METHOD AND APPARATUS FOR FORMING MEMS DEVICE
    82.
    发明申请
    METHOD AND APPARATUS FOR FORMING MEMS DEVICE 审中-公开
    用于形成MEMS器件的方法和装置

    公开(公告)号:WO2011046986A3

    公开(公告)日:2011-08-11

    申请号:PCT/US2010052403

    申请日:2010-10-12

    Abstract: The disclosure is generally directed to fabrication steps, and operation principles for microelectromechanical (MEMS) transducers. In one embodiment, the disclosure relates to a texture morphing device. The texture morphing device includes: a plurality of supports arranged on a substrate to support a deformable mirror, an ITO layer; and a Distributed Bragg Reflector (DBR ) layer. A pair of adjacent supports form a cavity with the ITO layer and the deformable mirror. When the height of the cavity changes responsive to an external pressure, the internal reflection within the cavity is changed. The change in the height of the cavity causes the exterior texture to morph. Similar principles are disclosed for constructing sensor and actuators.

    Abstract translation: 本公开一般涉及制造步骤以及微机电(MEMS)换能器的操作原理。 在一个实施例中,本公开涉及纹理变形装置。 纹理变形装置包括:布置在基板上以支撑可变形反射镜的多个支撑件,ITO层; 和分布式布拉格反射器(DBR)层。 一对相邻的支撑件形成具有ITO层和可变形反射镜的空腔。 当空腔的高度响应于外部压力而变化时,空腔内的内部反射被改变。 空腔的高度变化导致外部纹理变形。 公开了用于构造传感器和致动器的类似原理。

    전기 기계 장치를 제조하기 위한 방법 및 해당 장치
    86.
    发明公开
    전기 기계 장치를 제조하기 위한 방법 및 해당 장치 审中-实审
    制造机电装置的方法和设备

    公开(公告)号:KR1020170086483A

    公开(公告)日:2017-07-26

    申请号:KR1020177011711

    申请日:2015-11-09

    Inventor: 골렉,조엘

    Abstract: 전기기계장치는두 개의고형층(10, 30)의사이에절연층(31)이개재되어있는형태로형성되는적층체, 그리고기설정된깊이의홈(4)의위에현수되어있는기설정된두께의마이크로기계구조체(60, 61)를포함하며, 홈(4)과마이크로기계구조체(60, 61)가적층체의상기두 개의고형층(10, 30) 중하나(10)를형성하며, 절연층(31)이홈(4)의바닥을형성한다.

    Abstract translation: 该机电装置包括形成在其上的两个固体层(10,30)伪绝缘层(31)的堆叠,以及通过堆叠预定厚度的微结构 机械结构60和61以及凹槽4和微机械结构60和61形成层压体10和绝缘层31的两个固体层10和30中的一个 )形成凹槽(4)的底部。

    Panel transducer scale package and method of manufacturing the same

    公开(公告)号:US11679975B2

    公开(公告)日:2023-06-20

    申请号:US17629210

    申请日:2020-07-23

    Applicant: VERMON SA

    Abstract: A method of manufacturing a panel transducer scale package includes securing acoustic components at predetermined locations on a first carrier substrate with a first surface of the acoustic components positioned adjacent to the first carrier substrate. ASIC components are also secured at predetermined locations on the first carrier substrate with a first surface of the ASIC components positioned adjacent to the first carrier substrate. Photoresist resin is applied over the acoustic components and the ASIC components such that a second surface of the acoustic components is left exposed from the photoresist resin. The first carrier substrate is removed to expose the first surface of the acoustic components and the first surface of the ASIC components. A buildup layer is formed including electrical pathways between each of the acoustic components and the ASIC components, and the photoresist resin is removed.

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