intervalo de 500 hasta 10000 Dalton, formado por monómeros etilénicamente insaturados, que comprende: i)un 90 hasta un 99 % en peso de monómeros A monoetilénicamente insaturados, y ii) un 1 hasta un 10 % en peso de monómeros B, que muestran al menos dos enlaces dobles etilénicamente insaturados no conjugados, refiriéndose el porcentaje en peso de los monómeros A y B a la totalidad de la cantidad de los monómeros etilénicamente insaturados constituyentes del polímero, mediante copolimerización por medio de radicales de los monómeros A y B en presencia de un 1 hasta un 6 % en peso, referido a la totalidad de peso de los monómeros A y B, de al menos un iniciador de polimerización en substancia o en solución a temperaturas en el intervalo de 170ºC hasta 250ºC.

    85.
    发明专利
    未知

    公开(公告)号:BR0112620A

    公开(公告)日:2003-07-29

    申请号:BR0112620

    申请日:2001-07-18

    Applicant: BASF AG

    Abstract: The present invention relates to partially branched polymers having a number-average molecular weight Mn in the range from 500 to 20 000 daltons and synthesized from ethylenically unsaturated monomers including:i) from 80 to 99.9% by weight of monoethylenically unsaturated monomers A, andii) from 0.1 to 20% by weight of monomers B containing at least two nonconjugated ethylenically unsaturated double bonds,the weight fraction of the monomers A and B being based on the total amount of the ethylenically unsaturated monomers that constitute the polymer.

    86.
    发明专利
    未知

    公开(公告)号:DE59608668D1

    公开(公告)日:2002-03-14

    申请号:DE59608668

    申请日:1996-09-03

    Applicant: BASF AG

    Abstract: Positive-working radiation-sensitive mixt. is based on (a) polymer(s) contg. acid-labile gps., which are insol. in water and rendered soluble in aq. alkaline soln. by acid; (b) organic photo-acid(s); and (c) other organic cpd(s)., in which (a) comprises 35-70 mole-% 4-hydroxystyrene units (I), 30-50 mole-% 4-tetrahydropyran-2-yloxystyrene units (II) and 0-15 mole-% 4-vinylcyclohexanol units (III); (b) is 2-methyl-4-hydroxy-5-isopropyl-phenyl-dimethylsulphonium triflate (IV); and (c) is an organic ammonium deriv. (V) of (IV) or an analogue. In the formulae, R', R", R'" = 1-4 C alkyl; or R', R" = CH2 gps. linked to a 5-membered ring.

    89.
    发明专利
    未知

    公开(公告)号:DE58909788D1

    公开(公告)日:1997-05-07

    申请号:DE58909788

    申请日:1989-10-27

    Applicant: BASF AG

    Abstract: The invention relates to a radiation-sensitive mixture essentially consisting of (a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions, (b) a compound which upon irradiation forms a strong acid and (c) one or more organic compounds which inhibit the solubility of (a) in aqueous alkaline solutions, wherein the organic compound (c) is a beta -ketoacide ester. This radiation-sensitive mixture may be used to prepare photoresists.

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