公开(公告)号：JPH05127362A

公开(公告)日：1993-05-25

申请号：JP29274791

申请日：1991-11-08

Applicant: HOYA CORP

Inventor： MITSUI MASARU

IPC: G03F1/46 ,  G03F1/50 ,  G03F1/54 ,  H01L21/027

Abstract: PURPOSE:To prevent the chipping of a light shielding film pattern and the failing of the pattern due to defective adhesion to a transparent substrate. CONSTITUTION:This photomask blank has a transparent substrate 2 and a light shielding film 3 formed on one principal face of the substrate 2 and the film 3 contains Cr contg. 0.5-15wt.% Si. This photomask has a transparent substrate 2 and a light shielding film pattern 5 formed on one principal face of the substrate 2 and the pattern 5 contains Cr contg. 0.5-15wt.% Si. When the light shielding film 3 is etched at the time of producing this photomask, the undercut of the light shielding film pattern 5 can be prevented and the adhesion of the film 3 to the substrate 2 is satisfactory. The pattern 5 is not undercut and is excellent in adhesion to the substrate 2.

公开(公告)号：JPH032756A

公开(公告)日：1991-01-09

申请号：JP13664989

申请日：1989-05-30

Applicant: HOYA CORP

Inventor： USHIDA MASAO ,  KASAHARA HISASHI ,  MITSUI MASARU

IPC: G03F1/40 ,  G03F1/48 ,  G03F1/50 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To prevent the electrostatic breakdown of a light shielding pattern and the harmful effect of electrification by forming a transparent protective film based on tantalum oxide on an electrically conductive transparent film and a light shielding film based on Cr on the protective film. CONSTITUTION:An electrically conductive transparent film 2 is formed on a substrate 1 with a material based on In2O3, SnO2, InxSnyOz or SnxSbyOz. A transparent protective film 7 based on tantalum oxide is formed on the film 2 and a light shielding film 3 based on Cr is then formed on the film 7. Since the film 7 is proof against chlorine-contg. gas, the etching of the film 2 is prevented when the film 3 is etched. The electrostatic breakdown of the resulting light shielding pattern 13 or the harmful effect of electrification is prevented.

公开(公告)号：JPS6235663B2

公开(公告)日：1987-08-03

申请号：JP23226583

申请日：1983-12-09

Applicant: HOYA CORP

Inventor： USHIDA MASAO ,  MITSUI MASARU ,  KASAHARA HISASHI

IPC: G03F1/00 ,  G03F1/40 ,  G03F1/50 ,  G03F1/58 ,  G03F1/88 ,  H01L21/027

公开(公告)号：JPS60123843A

公开(公告)日：1985-07-02

申请号：JP23226583

申请日：1983-12-09

Applicant: HOYA CORP

Inventor： USHIDA MASAO ,  MITSUI MASARU ,  KASAHARA HISASHI

IPC: G03F1/00 ,  G03F1/40 ,  G03F1/50 ,  G03F1/58 ,  G03F1/88 ,  H01L21/027

Abstract: PURPOSE:To prevent the electrostatic breakdown of a light shieldable metallic pattern and to improve durability by laminating a transparent conductive film, transparent insulating film and light shieldable metallic film on a transparent base plate. CONSTITUTION:An SnxSbyOz film 12 (about 150Angstrom film thickness) is laminated by sputtering method as a transparent conductive film on the main surface of soda glass 11 which is a transparent base plate and a transparent insulating film 13 (about 100Angstrom film thickness) consisting of SiO2 as a blank material is laminated on the film 12 by the same method. A chromium film 14 (about 700Angstrom thickness) adjusted in optical density to a reference value (for example, 3.0) is laminated by the above-described sputtering method as a light shieldable metallic film on the film 13 by which a photomask blank 15 is produced. Photoresist 16 made on the blank 15 and the pattern of the resist 16 is formed on the mask. The film 14 in the pattern part is left and a chromium pattern 20 is obtd.