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    81.
    发明专利
    未知

    公开(公告)号：ES2061087T3

    公开(公告)日：1994-12-01

    申请号：ES91102904

    申请日：1991-02-28

    Applicant: BASF AG

    Inventor： REHMER GERD DR ,  BOTT KASPAR DR

    IPC: C07C49/76 ,  C07C59/125 ,  C07C69/736 ,  C07C231/12 ,  C07C233/31 ,  C07C255/13 ,  C08F20/58 ,  C08F220/58 ,  C09J7/02 ,  C09J133/06 ,  C09J133/24 ,  C09J133/26

    Abstract: Ethylenically unsaturated compounds of the general formula I (I) where R1 is alkyl of 1 to 4 carbon atoms, cyclopropyl, cyclopentyl, cyclohexyl, phenyl or phenyl in which some or all of the hydrogen atoms have been replaced by radicals R4, not more than two substituents R4 being identical, or R1 together with R2 or together with R6 forms a -CH2-CH2- or -CH2-CH2-CH2- bridge, R4 is alkyl of 1 to 24 carbon atoms, -OH, -O-R7, -S-R7, R2 or R6, independently of one another, both are hydrogen, or one of the radicals R4, or, where R1 is aryl, R2 or R6 is a direct bond to R1 in the ortho-position with respect to the carbonyl group, and R3 and R5 are each hydrogen, one of the radicals R4 or a group the general formula II (II) where R7 and R8 are each alkyl of 1 to 4 carbon atoms, R9 is cycloalkyl of 5 or 6 carbon atoms, R10 is hydrogen or alkyl of 1 to 4 carbon atoms and R11 is hydrogen or alkyl of 1 to 4 carbon atoms, with the proviso that either R3 or R5 is a group of the general formula II, are suitable for the preparation of polymers which, after exposure to actinic radiation, have increased internal strength.

    82.
    发明专利
    未知

    公开(公告)号：ES2054970T3

    公开(公告)日：1994-08-16

    申请号：ES89117607

    申请日：1989-09-23

    Applicant: BASF AG

    Inventor： BLUM RAINER ,  REHMER GERD DR ,  SCHUPP HANS DR

    IPC: C08J3/28 ,  C08G73/06 ,  C08G73/10 ,  C08L79/04 ,  C08L79/08 ,  C09D179/00 ,  C09D179/04 ,  C09D179/08 ,  G02B6/44 ,  G03F7/038

    Abstract: The invention relates to radiation-sensitive mixtures of certain precursors and carbonyl compounds which contain aromatic radicals and, in the UV-excited state, are capable of hydrogen abstraction, which mixtures experience a solubility differentiation on irradiation with actinic light and are suitable for the preparation of polyimides, polyisoindoloquinazolinediones, polyoxazinediones, polyquinazolinediones or polyquinazolones. They are suitable for the production of insulating layers and printed circuit boards.

    83.
    发明专利
    未知

    公开(公告)号：AT108814T

    公开(公告)日：1994-08-15

    申请号：AT90116728

    申请日：1990-08-31

    Applicant: BASF AG

    Inventor： REHMER GERD DR ,  RAU MARIA GYOPAR DR ,  WISTUBA ECKEHARDT DR ,  BAECHER REINHARD DR ,  MATTHAEI LOTHAR

    IPC: C08K3/00 ,  C08F2/22 ,  C08K5/07 ,  C08K5/132 ,  C08L31/02 ,  C08L31/04 ,  C08L33/04 ,  C08L33/06 ,  C09D131/02 ,  C09D131/04 ,  C09D133/06 ,  C09J131/02 ,  C09J131/04

    Abstract: Aqueous synthetic resin formulations essentially contain A) from 3 to 75% by weight of one or more synthetic resins which are composed of a) from 50 to 99.9% by weight of one or more unsaturated carboxylic or vinyl esters, b) from 0.1 to 12% by weight of one or more alpha , beta -monoethylenically unsaturated monobasic or dibasic acids or their ahydrides, c) from 0 to 10% by weight of one or more monoethylenically unsaturated acetophenone or benzophenone derivatives, d) from 0 to 35% by weight of one or more other copolymerizable monoethylenically unsaturated monomers, in polymerized form, B) one or more metal cations having a charge of from 2 to 4, in water-soluble form, C) from 0 to 10% by weight, based on the synthetic resin A, or benezophenones or acetophenones which are not monoethylenically unsaturated, D) effective amounts of emulsifiers or protective colloids or a mixture of these active ingredients, E) not less than 5% by weight of water and F) from 0 to 85% by weight of finely divided fillers, and the total amount of the cations B is such that it is capable of neutralizing from 0.2 to 6 times the amount, corresponding to the amount of acid functions incorporated in the form of the monomers b in the synthetic resin A, of their conjugated bases. These synthetic resin formulations are suitable for coating, adhesive bonding, sealing or impregnating.

    84.
    发明专利
    未知

    公开(公告)号：DE59100788D1

    公开(公告)日：1994-02-17

    申请号：DE59100788

    申请日：1991-02-28

    Applicant: BASF AG

    Inventor： REHMER GERD DR ,  BOTT KASPAR DR

    IPC: C07C49/76 ,  C07C59/125 ,  C07C69/736 ,  C07C231/12 ,  C07C233/31 ,  C07C255/13 ,  C08F20/58 ,  C08F220/58 ,  C09J7/02 ,  C09J133/06 ,  C09J133/24 ,  C09J133/26

    Abstract: Ethylenically unsaturated compounds of the general formula I (I) where R1 is alkyl of 1 to 4 carbon atoms, cyclopropyl, cyclopentyl, cyclohexyl, phenyl or phenyl in which some or all of the hydrogen atoms have been replaced by radicals R4, not more than two substituents R4 being identical, or R1 together with R2 or together with R6 forms a -CH2-CH2- or -CH2-CH2-CH2- bridge, R4 is alkyl of 1 to 24 carbon atoms, -OH, -O-R7, -S-R7, R2 or R6, independently of one another, both are hydrogen, or one of the radicals R4, or, where R1 is aryl, R2 or R6 is a direct bond to R1 in the ortho-position with respect to the carbonyl group, and R3 and R5 are each hydrogen, one of the radicals R4 or a group the general formula II (II) where R7 and R8 are each alkyl of 1 to 4 carbon atoms, R9 is cycloalkyl of 5 or 6 carbon atoms, R10 is hydrogen or alkyl of 1 to 4 carbon atoms and R11 is hydrogen or alkyl of 1 to 4 carbon atoms, with the proviso that either R3 or R5 is a group of the general formula II, are suitable for the preparation of polymers which, after exposure to actinic radiation, have increased internal strength.

    86.
    发明专利
    未知

    公开(公告)号：DE3881259D1

    公开(公告)日：1993-07-01

    申请号：DE3881259

    申请日：1988-03-29

    Applicant: BASF AG

    Inventor： BLUM RAINER ,  REHMER GERD DR ,  OSTERLOH ROLF DR ,  SANDER HANS DR

    IPC: C08L33/00 ,  C08L51/00 ,  C08L63/00

    Abstract: Compsns. (I) comprise: (A) epoxide resin of (no.) average mol. wt. 300-6000 contg. on average 1.5-3.0 epoxide gps. per mol. and (B) polyacrylate resin obtainable by polymerising in organic solvent or solvents of (B1) 30-95 wt.% ester (II) of acrylic and/or methacrylic and/or ethacrylic acid with 1-20C alcohol in presence of (B2) 5-70 wt.% carboxyl gp. -contg. copolymer (III) of (no.) average mol. wt. 500-20,000, obtainable by mass- or soln.-polymerisation of mono-olefinically unsatd. monomers at 180-400 deg.C and 1-200 bars pressure. (B) is prepd. from 30-90 wt.% (II), 5-70 wt.% (III), and 5-70 wt.% other comonomer (III). (II) is ester with mono- to hexa-hydric aliphatic, cycloaliphatic, and/or aromatic alcohol. (III) is copolymer from major proportion of styrene and minor proportion of (meth)acrylic or maleic acid, maleic anhydride, or ester of such acids with 1-20C alcohol. (III) is styrene, alpha-methyl styrene, chlorostyrene, vinyltoluene, tert. butylstyrene, (meth)acrylic, or maleic acid, maleic anhydride, maleate ester, acrylonitrile, (meth)acrylamide, or ether of N-hydroxyalkyl(meth)acrylamide.

    88.
    发明专利
    未知

    公开(公告)号：DE4016549A1

    公开(公告)日：1991-11-28

    申请号：DE4016549

    申请日：1990-05-23

    Applicant: BASF AG

    Inventor： REHMER GERD DR ,  AUCHTER GERHARD DR ,  JAEGER HELMUT

    IPC: C08F20/12 ,  C08F2/50 ,  C08F8/00 ,  C08F8/14 ,  C08F8/30 ,  C08F8/32 ,  C08F20/34 ,  C08F20/36 ,  C08F20/52 ,  C08F20/58 ,  C08F220/10 ,  C08F220/12 ,  C09J4/00 ,  C09J4/02

    Abstract: Synthetic resins are obtainable by chemically bonding one or more compounds of the general formula I (* CHEMICAL STRUCTURE *) (I) where R1 is -OH, -NH2, (* CHEMICAL STRUCTURE *) -NHR3 or (* CHEMICAL STRUCTURE *) R2 is -H, -CH3 or -C2H5, R3 is -CmH2m+1, where m is from 1 to 6, R4 is -H or -CH3 and n is from 1 to 12, via the oxygen or nitrogen atom of R1 to one or more polymers A which consist of a) from 50 to 100% by weight of one or more esters of acrylic or methacrylic acid with monohydric alcohols of 1 to 18 carbon atoms or a mixture of these esters (monomers a) and b) from 0 to 50% by weight of other copolymerizable monomers (monomers b) in polymerized form, in amounts such that the synthetic resin contains from 0.01 to 1 mole of double bonds per kg of polymer A. After exposure to ultraviolet light or to electrons, these synthetic resins are suitable as contact adhesives.

    89.
    发明专利
    未知

    公开(公告)号：DE4016056A1

    公开(公告)日：1991-11-21

    申请号：DE4016056

    申请日：1990-05-18

    Applicant: BASF AG

    Inventor： REHMER GERD DR ,  RAU MARIA GYOPAR DR ,  WISTUBA ECKEHARDT DR ,  BAECHER REINHARD DR ,  TEICHMANN HELMUT ,  BECKERLE WILHELM FRIEDRICH

    IPC: C08L31/02 ,  C08F2/22 ,  C08K5/07 ,  C08K5/25 ,  C08L31/04 ,  C08L33/00 ,  C08L33/04 ,  C09D5/02 ,  C09D131/02 ,  C09D131/04 ,  C09D133/04 ,  C09D133/06 ,  C09J131/02 ,  C09J131/04

    Abstract: Aqueous synthetic resin formulations containing A) from 3 to 75% by weight of one or more synthetic resins, B) one or more organic compounds having two or more hydrazide groups, C) from 0 to 10% by weight, based on the synthetic resin A, of benzophenone or acetophenone or of one or more acetophenone or benzophenone derivatives which are not monoethylenically unsaturated or of a mixture of these active ingredients, D) effective amounts of emulsifiers or protective colloids or of a mixture of these active ingredients, E) not less than 5% by weight of water and F) from 0 to 85% by weight of finely divided fillers, with the proviso that the total amount of the monomers d polymerized in the one or more synthetic resins A and of component C is from 0.05 to 10% by weight, based on the one or more synthetic resins A, and the ratio of the number of moles of hydrazide groups of component B and the number of moles of the aldehyde and keto groups of the monomers c polymerized in the one or more synthetic resins A is from 0.01 to 2. These synthetic resin formulations are suitable for coating, adhesive bonding, sealing or impregnating.

    90.
    发明专利
    未知

    公开(公告)号：DE4007318A1

    公开(公告)日：1991-09-12

    申请号：DE4007318

    申请日：1990-03-08

    Applicant: BASF AG

    Inventor： REHMER GERD DR ,  BOTT KASPAR DR

    IPC: C07C49/76 ,  C07C59/125 ,  C07C69/736 ,  C07C231/12 ,  C07C233/31 ,  C07C255/13 ,  C08F20/58 ,  C08F220/58 ,  C09J7/02 ,  C09J133/06 ,  C09J133/24 ,  C09J133/26

    Abstract: Ethylenically unsaturated compounds of the general formula I (I) where R1 is alkyl of 1 to 4 carbon atoms, cyclopropyl, cyclopentyl, cyclohexyl, phenyl or phenyl in which some or all of the hydrogen atoms have been replaced by radicals R4, not more than two substituents R4 being identical, or R1 together with R2 or together with R6 forms a -CH2-CH2- or -CH2-CH2-CH2- bridge, R4 is alkyl of 1 to 24 carbon atoms, -OH, -O-R7, -S-R7, R2 or R6, independently of one another, both are hydrogen, or one of the radicals R4, or, where R1 is aryl, R2 or R6 is a direct bond to R1 in the ortho-position with respect to the carbonyl group, and R3 and R5 are each hydrogen, one of the radicals R4 or a group the general formula II (II) where R7 and R8 are each alkyl of 1 to 4 carbon atoms, R9 is cycloalkyl of 5 or 6 carbon atoms, R10 is hydrogen or alkyl of 1 to 4 carbon atoms and R11 is hydrogen or alkyl of 1 to 4 carbon atoms, with the proviso that either R3 or R5 is a group of the general formula II, are suitable for the preparation of polymers which, after exposure to actinic radiation, have increased internal strength.

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