1.
    发明专利
    未知

    公开(公告)号:DE59813077D1

    公开(公告)日:2006-02-09

    申请号:DE59813077

    申请日:1998-09-21

    Applicant: BASF AG

    Abstract: Radiation-curable urethane prepolymers are made from a mixture in which the isocyanate component contains two different trifunctional isocyanates or one tri- and one di-functional isocyanate, or the unsaturated polyol component contains at least two different unsaturated compounds with reactive hydroxyl groups and possibly other hydroxy compounds. A process for the production of radiation-curable, urethane group-containing prepolymers (PU) comprises reacting an isocyanate component (A) containing trifunctional isocyanate(s) (A1) and optionally difunctional isocyanate(s) (A2) with a polyol component (B) containing unsaturated compound(s) with at least one reactive hydroxyl group (B1) and optionally other OH group-containing compounds (B2), in which either (A) contains two different compounds (A1) or one (A1) and one (A2), or component (B) contains at least two different compounds (B1). Independent claims are also included for the following: (1) radiation-curable urethane prepolymers obtained by this process; (2) radiation-curable preparations containing prepolymers (PU) as above and possibly conventional additives etc.; (3) a process for coating substrates by applying PU or preparations containing PU to the substrate, removing any solvent; and hardening with UV or electron beam radiation; (4) coated substrates obtained by this process.

    2.
    发明专利
    未知

    公开(公告)号:DE59604943D1

    公开(公告)日:2000-05-18

    申请号:DE59604943

    申请日:1996-09-03

    Applicant: BASF AG

    Abstract: Positive-working radiation-sensitive mixt. is based on (a) either (a-1) water-insol. organic polymeric binder(s) with acid-labile gps., rendered soluble in aq. alkaline soln. by the action of acid or (a-2.1) a water-insol. polymeric binder, which is soluble in aq. alkaline soln., and (a-2.2) a low mol. organic cpd., which is rendered more soluble in an aq. alkaline developer by the action of an acid; (b) organic photo-acid(s); and opt. (c) organic cpd(s). other than (b). The novelty is that at least one of (a-1), (a-2.1), (a-2.2), (b) and (c) contains a gp. of formula -O N -R4 (I) or (c) is of formula O-CO-Ä(CH2Ün-CH2-N R3 (II); in which R = 1-6 C alkyl; n = 1-6.

    3.
    发明专利
    未知

    公开(公告)号:DE59812973D1

    公开(公告)日:2005-09-08

    申请号:DE59812973

    申请日:1998-09-10

    Applicant: BASF AG

    Abstract: A radiation curable polyurethane composition contains an aliphatic urethane group comprising a pre-polymer having two ethylenically unsaturated double bonds per molecule and a monofunctional ester of an alpha , beta -unsaturated carboxylic acid having a saturated 5-6C ring or heterocyclic ring. A radiation curable composition (I) contains: (A) an aliphatic, urethane group containing pre-polymer having on average, two ethylenically unsaturated double bonds per molecule; (B) a monofunctional ester of an alpha , beta -unsaturated carboxylic acid with a monofunctional alcohol, that has a saturated 5-6 membered carbon ring or heterocyclic ring comprising 1-2 oxygen atoms; and optionally (C) a di- or poly-functional ester of an alpha , beta -unsaturated carboxylic acid with an aliphatic di- or polyol. An Independent claim is included for a coating process of substrates by applying (I) to a substrate, optionally removing a solvent and irradiating with UV or an electron beam.

    5.
    发明专利
    未知

    公开(公告)号:DE59608668D1

    公开(公告)日:2002-03-14

    申请号:DE59608668

    申请日:1996-09-03

    Applicant: BASF AG

    Abstract: Positive-working radiation-sensitive mixt. is based on (a) polymer(s) contg. acid-labile gps., which are insol. in water and rendered soluble in aq. alkaline soln. by acid; (b) organic photo-acid(s); and (c) other organic cpd(s)., in which (a) comprises 35-70 mole-% 4-hydroxystyrene units (I), 30-50 mole-% 4-tetrahydropyran-2-yloxystyrene units (II) and 0-15 mole-% 4-vinylcyclohexanol units (III); (b) is 2-methyl-4-hydroxy-5-isopropyl-phenyl-dimethylsulphonium triflate (IV); and (c) is an organic ammonium deriv. (V) of (IV) or an analogue. In the formulae, R', R", R'" = 1-4 C alkyl; or R', R" = CH2 gps. linked to a 5-membered ring.

    6.
    发明专利
    未知

    公开(公告)号:DE59606289D1

    公开(公告)日:2001-02-15

    申请号:DE59606289

    申请日:1996-06-28

    Applicant: BASF AG

    Abstract: Radiation-curable (meth)acrylates (I) are claimed, which are obtd. by reacting: (i) acylphenyl chloroformates of formula (II) with: (ii) hydroxy (meth)acrylates (III) contg. free hydroxy gp(s). and (meth)acryl gps. in the molecule: R-C(=O)-R (II) R = 1-4 C alkyl, aryl or R ; R = a substd. phenyl gp. of formula (IV); R - R = H, 1-4 C alkyl, 1-4 C alkoxy, OH, phenyl, SH, SCH3, SC2H5, F, Cl, Br, CN, COOH, COO-(1-17 C alkyl), COO-(5-10 C aryl), CF3, N(alkyl)2, N(alkyl)(aryl), N(aryl)2, N , or N H(alkyl)2A ; A = an anion; alkyl, aryl = 1-10 C alkyl and 5-10 C aryl, unless otherwise indicated; and 1-3 R - R gps. = -O-C(=O)-Cl. Also claimed are: (a) a process for the prodn. of radiation curable (meth)acrylate; and (b) use of radiation curable (meth)acrylate in radiation curable compsns..

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