Active x-ray attack prevention device

    公开(公告)号:US11121097B1

    公开(公告)日:2021-09-14

    申请号:US16881736

    申请日:2020-05-22

    Abstract: The present disclosure relates to a metal layer for an active x-ray attack prevention device for securing integrated circuits. In particular, the present disclosure relates to a structure including a semiconductor material, one or more devices on a front side of the semiconductor material, a backside patterned metal layer under the one or more devices, located and structured to protect the one or more devices from an active intrusion, and at least one contact providing an electrical connection through the semiconductor material to a front side of the backside patterned metal layer. The backside patterned metal layer is between a wafer and one of the semiconductor material and an insulator layer.

    ION-SENSITIVE FIELD-EFFECT TRANSISTORS WITH LOCAL-FIELD BIAS

    公开(公告)号:US20240159701A1

    公开(公告)日:2024-05-16

    申请号:US17987543

    申请日:2022-11-15

    CPC classification number: G01N27/4148

    Abstract: Structures for an ion-sensitive field-effect transistor and methods of forming same. The structure comprises a semiconductor substrate, a microfluidic channel above the semiconductor substrate, a semiconductor layer including a portion positioned as a sensing layer in the microfluidic channel, a first electrical connection coupled to the portion of the semiconductor layer, and a second electrical connection coupled to the semiconductor substrate. The portion of the semiconductor layer is spaced above the semiconductor substrate.

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